Approaches in first order scatterometry overlay based on introduction of auxiliary electromagnetic fields
Metrology measurement methods and tools are provided, which illuminate a stationary diffractive target by a stationary illumination source, measure a signal composed of a sum of a zeroth order diffraction signal and a first order diffraction signal, repeat the measuring for a plurality of relations between the zeroth and the first diffraction signals, while maintaining the diffractive target and the illumination source stationary, and derive the first order diffraction signal from the measured sums. Illumination may be coherent and measurements may be in the pupil plane, or illumination may be incoherent and measurements may be in the field plane, in either case, partial overlapping of the zeroth and the first diffraction orders are measured. Illumination may be annular and the diffractive target may be a one cell SCOL target with periodic structures having different pitches to separate the overlap regions.
1. A metrology measurement method comprising:
illuminating a stationary diffractive target by a stationary illumination source,
measuring a scatterometry signal composed of a sum of a zeroth order diffraction signal and a first order diffraction signal with a detector,
repeating the measuring for a plurality of relations between the zeroth and the first order diffraction signals, while maintaining the diffractive target and the illumination source stationary, and
deriving the first order diffraction signal, using a processor, from the measured sums.
2. The metrology measurement method of claim 1 , wherein the illuminating is coherent and the measuring is carried out in a pupil plane with respect to the target.
3. The metrology measurement method of claim 2 , wherein an illumination wavelength and a pitch of the target are selected to yield partial overlapping of the zeroth and the first diffraction orders in the pupil plane.
4. The metrology measurement method of claim 1 , wherein the illuminating is incoherent and the measuring is carried out in a field plane with respect to the target.
5. The metrology measurement method of claim 4 , wherein a non-measured first order diffraction signal is masked at the pupil plane of the target to yield the measured sum.
6. The metrology measurement method of claim 5 , wherein the target is an imaging target comprising at least two periodic structures, the method further comprising carrying out at least two overlay measurements of the target, at least one with a masked +1 diffraction order and at least another one with a masked −1 diffraction order, and deriving an overlay by averaging the at least two overlay measurements.
7. The metrology measurement method of claim 4 , further comprising identifying, during a training stage, and removing inaccuracy-introducing illumination points.
8. The metrology measurement method of claim 2 , further comprising carrying out the repeated measuring for a plurality of phases as the relations between the zeroth and the first order diffraction signals.
9. The metrology measurement method of claim 2 , further comprising carrying out the repeated measuring for a plurality of angles and/or phases and/or wavelengths of the illumination to modify the relations between the zeroth and the first order diffraction signals.
10. The metrology measurement method of claim 1 , wherein the illumination is annular and the diffractive target comprises at least two periodic structures having at least two corresponding different pitches, and wherein a width of the annular illumination and the pitches are selected to separate overlap regions between the zeroth order diffraction signal and each of the first order diffraction signals from each of the respective periodic structures.
11. A metrology tool comprising:
a stationary illumination source configured to illuminate a stationary diffractive target,
a measurement unit that includes at least one detector, wherein the measurement unit is configured to measure, repeatedly, a scatterometry signal composed of a sum of a zeroth order diffraction signal and a first order diffraction signal, wherein the repeated measuring is carried out for a plurality of relations between the zeroth and the first order diffraction signals, while maintaining the diffractive target and the illumination source stationary, and
a processor configured to derive the first order diffraction signal from the measured sums.
12. The metrology tool of claim 11 , wherein the illuminating is coherent and the measuring is carried out in a pupil plane with respect to the target.
13. The metrology tool of claim 12 , wherein an illumination wavelength and a pitch of the target are selected to yield partial overlapping of the zeroth and the first order diffraction orders in the pupil plane.
14. The metrology tool of claim 11 , wherein the illuminating is incoherent and the measuring is carried out in a field plane with respect to the target.
15. The metrology tool of claim 14 , further comprising a mask at the pupil plane of the target, the mask configured to block a non-measured first order diffraction signal to yield the measured sum.
16. The metrology tool of claim 15 , wherein the target is an imaging target comprising at least two periodic structures, and the metrology tool is further configured to carry out at least two overlay measurements of the target, at least one with a blocked +1 diffraction order and at least another one with a blocked −1 diffraction order, and derive an overlay by averaging the at least two overlay measurements.
17. The metrology tool of claim 14 , further comprising an orders-separating optics configured to separate field signals relating to different diffraction orders, wherein the measurement unit comprises at least two of the detectors for measuring the separated field signals.
18. The metrology tool of claim 11 , wherein the measurement unit is further configured to carry out the repeated measuring for a plurality of phases as the relations between the zeroth and the first order diffraction signals.
19. The metrology tool of claim 18 , further comprising an optical phase scanner configured to carry out the repeated phase measurements.
20. The metrology tool of claim 11 , further configured to identify, during a training stage, and remove inaccuracy-introducing illumination points.
21. The metrology tool of claim 11 , wherein the measurement unit is further configured to carry out the repeated measuring for a plurality of angles and/or phases and/or wavelengths of the illumination to modify the relations between the zeroth and the first order diffraction signals.
22. The metrology tool of claim 18 , further comprising a beam displacer configured to modify an illumination beam incidence angle between the repeated measurements.
23. The metrology tool of claim 11 , wherein the illumination is annular and the diffractive target comprises at least two periodic structures having at least two corresponding different pitches, and wherein a width of the annular illumination and the pitches are selected to separate overlap regions between the zeroth order diffraction signal and each of the first order diffraction signals from each of the respective periodic structures.