IP Library Granted Patent US 10,090,456
Granted Patent B2
US 10,090,456 · App. 15/662,114 · Granted Oct 2, 2018

Magnetic memory element including oxide/metal composite layers formed adjacent to fixed layer

Inventors: Yiming Huai (Pleasanton, CA); Huadong Gan (Fremont, CA); Zihui Wang (Milpitas, CA)
Assignee: Avalanche Technology, Inc.
H01L43/02H01F10/14H01F10/16H01F10/3222H01L27/228H01L43/08H01L43/10
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Quick Facts
Patent No.
US 10,090,456
App. No.
15/662,114
Granted
Oct 2, 2018
Kind
B2
Abstract

The present invention is directed to a magnetic tunnel junction (MTJ) memory element including a magnetic free layer structure and a magnetic reference layer structure with an insulating tunnel junction layer interposed therebetween; a magnetic fixed layer exchange coupled to the magnetic reference layer structure through an anti-ferromagnetic coupling layer; a magnesium oxide layer formed adjacent to the magnetic fixed layer; and a metal layer comprising nickel and chromium formed adjacent to the magnesium oxide layer. The magnetic reference layer structure includes a first and a second magnetic reference layers with a first perpendicular enhancement layer (PEL) interposed therebetween. The first and second magnetic reference layers have a first invariable magnetization direction substantially perpendicular to layer planes thereof. The magnetic fixed layer has a second invariable magnetization direction opposite to the first invariable magnetization direction. The magnetic free layer structure includes one or more magnetic free layers having a variable magnetization direction substantially perpendicular to layer planes thereof.

Claims (30)

1. A magnetic tunnel junction (MTJ) memory element comprising:

a magnetic free layer structure and a magnetic reference layer structure with an insulating tunnel junction layer interposed therebetween;

a magnetic fixed layer exchange coupled to said magnetic reference layer structure through an anti-ferromagnetic coupling layer;

a magnesium oxide layer formed adjacent to said magnetic fixed layer opposite said anti-ferromagnetic coupling layer; and

a metal layer comprising nickel and chromium formed adjacent to said magnesium oxide layer opposite said magnetic fixed layer,

wherein said magnetic reference layer structure includes a first magnetic reference layer formed adjacent to said insulating tunnel junction layer and a second magnetic reference layer separated from said first magnetic reference layer by a first perpendicular enhancement layer (PEL), said first and second magnetic reference layers having a first invariable magnetization direction substantially perpendicular to layer planes thereof, said magnetic fixed layer has a second invariable magnetization direction that is substantially perpendicular to a layer plane thereof and is opposite to said first invariable magnetization direction, said magnetic free layer structure includes one or more magnetic free layers having a variable magnetization direction substantially perpendicular to layer planes thereof.

2. The MTJ memory element of claim 1 , wherein said magnetic free layer structure includes a magnetic free layer that comprises cobalt, iron, and boron.

3. The MTJ memory element of claim 1 , wherein said magnetic free layer structure includes a first magnetic free layer formed adjacent to said insulating tunnel junction layer and a second magnetic free layer separated from said first magnetic free layer by a second PEL, said first and said second magnetic free layers having respectively a first and a second variable magnetization directions that are substantially perpendicular to layer planes thereof and are parallel to each other.

4. The MTJ memory element of claim 3 , wherein said first magnetic free layer comprises cobalt, iron, and boron.

5. The MTJ memory element of claim 3 , wherein said second PEL is made of tungsten, molybdenum, tantalum, hafnium, zirconium, niobium, or any combination thereof.

6. The MTJ memory element of claim 1 , wherein said first magnetic reference layer comprises cobalt, iron, and boron.

7. The MTJ memory element of claim 1 , wherein said magnetic fixed layer has a multilayer structure formed by interleaving one or more layers of a first material with one or more layers of a second material, at least one of said first and second materials being magnetic.

