IP Library › Granted Patent US 12,329,038
Granted Patent B2
US 12,329,038 · App. 17/549,248 · Granted Jun 10, 2025

Magnetoresistance memory device

Inventors: Taiga Isoda (Seoul, KR); Eiji Kitagawa (Seoul, KR); Young Min Eeh (Seongnam-si, KR); Tadaaki Oikawa (Seoul, KR); Kazuya Sawada (Seoul, KR)
Assignee: Kioxia Corporation
H10N50/10H10B61/00H10N50/80H10N50/85
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Quick Facts
Patent No.
US 12,329,038
App. No.
17/549,248
Granted
Jun 10, 2025
Kind
B2
Abstract

A magnetoresistance memory device includes first, second, third and fourth ferromagnetic layers; a first and second ferromagnetic oxide layers; a metal layer; an insulating layer. The second ferromagnetic layer includes one of iron and cobalt included in the first ferromagnetic oxide layer and one element of a first element group. The second ferromagnetic oxide layer includes an oxide of an alloy of the one of iron and cobalt included in the second ferromagnetic oxide layer with a first element, which has a standard electrode potential lower than that of iron or cobalt and that of the one element of the first element group included in the second ferromagnetic layer.

Claims (12)

1. A magnetoresistive memory device comprising:

a first ferromagnetic layer;

a first ferromagnetic oxide layer including one of iron and cobalt;

a first metal layer between the first ferromagnetic layer and the first ferromagnetic oxide layer, wherein the first metal layer antiferromagnetically couples the first ferromagnetic layer and the first ferromagnetic oxide layer, and has a surface in contact with the first ferromagnetic layer;

a second ferromagnetic layer on a surface of the first ferromagnetic oxide layer that is opposite to the first metal layer, the second ferromagnetic layer including the one of iron and cobalt that is included in the first ferromagnetic oxide layer, and having an easy magnetization axis extending in a direction across an interface with the first metal layer;

a second metal layer provided on a surface of the second ferromagnetic layer that is opposite to the first ferromagnetic layer;

a third ferromagnetic layer on the second metal layer;

an insulating layer on the third ferromagnetic layer; and

a fourth ferromagnetic layer on the insulating layer.

2. The device according to claim 1 , wherein the second metal layer includes one or more of molybdenum, tungsten, and tantalum.

3. The device according to claim 2 , wherein the first metal layer includes ruthenium or iridium.

4. The device according to claim 3 , wherein the first ferromagnetic oxide layer includes an oxide of an alloy of iron or cobalt with one or more of boron, scandium, chromium, manganese, nickel, ruthenium, palladium, iridium, platinum, yttrium, neodymium, samarium, gadolinium, terbium, and dysprosium.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 13, 2021
From: ISODA, TAIGA; KITAGAWA, EIJI; EEH, YOUNG MIN; OIKAWA, TADAAKI; SAWADA, KAZUYA
To: KIOXIA CORPORATION
Reel/Frame 058373/0845 →
Priority Claims (1)
JP 2021-147086 · Sep 9, 2021 · national
Continuity (1)
Related Publication 20230072970A1 · Mar 9, 2023
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