Semiconductor device and a method of manufacturing the same
A technique which improves the reliability in coupling between a bump electrode of a semiconductor chip and wiring of a mounting substrate, more particularly a technique which guarantees the flatness of a bump electrode even when wiring lies in a top wiring layer under the bump electrode, thereby improving the reliability in coupling between the bump electrode and the wiring formed on a glass substrate. Wiring, comprised of a power line or signal line, and a dummy pattern are formed in a top wiring layer beneath a non-overlap region of a bump electrode. The dummy pattern is located to fill the space between wiring to reduce irregularities caused by the wiring and space in the top wiring layer. A surface protection film formed to cover the top wiring layer is flattened by CMP.
1. A semiconductor device comprising:
a semiconductor substrate having a first side extending along a first direction, a second side extending along the first direction and being opposite to the first side, a third side extending along a second direction perpendicular to the first direction, a fourth side extending along the second direction and being opposite to the third side,
a multilayer wiring structure formed over the semiconductor substrate;
a plurality of pad electrodes formed in an uppermost layer of the multilayer wiring structure, the pad electrodes being arranged along the first direction in a plan view;
a plurality of dummy electrodes formed in the uppermost layer of the multilayer wiring structure;
a first insulating film formed over the pad electrodes and the dummy electrodes;
a plurality of bump electrodes formed over the first insulating film and electrically connected to the plurality of the pad electrodes, respectively,
wherein each of the pad electrodes has a first width along the first direction and a second width along the second direction in the plan view, the first width being greater than the second width, and
wherein each of the dummy electrodes has a third width along the first direction and a fourth width along the second direction in the plan view, the fourth width being greater than the third width.
2. The semiconductor device according to claim 1 ,
wherein the first width is greater than the third width.
3. The semiconductor device according to claim 1 ,
wherein each of the bump electrodes has a fifth width along the first direction and a sixth width along the second direction in the plan view, the sixth width being greater than the fifth width.
4. The semiconductor device according to claim 1 ,
wherein the dummy electrodes are disposed between the pad electrodes.
5. A semiconductor device according to claim 1 ,
wherein a part of the plurality of the dummy electrodes is disposed under one of the bump electrodes in a plan view.
6. A semiconductor device according to claim 1 ,
wherein the first insulating film includes a silicon oxide film and a silicon nitride film formed over the silicon oxide film.
7. A semiconductor device according to claim 6 ,
wherein a top surface of the silicon oxide film is flattened by a polishing treatment.
8. A semiconductor device according to claim 1 ,
wherein a length of the first side is larger than a length of the third side.
9. A semiconductor device according to claim 8 ,
wherein the semiconductor device is an LCD driver for a liquid crystal display.
10. A semiconductor device according to claim 1 ,
wherein the bump electrodes include Au.