8. The MTJ memory element of claim 7 , wherein said first material is cobalt or a material comprising cobalt and iron.

9. The MTJ memory element of claim 7 , wherein said second material is nickel, or platinum, or palladium.

10. A magnetic tunnel junction (MTJ) memory element comprising:

a magnetic free layer structure and a magnetic reference layer structure with an insulating tunnel junction layer interposed therebetween;

a magnetic fixed layer exchange coupled to said magnetic reference layer structure through an anti-ferromagnetic coupling layer;

an oxide layer formed adjacent to said magnetic fixed layer opposite said anti-ferromagnetic coupling layer; and

a metal layer comprising nickel formed adjacent to said oxide layer opposite said magnetic fixed layer,

wherein said magnetic reference layer structure includes a first magnetic reference layer formed adjacent to said insulating tunnel junction layer and a second magnetic reference layer separated from said first magnetic reference layer by a first perpendicular enhancement layer (PEL), said first and second magnetic reference layers having a first invariable magnetization direction substantially perpendicular to layer planes thereof, said magnetic fixed layer has a second invariable magnetization direction that is substantially perpendicular to a layer plane thereof and is opposite to said first invariable magnetization direction, said magnetic free layer structure includes one or more magnetic free layers having a variable magnetization direction substantially perpendicular to layer planes thereof.

11. The MTJ memory element of claim 10 , wherein said oxide layer comprises magnesium.

12. The MTJ memory element of claim 10 , wherein said oxide layer is made of chromium oxide, molybdenum oxide, or tungsten oxide.

13. The MTJ memory element of claim 10 , wherein said oxide layer is made of titanium oxide, zirconium oxide, or hafnium oxide.

14. The MTJ memory element of claim 10 , wherein said oxide layer is made of vanadium oxide, niobium oxide, or tantalum oxide.

15. The MTJ memory element of claim 10 , wherein said metal layer further comprises chromium.

16. The MTJ memory element of claim 10 , wherein said metal layer further comprises titanium.

17. The MTJ memory element of claim 10 , wherein said magnetic free layer structure includes a magnetic free layer that comprises cobalt, iron, and boron.

18. The MTJ memory element of claim 10 , wherein said magnetic fixed layer has a multilayer structure formed by interleaving one or more layers of a first material with one or more layers of a second material, at least one of said first and second materials being magnetic.

19. The MTJ memory element of claim 18 , wherein said first material is cobalt or a material comprising cobalt and iron.

20. The MTJ memory element of claim 18 , wherein said second material is nickel, or platinum, or palladium.

Assignments (6)
SECURITY INTEREST Recorded Mar 18, 2022
From: AVALANCHE TECHNOLOGY, INC.
To: STRUCTURED ALPHA LP
Reel/Frame 059436/0203 →
SECURITY INTEREST Recorded Apr 19, 2021
From: AVALANCHE TECHNOLOGY, INC.
To: STRUCTURED ALPHA LP
Reel/Frame 057213/0050 →
SECURITY INTEREST Recorded Apr 19, 2021
From: AVALANCHE TECHNOLOGY, INC.
To: STRUCTURED ALPHA LP
Reel/Frame 057217/0674 →
SECURITY INTEREST Recorded Jul 8, 2020
From: AVALANCHE TECHNOLOGY, INC.
To: SILICON VALLEY BANK
Reel/Frame 053156/0223 →
SECURITY INTEREST Recorded Feb 13, 2020
From: AVALANCHE TECHNOLOGY, INC.
To: STRUCTURED ALPHA LP
Reel/Frame 051930/0396 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 27, 2017
From: HUAI, YIMING; GAN, HUADONG; WANG, ZIHUI
To: AVALANCHE TECHNOLOGY, INC.
Reel/Frame 043121/0954 →
Continuity (10)
Continuation 15440948 · Feb 23, 2017
Continuation 15174754 · Jun 6, 2016
Continuation 14173145 · Feb 5, 2014
Continuation In Part 14053231 · Oct 14, 2013
Continuation In Part 14026163 · Sep 13, 2013
Continuation In Part 13277187 · Oct 19, 2011
Continuation In Part 13029054 · Feb 16, 2011
Continuation In Part 12965733 · Dec 10, 2010
Provisional Application 61483314 · May 6, 2011
Related Publication 20170324027A1 · Nov 9, 2017