Method of manufacturing an electronic device and electronic device manufactured thereby
Various aspects of this disclosure provide a method of manufacturing an electronic device and an electronic device manufactured thereby. As a non-limiting example, various aspects of this disclosure provide a method of manufacturing an electronic device, and an electronic device manufactured thereby, that utilizes ink to form an intermetallic bond between respective conductive interconnection structures of a semiconductor die and a substrate.
1. A method of manufacturing an electronic device, the method comprising:
providing a substrate comprising a substrate conductive interconnection structure;
providing a semiconductor die comprising a die conductive interconnection structure protruding from a first side of the die;
coating at least a first surface of the die conductive interconnection structure and/or at least a first surface of the substrate conductive interconnection structure with an ink that comprises metal; and
bonding the first surface of the die conductive interconnection structure and the first surface of the substrate conductive interconnection structure, wherein said bonding forms a solderless bonding region comprising a first end of the substrate conductive interconnection structure and a first end of the die conductive interconnection structure, wherein the solderless bonding region comprises:
metal from the first end of the die conductive interconnection structure;
metal from the first end of the substrate conductive interconnection structure;
at least a portion of the metal from the ink; and
an intermetallic bond comprising the metal from the first end of the die conductive interconnection structure, the metal from the first end of the substrate conductive interconnection structure, and the at least a portion of the metal from the ink.
2. The method of claim 1 , wherein the substrate comprises a wafer or panel of substrates.
3. The method of claim 1 , wherein said providing the semiconductor die comprises providing a semiconductor wafer comprising the semiconductor die and one or more other semiconductor dies, the method comprising after said providing the semiconductor wafer, singulating the semiconductor die from the provided semiconductor wafer.
4. The method of claim 1 , wherein the die conductive interconnection structure comprises a metal pillar.
5. The method of claim 1 , wherein the first surface of the substrate conductive interconnection structure is non-planar.
6. The method of claim 1 , wherein said coating comprises coating at least the first surface of the die conductive interconnection structure with the ink.
7. The method of claim 1 , wherein said coating comprises dipping at least a first respective surface of the die conductive interconnection structure and/or a first respective surface of the substrate conductive interconnection structure in the ink.
8. The method of claim 1 , wherein:
the first surface of the die conductive interconnection structure is convex; and
the first surface of the substrate conductive interconnection structure is concave.
9. The method of claim 1 , wherein the metal comprises: metal ions, metal molecules, and/or metal particles, dispersed in a solvent.
10. The method of claim 1 , wherein the solderless bonding region comprises a conductive bulge protruding laterally from a lateral side of the die conductive interconnection structure.
11. A method of manufacturing an electronic device, the method comprising:
providing a substrate comprising a substrate conductive interconnection structure;
providing a semiconductor die comprising a die conductive interconnection structure protruding from a first side of the die; and
pressing a first surface of the die conductive interconnection structure and a first surface of the substrate conductive interconnection structure together with an interface layer comprising at least one layer of ink at an interface between the first surface of the die conductive interconnection structure and the first surface of the substrate conductive interconnection structure,
wherein after said pressing, the interface layer has a substantially consistent thickness,
wherein said pressing comprises performing said pressing utilizing a thermocompression bonding process.
12. The method of claim 11 , wherein said bonding utilizing a thermocompression bonding process comprises performing thermocompression bonding without ultrasonic vibration.
13. The method of claim 11 , wherein said pressing comprises pressing the first surface of the die conductive interconnection structure and the first surface of the substrate conductive interconnection structure together with only the ink between the first surface of the die conductive interconnection structure and the first surface of the substrate conductive interconnection structure.
14. A method of manufacturing an electronic device, the method comprising:
providing a substrate comprising a substrate conductive interconnection structure;
providing a semiconductor die comprising a die conductive interconnection structure protruding from a first side of the die; and
pressing a first surface of the die conductive interconnection structure and a first surface of the substrate conductive interconnection structure together with an interface layer comprising at least one layer of ink at an interface between the first surface of the die conductive interconnection structure and the first surface of the substrate conductive interconnection structure,
wherein after said pressing, the interface layer has a substantially consistent thickness, and
wherein the first surface of the substrate conductive interconnection structure is non-planar.
15. The method of claim 14 , wherein:
the first surface of the die conductive interconnection structure is convex; and
the first surface of the substrate conductive interconnection structure is concave.
16. An electronic device comprising:
a substrate comprising a substrate conductive interconnection structure;
a semiconductor die comprising a die conductive interconnection structure; and
a solderless bonding region including a first end of the substrate conductive interconnection structure and a first end of the die conductive interconnection structure, wherein the solderless bonding region comprises:
metal from the first end of the die conductive interconnection structure;
metal from the first end of the substrate conductive interconnection structure;
metal from an ink; and
an intermetallic bond comprising the metal from the first end of the die conductive interconnection structure, the metal from the first end of the substrate conductive interconnection structure, and the at least a portion of the metal from the ink.
17. The electronic device of claim 16 , wherein a first surface at the first end of the substrate conductive interconnection structure is non-planar.
18. The electronic device of claim 16 , wherein the substrate conductive interconnection structure comprises copper, the die conductive interconnection structure comprises copper, and the metal from the ink comprises silver.
19. The electronic device of claim 18 , wherein the ink directly contacts the copper of the substrate conductive interconnection structure and the copper of the die conductive interconnection structure.