Semiconductor device having insulating film including low-density region
A change in electrical characteristics of a semiconductor device including an interlayer insulating film over a transistor including an oxide semiconductor as a semiconductor film is suppressed. The structure includes a first insulating film which includes a void portion in a step region formed by a source electrode and a drain electrode over the semiconductor film and contains silicon oxide as a component, and a second insulating film containing silicon nitride, which is provided in contact with the first insulating film to cover the void portion in the first insulating film. The structure can prevent the void portion generated in the first insulating film from expanding outward.
1. A semiconductor device comprising:
an oxide semiconductor film;
an oxide insulating film over the oxide semiconductor film; and
a nitride insulating film over and in contact with the oxide insulating film,
wherein the oxide insulating film comprises a low-density region whose density is lower than density of the oxide insulating film other than the low-density region, and
wherein the nitride insulating film covers the low-density region of the oxide insulating film.
2. The semiconductor device according to claim 1 , further comprising:
a conductive film over and electrically connected to the oxide semiconductor film,
wherein the oxide insulating film is over the conductive film, and
wherein the oxide insulating film comprises the low-density region in a region covering a side end surface of the conductive film.
3. The semiconductor device according to claim 1 ,
wherein the nitride insulating film is denser than the oxide insulating film.
4. The semiconductor device according to claim 1 ,
wherein the oxide insulating film is a silicon oxynitride film, and
wherein the nitride insulating film is a silicon nitride film.
5. The semiconductor device according to claim 1 ,
wherein the oxide insulating film is a silicon oxide film, and
wherein the nitride insulating film is a silicon nitride film.
6. The semiconductor device according to claim 1 ,
wherein the oxide insulating film has a thickness larger than the nitride insulating film.
7. The semiconductor device according to claim 1 ,
wherein the oxide semiconductor film comprises In, Ga and Zn.
8. The semiconductor device according to claim 1 ,
wherein the oxide insulating film comprises a stack of layers.
9. A display device comprising the semiconductor device according to claim 1 .
10. A semiconductor device comprising:
a gate electrode;
an oxide semiconductor film;
a gate insulating film between the gate electrode and the oxide semiconductor film;
a source electrode and a drain electrode over the oxide semiconductor film;
an oxide insulating film over the oxide semiconductor film, the source electrode and the drain electrode; and
a nitride insulating film over and in contact with the oxide insulating film,
wherein the oxide insulating film comprises low-density regions in regions covering side end surfaces of the source electrode and the drain electrode,
wherein density of each of the low-density regions is lower than density of the oxide insulating film other than the low-density regions, and
wherein the nitride insulating film covers the low-density regions of the oxide insulating film.
11. The semiconductor device according to claim 10 ,
wherein the nitride insulating film is denser than the oxide insulating film.
12. The semiconductor device according to claim 10 , further comprising:
a pixel electrode over the nitride insulating film,
wherein the pixel electrode is electrically connected to one of the source electrode and the drain electrode through an opening in the oxide insulating film and an opening in the nitride insulating film.
13. The semiconductor device according to claim 10 ,
wherein the oxide insulating film is a silicon oxynitride film, and
wherein the nitride insulating film is a silicon nitride film.
14. The semiconductor device according to claim 10 ,
wherein the oxide insulating film is a silicon oxide film, and
wherein the nitride insulating film is a silicon nitride film.
15. The semiconductor device according to claim 10 ,
wherein the oxide semiconductor film comprises In, Ga and Zn.
16. The semiconductor device according to claim 10 ,
wherein the oxide insulating film comprises a stack of layers.
17. A display device comprising the semiconductor device according to claim 10 .