Method and device for focusing in an inspection system
An inspection apparatus including: a substrate holder configured to hold a substrate; an aperture device; and an optical system configured to direct a first measurement beam of radiation onto the substrate, the first measurement beam having a first intensity distribution, and configured to direct a second focusing beam of radiation onto the substrate at a same time as the first measurement beam is directed on the substrate, the second focusing beam having a second intensity distribution, wherein at least part of the second intensity distribution is spatially separated from the first intensity distribution at least at the substrate and/or the aperture device.
1. A method comprising:
directing a first measurement beam of radiation onto a substrate, the first measurement beam having a first intensity distribution;
directing a second focusing beam of radiation onto the substrate at a same time as the first measurement beam is directed onto the substrate, the second focusing beam having a second intensity distribution and at least part of the second intensity distribution is spatially separated from the first intensity distribution at least at the substrate and/or an aperture device;
detecting at least part of the second focusing beam redirected by the substrate using a detector to produce a signal in response to detection of the at least part of the second focusing beam; and
controlling a relative location between the substrate and an optical focus point of the first measurement beam based on the signal.
2. The method of claim 1 , wherein the at least part of the second intensity distribution comprises portions on opposite sides of the first intensity distribution.
3. The method of claim 1 , wherein the at least part of the second intensity distribution comprises a ring of radiation and/or a plurality of poles of radiation.
4. The method of claim 1 , further comprising preventing at least a first portion of the first measurement beam redirected by the substrate and in an optical path toward the detector of the second focusing beam, from reaching the second focusing beam detector, while allowing at least a first portion of the second focusing beam redirected by the substrate to reach the second focusing beam detector.
5. The method of claim 4 , wherein preventing at least the first portion of the first measurement beam comprises blocking at least the first portion of the redirected first measurement beam using a first aperture device.
6. The method of claim 1 , further comprising preventing at least a second portion of the second focusing beam redirected by the substrate and in an optical path toward a detector of the first measurement beam, from reaching the first measurement beam detector, while allowing at least a second portion of the first measurement beam redirected by the substrate to reach the first measurement beam detector.
7. The method of claim 6 , wherein the preventing at least the second portion of the second focusing beam comprises blocking at least the second portion of the redirected second focusing beam using a second aperture device.
8. The method of claim 1 , wherein the first intensity distribution and/or the second intensity distribution is provided by an aperture device.
9. The method of claim 1 , wherein the first measurement beam and/or the second focusing beam is provided by a multi-core fiber or by a fiber bundle.
10. The method of claim 1 , wherein the first intensity distribution and/or the second intensity distribution is provided by a beam shaping optical element.
11. The method of claim 10 , wherein the beam shaping optical element comprises an axicon lens and/or a prism.
12. An inspection apparatus comprising:
a substrate holder configured to hold a substrate;
an aperture device; and
an optical system configured to direct a first measurement beam of radiation onto the substrate, the first measurement beam having a first intensity distribution, and configured to direct a second focusing beam of radiation onto the substrate at a same time as the first measurement beam is directed on the substrate, the second focusing beam having a second intensity distribution at least part of the second intensity distribution is spatially separated from the first intensity distribution at least at the substrate and/or the aperture device;
a detector configured to detect at least part of the second focusing beam redirected by the substrate and to produce a signal responsive to detection of the at least part of the second focusing beam; and
a control system configured to control a relative location between the substrate and an optical focus point of the first measurement beam based on the signal.
13. The apparatus of claim 12 , wherein the at least part of the second intensity distribution comprises portions on opposite sides of the first intensity distribution.
14. The apparatus of claim 12 , wherein the at least part of the second intensity distribution comprises a ring of radiation and/or a plurality of poles of radiation.
15. The apparatus of claim 12 , wherein the optical system is further configured to prevent at least a first portion of the first measurement beam redirected by the substrate and in an optical path toward the second focusing beam detector, from reaching the second focusing beam detector, while allowing at least a first portion of the second focusing beam redirected by the substrate to reach the second focusing beam detector.
16. The apparatus of claim 15 , wherein the optical system is configured to block at least the first portion of the redirected first measurement beam using a first aperture device.
17. The apparatus of claim 12 , further comprising a detector of the first measurement beam and wherein the optical system is further configured to prevent at least a second portion of the second focusing beam redirected by the substrate and in an optical path toward the first measurement beam detector, from reaching the first measurement beam detector, while allowing at least a second portion of the first measurement beam redirected by the substrate to reach the first measurement beam detector.
18. The apparatus of claim 17 , wherein the optical system is configured to block at least the second portion of the redirected second focusing beam using a second aperture device.
19. The apparatus of claim 12 , wherein the aperture device is configured to provide the first intensity distribution and/or the second intensity distribution.
20. The apparatus of claim 12 , further comprising a multi-core fiber or a fiber bundle configured to provide the first measurement beam and/or the second focusing beam.
21. The apparatus of claim 12 , further comprising a beam shaping optical element configured to provide the first intensity distribution and/or the second intensity distribution.
22. The apparatus of claim 21 , wherein the beam shaping optical element comprises an axicon lens and/or a prism.