IP Library Granted Patent US 10,090,459
Granted Patent B2
US 10,090,459 · App. 15/397,594 · Granted Oct 2, 2018

Magnetoresistive element

Inventors: Daisuke Watanabe (Kai, JP); Youngmin Eeh (Kawagoe, JP); Kazuya Sawada (Morioka, JP); Koji Ueda (Fukuoka, JP); Toshihiko Nagase (Tokyo, JP)
Assignee: TOSHIBA MEMORY CORPORATION
H01L43/10H01F1/0306H01F10/3286H01L27/228H01L43/08H01L43/12
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Quick Facts
Patent No.
US 10,090,459
App. No.
15/397,594
Granted
Oct 2, 2018
Kind
B2
Abstract

A magnetoresistive element includes a storage layer as a ferromagnetic layer which has magnetic anisotropy perpendicular to film planes, and in which a magnetization direction is variable, a reference layer as a ferromagnetic layer which has magnetic anisotropy perpendicular to film planes, and in which a magnetization direction is invariable, a tunnel barrier layer as a nonmagnetic layer formed between the storage layer and the reference layer, and a first underlayer formed on a side of the storage layer, which is opposite to a side facing the tunnel barrier layer, and containing amorphous W.

Claims (62)

1. A magnetic memory device comprising:

a first ferromagnetic layer having a variable magnetization direction;

a second ferromagnetic layer having a fixed magnetization direction;

a nonmagnetic layer provided between the first ferromagnetic layer and the second ferromagnetic layer;

a first underlayer comprising an amorphous W;

a second underlayer comprising a first ferromagnetic material, the first ferromagnetic material containing Co or Fe;

a first electrode provided below the second underlayer; and

a second electrode provided above the second ferromagnetic layer,

wherein a thickness of the first underlayer is 8 Å or more and 20 Å or less, and the first underlayer and the second underlayer comprise amorphous portions.

2. The magnetic memory device of claim 1 , wherein the first underlayer is in direct contact with the first ferromagnetic layer.

3. The magnetic memory device of claim 1 , wherein the first ferromagnetic layer comprises a second ferromagnetic material, the second ferromagnetic material containing Co or Fe.

4. The magnetic memory device of claim 3 , wherein the second underlayer further comprises a different material from the first ferromagnetic layer.

5. The magnetic memory device of claim 4 , wherein the different material contains B, Si, S, C, P, Al, Ge, or Ga.

6. The magnetic memory device of claim 1 , wherein the first ferromagnetic layer comprises a crystalline portion.

7. A magnetic memory device comprising:

a first ferromagnetic layer having a variable magnetization direction;

a second ferromagnetic layer having a fixed magnetization direction;

a nonmagnetic layer provided between the first ferromagnetic layer and the second ferromagnetic layer;

a first underlayer comprising an amorphous W;

a second underlayer comprising a first ferromagnetic material, the first ferromagnetic material containing Co or Fe;

a first electrode provided below the second underlayer;

a second electrode provided above the second ferromagnetic layer; and

a mask containing a conductive metal material,

wherein a thickness of the first underlayer is 8 Å or more and 20 Å or less.

8. A magnetic memory device comprising:

a first ferromagnetic layer having a variable magnetization direction;

a second ferromagnetic layer having a fixed magnetization direction;

a nonmagnetic layer provided between the first ferromagnetic layer and the second ferromagnetic layer;

a first underlayer comprising an amorphous W;

a second underlayer comprising a first ferromagnetic material, the first ferromagnetic material containing Co or Fe;

a first electrode provided below the second underlayer;

a second electrode provided above the second ferromagnetic layer; and

a shift cancelling layer provided on the second ferromagnetic layer,

wherein a thickness of the first underlayer is 8 Å or more and 20 Å or less.

9. The magnetic memory device of claim 8 , further comprising an interlayer provided between the second ferromagnetic layer and the shift cancelling layer.

10. The magnetic memory device of claim 9 , wherein the interlayer contains Ru.

11. A magnetic memory device comprising:

a first ferromagnetic layer having a variable magnetization direction and comprising a crystal portion;

a second ferromagnetic layer having a fixed magnetization direction;

a nonmagnetic layer provided between the first ferromagnetic layer and the second ferromagnetic layer;

a first underlayer being in direct contact with the first ferromagnetic layer and containing amorphous W;

a second underlayer being in direct contact with the first underlayer and comprising an amorphous portion;

a first electrode provided below the second underlayer;

a second electrode provided above the second ferromagnetic layer; and

a mask containing a conductive metal material, wherein the mask is provided between the second ferromagnetic layer and the second electrode.

12. The magnetic memory device of claim 11 , wherein the first ferromagnetic layer is lattice matched with the nonmagnetic layer at an interface between the first ferromagnetic layer and the nonmagnetic layer.

13. The magnetic memory device of claim 12 , wherein the first underlayer is not lattice matched with the first ferromagnetic layer at an interface between the first underlayer and the first ferromagnetic layer.

14. The magnetic memory device of claim 11 , wherein the first ferromagnetic layer comprises a crystalline portion.

15. The magnetic memory device of claim 11 , further comprising a shift cancelling layer provided on the second ferromagnetic layer.

16. The magnetic memory device of claim 15 , further comprising an interlayer provided between the second ferromagnetic layer and the shift cancelling layer.

17. The magnetic memory device of claim 16 , wherein the interlayer contains Ru.

18. The magnetic memory device of claim 7 , wherein the mask is provided between the second ferromagnetic layer and the second electrode.

19. A magnetic memory device comprising:

a first ferromagnetic layer having a variable magnetization direction and comprising a crystal portion;

a second ferromagnetic layer having a fixed magnetization direction;

a nonmagnetic layer provided between the first ferromagnetic layer and the second ferromagnetic layer;

a first underlayer being in direct contact with the first ferromagnetic layer and containing amorphous W;

a second underlayer being in direct contact with the first underlayer and comprising an amorphous portion;

a first electrode provided below the second underlayer;

a second electrode provided above the second ferromagnetic layer; and

a shift cancelling layer provided on the second ferromagnetic layer.

20. The magnetic memory device of claim 19 , further comprising an interlayer provided between the second ferromagnetic layer and the shift cancelling layer.

Assignments (5)
MERGER Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K. PANGEA
Reel/Frame 055659/0471 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 055669/0001 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055669/0401 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 14, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043194/0563 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 3, 2017
From: WATANABE, DAISUKE; EEH, YOUNGMIN; SAWADA, KAZUYA; UEDA, KOJI; NAGASE, TOSHIHIKO
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 040832/0644 →
Continuity (3)
Division 13963734 · Aug 9, 2013
Provisional Application 61804467 · Mar 22, 2013
Related Publication 20170117459A1 · Apr 27, 2017
Cited By (5)
US 12,284,811 US 12,310,251 US 12,329,038 US 12,356,866 US 12,501,837