IP Library › Granted Patent US 12,603,629
Granted Patent B2
US 12,603,629 · App. 15/769,698 · Granted Apr 14, 2026

Composite structure and associated production method

Inventors: Pascal Guenard (Froges, FR); Ionut Radu (Crolles, FR); Didier Landru (Le Champ-près-Froges, FR); Eric Desbonnets (Lumbin, FR)
Assignee: Soitec
H03H3/04H03H9/02031H03H9/02102H03H9/02133H03H9/02574H03H9/0504H10N30/072H10N30/704H10N30/88H03H2003/0407H10N30/8542
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,603,629
App. No.
15/769,698
Granted
Apr 14, 2026
Kind
B2
Abstract

A composite structure for an acoustic wave device comprising a heterostructure includes: a useful layer of piezoelectric material, having a first face and a second face, the first face being arranged at a first bonding interface on a support substrate having a coefficient of thermal expansion less than that of the useful layer, wherein the composite structure further comprises a functional layer, an entire surface of which is arranged at a second bonding interface on the second face of the useful layer and having a coefficient of thermal expansion less than that of the useful layer. Methods are used for producing such a composite structure.

Claims (32)

1 . A composite structure for an acoustic wave device comprising a heterostructure, including:

a useful layer of piezoelectric material, having a first face and a second face, the first face being arranged at a first bonding interface between the useful layer and a support substrate, the support substrate having a lower coefficient of thermal expansion than that of the useful layer; and

a functional layer, the functional layer being substantially planar and having a substantially planar main face, the entirety of the substantially planar main face being arranged on the second face of the useful layer at a second bonding interface between the functional layer and the useful layer, the functional layer having a lower coefficient of thermal expansion than that of the useful layer,

wherein the functional layer exhibits a substantially uniform thickness along a longitudinal axis of the composite structure, and

wherein an adhesion energy of the first bonding interface between the useful layer and the support substrate of the heterostructure is greater than or equal to 1500 mJ/m 2 .

2 . The composite structure of claim 1 , wherein the functional layer has a thickness greater than or equal to 10 microns.

3 . The composite structure of claim 1 , wherein the useful layer comprises a material selected from the group consisting of lithium tantalate (LiTaO 3 ), lithium niobate (LiNbO 3 ), aluminum nitride (AIN), and zinc oxide (ZnO).

4 . The composite structure of claim 1 , wherein the functional layer comprises a material selected from the group consisting of silicon, III-V semiconductors, silicon carbide, glass, and sapphire.

5 . The composite structure of claim 1 , wherein the support substrate comprises a material selected from the group consisting of silicon, III-V semiconductors, silicon carbide, glass, and sapphire.

6 . The composite structure of claim 1 , wherein the functional layer and the support substrate consist essentially of the same material.

7 . The composite structure of claim 1 , wherein the functional layer comprises at least one first local opening enabling access to at least one first part of the second face of the useful layer, and wherein the first part of the second face of the useful layer comprises metal elements forming an acoustic wave device.

8 . The composite structure of claim 1 , wherein:

the functional layer comprises at least one first local opening enabling access to at least one first part of the second face of the useful layer;

the support substrate comprises at least one second local opening, at least partially facing the first local opening and enabling access to at least one second part of the first face of the useful layer; and

the first and second parts, respectively, of the second and first faces of the useful layer comprise metal elements forming an acoustic wave device.

9 . The composite structure of claim 7 , wherein the functional layer and/or the support substrate comprise(s) metal contacts and/or electronic devices electrically connected to metal elements arranged on the useful layer.

10 . A composite structure for an acoustic wave device comprising a heterostructure, including:

a useful layer of piezoelectric material, having a first face and a second face, the first face being arranged at a first bonding interface between the useful layer and a support substrate, the support substrate having a lower coefficient of thermal expansion than that of the useful layer; and

a functional layer, the functional layer being substantially planar and having a substantially planar main face, the entirety of the substantially planar main face being arranged on the second face of the useful layer at a second bonding interface between the functional layer and the useful layer, the functional layer having a lower coefficient of thermal expansion than that of the useful layer,

wherein the functional layer exhibits a substantially uniform thickness along a longitudinal axis of the composite structure, and

wherein the adhesion energy of the second bonding interface between the functional layer and the heterostructure is less than 1000 mJ/m 2 .

11 . The composite structure of claim 10 , wherein the functional layer has a thickness greater than or equal to 10 microns.

12 . The composite structure of claim 10 , wherein the useful layer comprises a material selected from the group consisting of lithium tantalate (LiTaO 3 ), lithium niobate (LiNbO 3 ), aluminum nitride (AIN), and zinc oxide (ZnO).

13 . The composite structure of claim 10 , wherein the functional layer comprises a material selected from the group consisting of silicon, III-V semiconductors, silicon carbide, glass, and sapphire.

14 . The composite structure of claim 10 , wherein the support substrate comprises a material selected from the group consisting of silicon, III-V semiconductors, silicon carbide, glass, and sapphire.

