Angle control for radicals and reactive neutral ion beams
View Patent ↗A workpiece processing apparatus allowing independent control of the extraction angles of charged ions and reactive neutrals is disclosed. The apparatus includes an extraction plate having an extraction aperture through which charged ions pass. Plasma sheath modulation and electric fields may be used to determine the extraction angle of the charged ions. The extraction plate also includes one or more neutral species channels, separate from the extraction aperture, through which reactive neutrals are passed at a selected extraction angle. The geometric configuration of the neutral species channels determines the extraction angle of the reactive neutrals. The neutral species channel may also comprise a suppressor, to reduce the number of charged ions that pass through the neutral species channel. The apparatus may be used for various applications, such as directed reactive ion etching.
1. A workpiece processing apparatus, comprising:
a plasma generator;
a plasma chamber; and
one extraction plate having a first aperture and a second aperture;
wherein charged ions are extracted through the first aperture at a first selected extraction angle, and reactive neutrals are passed through the second aperture at a second selected extraction angle, where the second aperture is different than the first aperture and comprises a suppressor to minimize charged ions passing through the second aperture by repelling or neutralizing the charged ions.
2. The workpiece processing apparatus of claim 1 , wherein the suppressor comprises an electrically biased conductive grid disposed in the second aperture to repel the charged ions.
3. The workpiece processing apparatus of claim 1 , wherein the suppressor comprises an electrically biased cup disposed around the second aperture to repel the charged ions.
4. The workpiece processing apparatus of claim 1 , wherein the suppressor comprises a sieve to neutralize charged ions entering the second aperture before exiting the second aperture.
5. The workpiece processing apparatus of claim 1 , wherein the second selected extraction angle is determined by a tilt of the second aperture relative to a plane orthogonal to the extraction plate.
6. The workpiece processing apparatus of claim 1 , wherein an angular distribution of reactive neutrals about the second selected extraction angle is determined by an aspect ratio of the second aperture, defined as a length of the second aperture through the extraction plate divided by a height of the second aperture.
7. The workpiece processing apparatus of claim 1 , wherein a blocker is disposed in the plasma chamber and wherein the second selected extraction angle and an angular distribution of reactive neutrals about the second selected extraction angle is determined by a width of the second aperture, a width of the blocker and a distance between the blocker and the second aperture.
8. A workpiece processing apparatus, comprising:
a plasma generator;
a plasma chamber;
one extraction plate comprising an extraction aperture; and
a blocker disposed within the plasma chamber proximate the extraction aperture;
wherein the workpiece processing apparatus uses plasma sheath modulation or electric fields to extract charged ions through the extraction aperture as an ion beam at a first selected extraction angle;
wherein reactive neutrals are passed through a neutral species channel at a second selected extraction angle, and wherein passage of charged ions through the neutral species channel is minimized; and
wherein the neutral species channel is disposed in the blocker, such that reactive neutrals pass through the neutral species channel in the blocker before exiting the plasma chamber.
9. The workpiece processing apparatus of claim 8 , wherein the second aperture comprises a suppressor to minimize charged ions passing through the second aperture.
10. The workpiece processing apparatus of claim 9 , wherein the suppressor comprises an electrically biased conductive grid disposed in the second aperture to repel the charged ions.
11. The workpiece processing apparatus of claim 9 , wherein the suppressor comprises an electrically biased cup disposed around the second aperture to repel the charged ions.
12. The workpiece processing apparatus of claim 9 , wherein the suppressor comprises a sieve to neutralize charged ions entering the second aperture before exiting the second aperture.
13. A workpiece processing apparatus, comprising:
a plasma generator;
a plasma chamber;
one extraction plate comprising an extraction aperture having a width much greater than its height, and neutral species channels disposed on opposite sides of the extraction aperture in a height direction;
wherein charged ions exit the plasma chamber through the extraction aperture as an ion beam at a first extraction angle;
wherein reactive neutrals are passed through the neutral species channels at a second selected extraction angle; and
wherein passage of charged ions through the neutral species channel is minimized.
14. The workpiece processing apparatus of claim 13 , wherein an insulating blocker is disposed within the plasma chamber proximate the extraction aperture and wherein the size and position of the blocker relative to the extraction aperture define the first extraction angle.
15. The workpiece processing apparatus of claim 13 , wherein the charged ions are minimized by neutralizing the charged ions after the charged ions enter the neutral species channel and before exiting.
16. The workpiece processing apparatus of claim 13 , wherein the charged ions are repelled away from the neutral species channels.
17. The workpiece processing apparatus of claim 13 , wherein the neutral species channels are housed within rotatable members to modify the second extraction angle.
18. The workpiece processing apparatus of claim 13 , wherein the neutral species channels comprise collimating columns to narrow an angular distribution of reactive neutrals exiting the plasma chamber.
19. The workpiece processing apparatus of claim 13 , wherein the reactive neutrals are created in a remote neutral species generator, different from the plasma chamber, and are transported to the second aperture via neutral species pathways, separated from the plasma chamber.