Wordline sidewall recess for integrating planar selector device
Systems and methods for fabricating a non-volatile memory with integrated selector devices (or steering devices) are described. Each memory cell within a memory array may be placed in series with a selector device, such as a diode or other non-linear current-voltage device, in order to reduce leakage currents through unselected memory cells during a memory operation. In some cases, fabricating a selector device within a memory hole region may be difficult due to the dimensions of the selector device. A wordline sidewall recess process or a wordline sidewall recess with a replacement metal gate process may be used to integrate selector devices with memory cells outside of the memory hole region. By fabricating non-linear selector devices outside of the memory hole region, the area of the memory array may be reduced.
1. A method for fabricating a portion of a memory array, comprising:
forming a stack comprising a selector layer, a word line layer, and a dielectric layer;
etching a memory hole extending through at least a portion of the stack;
recessing a portion of the word line layer, the recessing the portion of the word line layer includes recessing the portion of the word line layer using an etching process that removes the portion of the word line layer without removing a threshold amount of a dielectric material of the dielectric layer;
filling the portion of the word line layer with a first dielectric material subsequent to the recessing the portion of the word line layer;
depositing a memory material within the memory hole; and
depositing a conducting material within the memory hole.
2. The method of claim 1 , wherein:
the selector layer comprises a non-linear switching element.
3. The method of claim 1 , wherein:
the selector layer comprises a diode.
4. The method of claim 1 , wherein:
the selector layer comprises a layer of a chalcogenide material;
the word line layer comprises a layer of titanium nitride; and
the dielectric layer comprises a layer of silicon dioxide.
5. The method of claim 1 , wherein:
the depositing the conducting material within the memory hole is performed subsequent to the depositing the memory material within the memory hole.
6. The method of claim 1 , wherein:
the memory hole comprises a cylindrical memory hole.
7. The method of claim 1 , wherein:
the stack is arranged above one or more vertical thin-film transistors.
8. The method of claim 1 , wherein:
the recessing the portion of the word line layer includes recessing the portion of the word line layer using a timed etch.
9. The method of claim 1 , wherein:
the memory material comprises a reversible resistance-switching material.
10. A method, comprising:
depositing a dielectric layer, a selector layer, and a second sacrificial layer;
etching a memory hole extending through the dielectric layer, the selector layer, and the second sacrificial layer;
recessing a portion of the second sacrificial layer;
filling the portion of the second sacrificial layer with a second dielectric material;
removing the remainder of the second sacrificial layer to form a space subsequent to filling the portion of the second sacrificial layer with the second dielectric material and filling the space with a conducting material; and
depositing a memory material and a second conducting material within the memory hole.
11. The method of claim 10 , wherein:
the selector layer comprises a non-linear steering element.
12. The method of claim 10 , wherein:
the selector layer comprises a diode.
13. The method of claim 10 , wherein:
the selector layer comprises a layer of a chalcogenide material;
the dielectric layer comprises a layer of aluminum oxide;
the second dielectric material comprises a layer of aluminum oxide; and
the memory material comprises a reversible resistance-switching material.
14. The method of claim 10 , further comprising:
depositing a first sacrificial layer above the dielectric layer;
recessing a portion of the first sacrificial layer; and
filling the portion of the first sacrificial layer with a first conductive material.
15. The method of claim 14 , wherein:
the first conductive material comprises titanium nitride.
16. The method of claim 14 , wherein:
the selector layer is arranged between the first sacrificial layer and the second sacrificial layer.
17. A method, comprising:
depositing a dielectric layer;
depositing a selector layer corresponding with a non-ohmic device above the dielectric layer;
depositing a sacrificial layer above the selector layer;
etching a memory hole extending through the sacrificial layer, the selector layer, and the dielectric layer;
recessing a portion of the sacrificial layer;
filling the recessed portion of the sacrificial layer with a second dielectric material;
replacing the remainder of the sacrificial layer with a conducting material; and
depositing a memory material and a second conducting material within the memory hole.
18. The method of claim 17 , wherein:
the non-ohmic device comprises a diode.
19. The method of claim 17 , wherein:
the dielectric layer comprises a layer of aluminum oxide; and
the second dielectric material comprises aluminum oxide.