15 . The composite structure of claim 10 , wherein the functional layer and the support substrate consist essentially of the same material.

16 . The composite structure of claim 10 , wherein the functional layer comprises at least one first local opening enabling access to at least one first part of the second face of the useful layer, and wherein the first part of the second face of the useful layer comprises metal elements forming an acoustic wave device.

17 . The composite structure of claim 10 , wherein:

the functional layer comprises at least one first local opening enabling access to at least one first part of the second face of the useful layer;

the support substrate comprises at least one second local opening, at least partially facing the first local opening and enabling access to at least one second part of the first face of the useful layer; and

the first and second parts, respectively, of the second and first faces of the useful layer comprise metal elements forming an acoustic wave device.

18 . The composite structure of claim 16 , wherein the functional layer and/or the support substrate comprise(s) metal contacts and/or electronic devices electrically connected to metal elements arranged on the useful layer.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 13, 2018
From: GUENARD, PASCAL; RADU, IONUT; LANDRU, DIDIER; DESBONNETS, ERIC
To: SOITEC
Reel/Frame 047763/0479 →
Priority Claims (1)
FR 1559994 · Oct 20, 2015 · national
Continuity (1)
Related Publication 20180316329A1 · Nov 1, 2018
References Cited (41)
US 8049395B2 · Kando · 2011 [cited by applicant]
US 9751109B2 · Moriya et al. · 2017 [cited by applicant]
US 20040253795A1 · Martinez et al. · 2004 [cited by applicant]
US 20040263026A1 · Wang · 2004 [cited by examiner]
US 20080079334A1 · Yong · 2008 [cited by examiner]
US 20080169724A1 · Bhattacharjee et al. · 2008 [cited by applicant]
US 20090004438A1 · Urakawa · 2009 [cited by applicant]
US 20090236935A1 · Kando · 2009 [cited by examiner]
US 20170213955A1 · Silvano De Sousa · 2017 [cited by examiner]
CN 1788415A · 2006 [cited by applicant]
CN 101505143A · 2009 [cited by applicant]
CN 101569100A · 2009 [cited by applicant]
CN 101874429A · 2010 [cited by applicant]
CN 102027813A · 2011 [cited by applicant]
CN 102341900A · 2012 [cited by applicant]
CN 101416570 · 2012 [cited by applicant]
CN 104205631A · 2014 [cited by applicant]
CN 104979440A · 2015 [cited by applicant]
EP 2104228A1 · 2009 [cited by applicant]
JP 10297931A · 1998 [cited by applicant]
JP 2004159262A · 2004 [cited by applicant]
JP 2009124696A · 2009 [cited by applicant]
JP 2014236387A · 2014 [cited by applicant]
TW 219354B · 1994 [cited by applicant]
TW 449937B · 2001 [cited by applicant]
WO 0237556A1 · 2002 [cited by applicant]
WO 2008078481A1 · 2010 [cited by applicant]
WO 2014129432A1 · 2017 [cited by applicant]
Hashimoto et al., Recent Development of Temperature Compensated SAW Devices, Ultrasonics Symposium, 2011 IEEE International, Oct. 18, 2011, pp. 79-86. [cited by applicant]
International Search Report for International Application No. PCT/FR2016/052675 dated Feb. 14, 2017, 2 pages. [cited by applicant]
International Written Opinion for International Application No. PCT/FR2016/052675 dated Feb. 14, 2017, 5 pages. [cited by applicant]
Chinese First Office Action for Chinese Application No. 201680065643.1, dated Feb. 3, 2021, 10 pages with translation. [cited by applicant]
Chinese Search Report for Chinese Application No. 201680065643.1, dated Jan. 27, 2021, 3 pages with translation. [cited by applicant]
Japanese Notice of Reasons for Refusal for Japanese Application No. 2018-520170, dated Nov. 17, 2020, 14 pages with English translation. [cited by applicant]
Singapore Written Opinion for Singapore Application No. 11201803341Q dated Nov. 19, 2018, 6 pages. [cited by applicant]
Chinese Second Office Action for Chinese Application No. 201680065643.1, dated Jul. 6, 2021, 6 pages with translation. [cited by applicant]
Chinese Supplementary Search Report for Chinese Application No. 201680065643.1, dated Jul. 6, 2021, 3 pages with translation. [cited by applicant]
Chinese First Office Action and Search Report for Chinese Application No. 202210146142.3, dated Feb. 14, 2025, 20 pages with translation. [cited by applicant]
Korean Office Action for Application No. 10-2018-7014265 dated Aug. 9, 2023, 6 pages. [cited by applicant]
Search Report and Written Opinion of French Patent Application No. 1559994, mailed Aug. 10, 2016, 11 pages. [cited by applicant]
Chinese Decision of Rejection for Chinese Application 201680065643.1 dated Sep. 24, 2021, 5 pages translated. [cited by applicant]