IP Library Granted Patent US 10,374,149
Granted Patent B2
US 10,374,149 · App. 16/006,588 · Granted Aug 6, 2019

Magnetic tunnel junctions

Inventors: Wei Chen (Poets Villas, SG); Witold Kula (Gilroy, CA); Manzar Siddik (Ang Mo Kio, SG); Suresh Ramarajan (Seletaris, SG); Jonathan D. Harms (Boise, ID)
Assignee: Micron Technology, Inc.
H01L43/02G11C11/161H01L27/224H01L43/08H01L43/10
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,374,149
App. No.
16/006,588
Granted
Aug 6, 2019
Kind
B2
Abstract

A magnetic tunnel junction comprises a conductive first magnetic electrode comprising magnetic recording material, a conductive second magnetic electrode spaced from the first electrode and comprising magnetic reference material, and a non-magnetic tunnel insulator material between the first and second electrodes. The magnetic reference material of the second electrode comprises a synthetic antiferromagnetic construction comprising two spaced magnetic regions one of which is closer to the tunnel insulator material than is the other. The one magnetic region comprises a polarizer region comprising Co x Fe y B z where “x” is from 0 to 90, “y” is from 10 to 90, and “z” is from 10 to 50. The Co x Fe y B z is directly against the tunnel insulator. A non-magnetic region comprising an Os-containing material is between the two spaced magnetic regions. The other magnetic region comprises a magnetic Co-containing material. Other embodiments are disclosed.

Claims (18)

1. A magnetic tunnel junction comprising:

a conductive first magnetic electrode comprising magnetic recording material;

a conductive second magnetic electrode spaced from the first electrode and comprising magnetic reference material;

a non-magnetic tunnel insulator material between the first and second electrodes; and

the magnetic reference material of the second electrode comprising a synthetic antiferromagnetic construction comprising:

two spaced magnetic regions one of which is closer to the tunnel insulator material than is the other, the one magnetic region comprising a polarizer region comprising Co x Fe y B z where “x” is from 0 to 90, “y” is from 10 to 90, and “z” is from 10 to 50; the Co x Fe y B z being directly against the tunnel insulator;

a non-magnetic region comprising an Os-containing material between the two spaced magnetic regions;

the other magnetic region comprising a magnetic Co-containing material; and

the one magnetic region comprises at least one of elemental-form W, elemental-form Mo, elemental-form Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c directly against the Co x Fe y B z , where “a” is from 0 to 50, “b” is from 50 to 99, and “c” is from 1 to 50, the magnetic recording material comprising Co a Fe b W c directly against the Co x Fe y B z .

2. A magnetic tunnel junction comprising:

a conductive first magnetic electrode comprising magnetic recording material;

a conductive second magnetic electrode spaced from the first electrode and comprising magnetic reference material;

a non-magnetic tunnel insulator material between the first and second electrodes; and

the magnetic reference material of the second electrode comprising a synthetic antiferromagnetic construction comprising:

two spaced magnetic regions one of which is closer to the tunnel insulator material than is the other, the one magnetic region comprising a polarizer region comprising Co x Fe y B z where “x” is from 0 to 90, “y” is from 10 to 90, and “z” is from 10 to 50; the Co x Fe y B z being directly against the tunnel insulator;

a non-magnetic region comprising an Os-containing material between the two spaced magnetic regions;

the other magnetic region comprising a magnetic Co-containing material; and

the one magnetic region comprises at least one of elemental-form W, elemental-form Mo, elemental-form Fe, Co a Fe b W c , Co a Fe b Mo c , and Co a Fe b Ta c directly against the Co x Fe y B z , where “a” is from 0 to 50, “b” is from 50 to 99, and “c” is from 1 to 50, the magnetic recording material comprising Co a Fe b Mo c directly against the Co x Fe y B z .

Assignments (4)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 11, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050713/0001 →
SUPPLEMENT NO. 9 TO PATENT SECURITY AGREEMENT Recorded Aug 9, 2018
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 047282/0463 →
SECURITY INTEREST Recorded Jul 13, 2018
From: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 047540/0001 →
Continuity (3)
Continuation 15588994 · May 8, 2017
Division 15154033 · May 13, 2016
Related Publication 20180294403A1 · Oct 11, 2018