Methods of forming patterns, and apparatuses comprising FinFETs

1. A method of forming a pattern, comprising:

providing a semiconductor substrate having rows extending along a first direction; the rows being spaced from one another along a second direction; each row comprising course regions that are to be included along patterned structures extending generally along the second direction; the rows being subdivided amongst first and second rows which alternate with one another along the second direction; the course regions within the first rows being staggered relative to the course regions within the second rows; the patterned structures comprising first segments extending along a third direction intermediate the first and second directions, and comprising second segments extending along a fourth direction intermediate the first and second directions and different from the third direction;

forming patterned masking material across the semiconductor substrate to define a first pattern comprising the first segments of the patterned structures, and to define a second pattern comprising the second segments of the patterned structures; and

forming the patterned structures within the first and second patterns defined by the patterned masking material.

2. The method of claim 1 wherein the first pattern is formed sequentially relative to the second pattern; and wherein the first segments of the patterned structures are formed within the first pattern prior to forming the second pattern.

3. The method of claim 2 wherein the first pattern is formed to comprise a plurality of substantially linear first trenches extending along the third direction; and wherein the second pattern is formed to comprise a plurality of substantially linear second trenches extending along the fourth direction; with the second trenches passing across the first trenches.

4. The method of claim 1 wherein the first and second patterns are formed simultaneously.

5. The method of claim 4 wherein the first and second patterns together form trenches that serpentine in a curvilinear manner along the second direction.

6. The method of claim 5 wherein the forming of the patterned masking material comprises:

forming substantially circular features over the semiconductor substrate; and

forming spacers along lateral peripheries of the substantially circular features to create the trenches.

7. A method of forming a pattern, comprising:

providing a semiconductor substrate having rows extending along a first direction; the rows being spaced from one another along a second direction; each row comprising course regions that are to be included along patterned structures extending generally along the second direction; the rows being subdivided amongst first and second rows which alternate with one another along the second direction; the course regions within the first rows being staggered relative to the course regions within the second rows;

forming islands of masking material over alternating course regions along the first and second rows;

forming spacers along lateral peripheries of the islands; the spacers along adjacent islands interconnecting to form a patterned mask which defines trenches that serpentine curvilinearly along the second direction; and

forming the patterned structures within the trenches.

8. The method of claim 7 wherein the patterned structures are first patterned structures and comprise projections extending above an upper surface of the semiconductor substrate, wherein the trenches are first trenches, and wherein the spacers are first spacers; the method comprising

forming second spacers aligned with the first patterned structures and defining second trenches which duplicate the first trenches and alternate with the first trenches along the first direction;

removing the first patterned structures to open the first trenches; and

forming second patterned structures within the first and second trenches.

9. The method of claim 8 wherein the second patterned structures are conductive lines extending curvilinearly along the second direction.

10. A method of forming a pattern, comprising:

providing a semiconductor substrate having rows extending along a first direction; the rows being spaced from one another along a second direction; each row comprising alternating first regions and second regions; the first regions being course regions that are to be included along patterned structures extending generally along the second direction; the rows being subdivided amongst first and second rows which alternate with one another along the second direction; the course regions within the first rows being staggered relative to the course regions within the second rows;

forming blocking material segments that cover every other space between the first and second regions along the first and second rows;

forming a first patterned mask across the semiconductor substrate and the blocking material segments; the first patterned mask defining a plurality of substantially linear first trenches extending along a third direction intermediate the first and second directions;

forming first segments of the patterned structures within the first trenches;

forming a second patterned mask across the semiconductor substrate, across the blocking material segments, and across the first segments of the patterned structures; the second pattern patterned mask defining a plurality of substantially linear second trenches extending along a fourth direction intermediate the first and second directions and different from the third direction; and

forming second segments of the patterned structures within the second trenches; the first and second segments of the patterned structures connecting with one another to form the patterned structures; each of said patterned structures extending in a zigzag manner across the first and rows along the second direction.

11. The method of claim 10 wherein the first and second segments of the patterned structures comprise conductive material, and wherein the patterned structures are conductive lines.

12. The method of claim 11 wherein the semiconductor substrate comprises silicon, and wherein the conductive material includes conductively-doped regions within the silicon.

13. An apparatus, comprising:

a plurality of finFETs arranged in line in a first direction, wherein each of the plurality of finFETs comprises a first pedestal serving as a first source/drain region, a second pedestal serving as a second source/drain region and a trough defining a channel region between the first and second source/drain regions, wherein the first and second source/drain regions of each of the plurality of finFETs are disposed in line in a second direction that is substantially perpendicular to the first direction, wherein an arrangement in the second direction of the first and second source/drain region of each of even-numbered ones of the plurality of finFETs is reverse to an arrangement in the second direction of the first and second source/drain regions of each of odd-numbered ones of the plurality of finFETs such that the first source/drain region of each of the even-numbered ones of the plurality of finFETs is sandwiched in the first direction between the second source/drain regions of corresponding adjacent two of the odd-numbered ones of the plurality of finFETs; and

a digit line formed in a zigzag pattern to electrically interconnect the first source/drain regions of the plurality of finFETs to each other.

14. The apparatus according to claim 13 , further comprising:

a plurality of data storage units, wherein each of the plurality of data storage units is electrically connect to an associated one of the second source/drain regions of the plurality of finFETs.

15. The apparatus according to claim 13 , wherein the second pedestal of each of the plurality of finFETs is greater in height than the first pedestal of each of the plurality of finFETs.

16. The apparatus according to claim 15 , further comprising a plurality of wordlines, wherein each of the plurality of wordlines is formed in the second direction between corresponding adjacent two of the plurality of finFETs to overlap the channel region of at least one of the corresponding two of the plurality of finFETs with an intervention of a gate dielectric.

17. The apparatus according to claim 16 , wherein the digit line crosses over each of the plurality of wordlines separately therefrom.

18. An apparatus, comprising:

a plurality of finFETs arranged in matrix including a plurality of rows and a plurality of columns, wherein each of the plurality of finFETs comprises a first pedestal serving as a first source/drain region, a second pedestal serving as a second source/drain region and a trough defining a channel region between the first and second source/drain regions, wherein the first and second source/drain regions of each of the plurality of finFETs are disposed in a row direction, wherein each of even-numbered ones of the plurality of rows is shifted in a row direction with respect to each of odd-numbered ones of the plurality of rows such that the first source/drain region of each of the finFETs belonging to an associated one of the even-numbered ones of the plurality of rows is sandwiched in a column direction between the second source/drain regions of adjacent two of the finFETs belonging to associated adjacent two of the odd-numbered ones of the plurality of rows; and

a plurality of digit lines, wherein each of the plurality of digit lines is formed in a zigzag pattern to electrically interconnect the first source/drain regions of the plurality of finFETs belonging to a corresponding one of the plurality of columns.

19. The apparatus according to claim 18 , further comprising a plurality of wordlines, wherein each of the plurality of wordlines is formed in the row direction between corresponding adjacent two of the plurality of rows to overlap the channel regions of the finFETs belonging to at least one of the corresponding adjacent two of the plurality of rows with an intervention of a gate dielectric.

20. The apparatus according to claim 19 , wherein each of the plurality of digit lines crosses over each of the plurality of wordlines separately therefrom.