IP Library Granted Patent US 10,289,789
Granted Patent B2
US 10,289,789 · App. 15/601,697 · Granted May 14, 2019

System for designing integrated circuit layout and method of making the integrated circuit layout

Inventors: Shang-Chih Hsieh (Yangmei, TW); Hui-Zhong Zhuang (Kaohsiung, TW); Ting-Wei Chiang (New Taipei, TW); Chun-Fu Chen (Chiayi, TW); Hsiang-Jen Tseng (Hsinchu, TW)
Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
G06F17/5072H01L21/768H01L27/0207H01L27/11807H01L2027/11875H01L2924/0002
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Quick Facts
Patent No.
US 10,289,789
App. No.
15/601,697
Granted
May 14, 2019
Kind
B2
Abstract

An integrated circuit designing system includes a non-transitory storage medium and a hardware processor. The non-transitory storage medium is encoded with a layout of a standard cell corresponding to a predetermined manufacturing process. The predetermined manufacturing process has a nominal minimum pitch, along a predetermined direction, of metal lines. The layout of the standard cell has a cell height along the predetermined direction, and the cell height is a non-integral multiple of the nominal minimum pitch. The hardware processor communicatively coupled with the non-transitory storage medium and configured to execute a set of instructions for generating an integrated circuit layout based on the layout of the standard cell and the nominal minimum pitch.

Claims (11)

1. A method of generating an integrated circuit layout, comprising:

receiving, by a hardware processor, a layout of a standard cell, the standard cell corresponding to a predetermined manufacturing process, the predetermined manufacturing process having a nominal minimum pitch of metal lines along a predetermined direction, the layout of the standard cell having a cell height along the predetermined direction, and the cell height is a non-integral multiple of the nominal minimum pitch;

placing the layout of the standard cell for the integrated circuit layout, all input/output signal ports of the standard cell overlapping a first set of a plurality of virtual grid lines; and

placing layout patterns of one or more metal lines for the integrated circuit layout, the layout patterns of the one or more metal lines overlapping a second set of the plurality of virtual grid lines,

the plurality of virtual grid lines being in parallel, and two adjacent lines of the plurality of virtual grid lines being separated by the nominal minimum pitch.

2. The method of claim 1 , wherein a ratio of the cell height to the nominal minimum pitch ranges from 6 to 16.

3. The method of claim 2 , wherein the ratio of the cell height to the nominal minimum pitch is 7.5.

4. The method of claim 1 , wherein a ratio of the cell height to the nominal minimum pitch is p/q, and p and q are integers.

5. The method of claim 1 , wherein the standard cell is a logic gate cell.

6. The method of claim 5 , wherein the logic gate cell is an AND, OR, NAND, NOR, XOR, AOI, OAI, MUX, Flip-flop, BUFF, Latch, INV, delay, or clock cell.

7. The method of claim 1 , further comprising manufacturing an integrated circuit using the integrated circuit layout.

Assignments (2)
CORRECTIVE ASSIGNMENT TO CORRECT THE EXECUTION DATE (S) OF THE INVENTORS PREVIOUSLY RECORDED AT REEL: 042459 FRAME: 0920. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT . Recorded Jun 5, 2017
From: HSIEH, SHANG-CHIH; ZHUANG, HUI-ZHONG; CHIANG, TING-WEI; CHEN, CHUN-FU; TSENG, HSIANG-JEN
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 042757/0097 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 22, 2017
From: HSIEH, SHANG-CHIH; ZHUANG, HUI-ZHONG; CHIANG, TING-WEI; CHEN, CHUN-FU; TSENG, HSIANG-JEN
To: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
Reel/Frame 042459/0920 →
Continuity (3)
Division 14253205 · Apr 15, 2014
Provisional Application 61818705 · May 2, 2013
Related Publication 20170255739A1 · Sep 7, 2017