IP Library Granted Patent US 10,381,088
Granted Patent B2
US 10,381,088 · App. 15/905,720 · Granted Aug 13, 2019

System and method for generating random numbers based on non-volatile memory cell array entropy

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Quick Facts
Patent No.
US 10,381,088
App. No.
15/905,720
Granted
Aug 13, 2019
Kind
B2
Abstract

A memory device that generates a unique identifying number, and includes a plurality of memory cells and a controller. Each of the memory cells includes first and second regions formed in a semiconductor substrate, wherein a channel region of the substrate extends between the first and second regions, a floating gate disposed over and insulated from a first portion of the channel region, and a select gate disposed over and insulated from a second portion of the channel region. The controller is configured to apply one or more positive voltages to the first regions of the memory cells while the memory cells are in a subthreshold state for generating leakage current through each of the channel regions, measure the leakage currents, and generate a number based on the measured leakage currents.

Claims (84)

1. A memory device, comprising:

a plurality of memory cells, wherein each of the memory cells includes:

first and second regions formed in a semiconductor substrate, wherein a channel region of the substrate extends between the first and second regions,

a floating gate disposed over and insulated from a first portion of the channel region, and

a select gate disposed over and insulated from a second portion of the channel region;

a controller configured to:

apply one or more positive voltages to the first regions of the memory cells while the memory cells are in a subthreshold state for generating leakage current through each of the channel regions,

measure the leakage currents, and

generate a number based on the measured leakage currents.

2. The device of claim 1 , wherein the controller is configured to generate at least part of the number by subtracting or comparing the measured leakage currents for a first pair of the memory cells from or to the measured leakage currents for a second pair of the memory cells.

3. The device of claim 1 , wherein a first pair of the memory cells are disposed adjacent to each other, and a second pair of the memory cells are disposed adjacent to each other, the device further comprising:

a first bit line connected to the second regions of the first pair of memory cells;

a second bit line connected to the second regions of the second pair of memory cells;

wherein the controller is configured to generate at least part of the number by subtracting or comparing leakage currents on the first bit line from or to leakage currents on the second bit line.

4. The device of claim 1 , wherein a first pair of the memory cells are disposed adjacent to each other, and a second pair of the memory cells are disposed adjacent to each other, the device further comprising:

a first bit line connected to the first regions of the first pair of memory cells;

a second bit line connected to the first regions of the second pair of memory cells;

wherein the controller is configured to generate at least part of the number by subtracting or comparing leakage currents on the first bit line from or to leakage currents on the second bit line.

5. The device of claim 1 , wherein each of the memory cells further comprises:

an erase gate disposed over and insulated from the first region.

6. The device of claim 4 , wherein each of the memory cells further comprises:

a control gate disposed over and insulated from the floating gate.

7. The device of claim 1 , wherein the controller is further configured to:

apply a positive voltage to the select gates while the memory cells are in a subthreshold state.

8. The device of claim 6 , wherein the controller is further configured to:

apply a positive voltage to the control gates while the memory cells are in a subthreshold state.

9. A memory device, comprising:

a plurality of pairs of memory cells, wherein each pair of the memory cells includes:

first, second and third regions formed in a semiconductor substrate, wherein a first channel region of the substrate extends between the first and second regions, and a second channel region of the substrate extends between the second and third regions,

a first floating gate disposed over and insulated from a first portion of the first channel region,

a second floating gate disposed over and insulated from a first portion of the second channel region,

a first select gate disposed over and insulated from a second portion of the first channel region, and

a second select gate disposed over and insulated from a second portion of the second channel region;

a controller configured to:

apply one or more positive voltages to the second regions, or to the first and third regions, of the memory cells while the memory cells are in a subthreshold state for generating leakage current through each of the first and second channel regions,

measure the leakage currents, and

generate a number based on the measured leakage currents.

10. The device of claim 9 , further comprising:

a plurality of bit lines each connected to the first and third regions for one of the pairs of memory cells for receiving the leakage currents from the first and second channel regions for the one pair of the memory cells;

wherein the controller is configured to generate at least part of the number by subtracting or comparing leakage currents on one of the bit lines from or to leakage currents on another one of the bit lines.

11. The device of claim 10 , wherein for each of the bit lines, the leakage currents thereon are the leakage current from the first channel region and the leakage current from second channel region for the one pair of memory cells.

