Wafer level packaging of electronic devices
Aspects of the invention are directed to an electronic device package including an electronic device comprising a first contact point; a metal pad disposed to provide electrical connection to the first contact point; a substrate comprising a first face and a second face opposing the first face of the substrate, the first face of the substrate adjacent a face of the electronic device; and a VIA passing through the substrate from the second face of the substrate to the metal pad, the VIA exhibiting: a pass through extending through the substrate from the first face to the second face; a metal layer disposed within the pass through arranged to provide electrical connectivity to the metal pad from an area adjacent the second face of the substrate; and an electrically insulating first passivation layer disposed between the metal layer and the substrate arranged to provide electrical insulation between the substrate and the metal layer.
1. A wafer level packaging of semiconductor devices, comprising:
a semiconductor device with a top face, a bottom face, a metal pad located between the top and bottom faces;
a top cover layer affixed to the top face of the semiconductor device; and
a bottom cover wafer directly affixed to the bottom face of the semiconductor device, wherein
a VIA extends through external and internal faces of the bottom cover wafer and through the bottom face of the semiconductor device to the metal pad,
a metal layer extends from the external face of the bottom cover wafer through the VIA to the metal pad, the metal layer including metal sidewall portions disposed on sidewalls of the VIA, the metal sidewall portions defining a hole therebetween, and
a passivation layer is disposed in the VIA between each metal sidewall portion and the bottom cover wafer.
2. The wafer level packaging of semiconductor devices as claimed in claim 1 wherein the metal pad is an electrically conducting pad.
3. The wafer level packaging of semiconductor devices as claimed in claim 1 wherein the metal pad is a thermally conducting pad.
4. The wafer level packaging of semiconductor devices as claimed in claim 1 wherein the top cover layer is comprised of a glass, phosphor, or a polymer.
5. The wafer level packaging of semiconductor devices as claimed in claim 1 wherein the bottom cover wafer is comprised of silicon.
6. The wafer level packaging of semiconductor devices as claimed in claim 1 wherein the bottom cover wafer has an electrically isolating layer on at least one side of the bottom cover wafer, and said electrically isolating layer is one of a group of electrically-isolating layers consisting of: silicon dioxide, silicon nitride, epoxy, solder mask, electrophoretic paint, aluminum nitride, and aluminum oxide.
7. The wafer level packaging of semiconductor devices as claimed in claim 1 wherein the VIA has an electrically-isolating layer on a side wall of the VIA electrically isolating the metal layer from the bottom cover wafer, wherein said electrically-isolating layer is one of a group of electrically-isolating layers consisting of: silicon dioxide, silicon nitride, epoxy, solder mask, electrophoretic paint, aluminum nitride, and aluminum oxide.
8. The wafer level packaging of semiconductor devices as claimed in claim 1 wherein the semiconductor device is one of: a light emitting diode, a photo detector, or a MEM.
9. The wafer level packaging of semiconductor devices as claimed in claim 1 wherein the metal is one of: copper, nickel, gold, aluminum, or compositions containing any of these metals.