Select device for memory cell applications
The present disclosure includes select devices and methods of using select device for memory cell applications. An example select device includes a first electrode having a particular geometry, a semiconductor material formed on the first electrode and a second electrode having the particular geometry with formed on the semiconductor material, wherein the select device is configured to snap between resistive states in response to signals that are applied to the select device.
1. A method of forming a memory cell, the method comprising:
forming a select device, wherein the select device includes:
a first electrode having a particular geometry;
a first heater formed on the first electrode;
a semiconductor material formed on the first heater;
a second heater formed on the semiconductor material; and
a second electrode having the particular geometry formed on the second heater; and
forming a storage element in series with the select device.
2. The method of claim 1 , wherein forming the select device is a back end of line (BEOL) process.
3. The method of claim 1 , wherein a width of the particular geometry is based on an operating voltage associated with the memory cell.
4. The method of claim 1 , wherein a composition of the semiconductor material is based on an operating voltage associated with the memory cell.
5. The method of claim 1 , wherein the method includes forming the select device at a temperature of not greater than approximately 450° C.
6. The method of claim 1 , wherein forming the select device includes the first electrode having a circular geometry.
7. The method of claim 1 , wherein forming the select device includes the first electrode having a quasi-square geometry.
8. A method of forming a memory cell, the method comprising:
forming a select device, wherein forming the select device includes:
forming a first heater;
forming a first electrode on the first heater;
forming a semiconductor material on the first electrode;
forming a second electrode on the semiconductor material; and
forming a second heater on the second electrode; and
forming a storage element in series with the select device.
9. The method of claim 8 , wherein the method includes forming a vacuum between the select device and an adjacent select device of an array.
10. The method of claim 8 , wherein the method includes doping the first and second electrodes with an optical absorber.
11. The method of claim 8 , wherein forming the first electrode includes forming a first laminate portion that includes a metal, a resistive material, or another semiconductor material.
12. The method of claim 8 , wherein forming the first heater includes forming a metal.
13. A method of forming a memory cell, the method comprising:
forming a select device of the memory cell, wherein the select device includes:
a first electrode and a second electrode;
a first heater and a second heater, wherein the first heater is coupled to the first electrode and the second heater is coupled to the second electrode; and
a semiconductor material between the first and second electrodes, wherein the first heater and first electrode are adjacent to a first surface of the semiconductor material and the second heater and second electrode are adjacent to a second surface of the semiconductor material; and
wherein the select device is configured to:
snap from a first resistive state to a second resistive state in response to providing a first signal provided thereto, wherein the first signal is greater than a threshold voltage; and
remain in the first resistive state in response to a second signal provided thereto, wherein the second signal is less than the threshold voltage; and
forming a storage element in series with the select device.
14. The method of claim 13 , wherein the method includes forming the select device such that:
a first current density is provided to the storage element in response to the select device snapping from the first resistive state to the second resistive state; and
a second current density is provided to the storage element in response to the select device remaining in the first resistive state.
15. The method of claim 14 , wherein the first current density is greater than 1 MA/cm 2 and the second current density is less than or equal to 1 MA/cm 2 .
16. The method of claim 15 , wherein the method includes forming the select device such that the select device snaps from the second resistive state to the first resistive state in response to removing the first signal.
17. The method of claim 13 , wherein the method includes forming the select device such that the select device reaches a temperature greater than 600° C. in response to providing the first signal to the select device.
18. The method of claim 13 , wherein the method includes forming the select device such that:
the select device snaps from the first resistive state to the second resistive state in response to reaching a threshold temperature greater than 600° C.; and
the select device repeatedly reaches the threshold temperature.
19. The method of claim 13 , wherein forming the select device includes the first heater formed of a metal.
20. The method of claim 13 , wherein the threshold voltage is approximately 2.5 V.