12. A method of identifying a memory device that includes a plurality of memory cells, wherein each of the memory cells includes:

first and second regions formed in a semiconductor substrate, wherein a channel region of the substrate extends between the first and second regions,

a floating gate disposed over and insulated from a first portion of the channel region, and

a select gate disposed over and insulated from a second portion of the channel region;

the method comprising:

applying one or more positive voltages to the first regions of the memory cells while the memory cells are in a subthreshold state for generating leakage current through each of the channel regions,

measuring the leakage currents, and

generating a number based on the measured leakage currents.

13. The method of claim 12 , wherein the generating of the number at least partially includes subtracting or comparing the measured leakage currents for a first pair of the memory cells from or to the measured leakage currents for a second pair of the memory cells.

14. The method of claim 12 , wherein:

a first pair of the memory cells are disposed adjacent to each other, and second pair of the memory cells are disposed adjacent to each other;

the device further comprises:

a first bit line connected to the second regions of the first pair of memory cells;

a second bit line connected to the second regions of the second pair of memory cells;

the generating of the number at least partially includes subtracting or comparing leakage currents on the first bit line from or to leakage currents on the second bit line.

15. The method of claim 12 , wherein:

a first pair of the memory cells are disposed adjacent to each other, and second pair of the memory cells are disposed adjacent to each other;

the device further comprises:

a first bit line connected to the first regions of the first pair of memory cells;

a second bit line connected to the first regions of the second pair of memory cells;

the generating of the number at least partially includes subtracting or comparing leakage currents on the first bit line from or to leakage currents on the second bit line.

16. The method of claim 12 , wherein each of the memory cells further comprises:

an erase gate disposed over and insulated from the first region.

17. The method of claim 16 , wherein each of the memory cells further comprises:

a control gate disposed over and insulated from the floating gate.

18. The method of claim 12 , further comprising:

applying a positive voltage to the select gates while the memory cells are in a subthreshold state.

19. The method of claim 17 , further comprising:

applying a positive voltage to the control gates while the memory cells are in a subthreshold state.

20. A method of identifying a memory device that includes a plurality of pairs of memory cells, wherein each pair of the memory cells includes:

first, second and third regions formed in a semiconductor substrate, wherein a first channel region of the substrate extends between the first and second regions, and a second channel region of the substrate extends between the second and third regions,

a first floating gate disposed over and insulated from a first portion of the first channel region,

a second floating gate disposed over and insulated from a first portion of the second channel region,

a first select gate disposed over and insulated from a second portion of the first channel region, and

a second select gate disposed over and insulated from a second portion of the second channel region;

the method comprising:

applying one or more positive voltages to the second regions, or to the first and third regions, of the memory cells while the memory cells are in a subthreshold state for generating leakage current through each of the first and second channel regions,

measuring the leakage currents, and

generating a number based on the measured leakage currents.

21. The method of claim 20 , wherein:

the device further comprises a plurality of bit lines each connected to the first and third regions for one of the pairs of memory cells for receiving the leakage currents from the first and second channel regions for the one pair of the memory cells;

the generating of the number at least partially includes subtracting or comparing leakage currents on one of the bit lines from or to leakage currents on another one of the bit lines.

22. The method of claim 21 , wherein for each of the bit lines, the leakage currents thereon are the leakage current from the first channel region and the leakage current from second channel region for the one pair of memory cells.

Assignments (13)
RELEASE OF SECURITY INTEREST Recorded Mar 14, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 060894/0437 →
RELEASE OF SECURITY INTEREST Recorded Mar 11, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059363/0001 →
RELEASE OF SECURITY INTEREST Recorded Mar 10, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059863/0400 →
RELEASE OF SECURITY INTEREST Recorded Mar 9, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059358/0335 →
RELEASE OF SECURITY INTEREST Recorded Feb 28, 2022
From: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059263/0001 →
GRANT OF SECURITY INTEREST IN PATENT RIGHTS Recorded Nov 19, 2021
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
Reel/Frame 058214/0625 →
SECURITY INTEREST Recorded Jun 4, 2021
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
Reel/Frame 057935/0474 →
SECURITY INTEREST Recorded Dec 24, 2020
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 055671/0612 →
SECURITY INTEREST Recorded Jun 5, 2020
From: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION
Reel/Frame 053468/0705 →
SECURITY INTEREST Recorded Jun 5, 2020
From: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 052856/0909 →
RELEASE OF SECURITY INTEREST Recorded May 30, 2020
From: JPMORGAN CHASE BANK, N.A, AS ADMINISTRATIVE AGENT
To: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 053466/0011 →
SECURITY INTEREST Recorded Apr 24, 2020
From: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 053311/0305 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 2, 2018
From: TIWARI, VIPIN; REITEN, MARK
To: SILICON STORAGE TECHNOLOGY, INC.
Reel/Frame 045093/0231 →