Split-gate flash memory cell with varying insulation gate oxides, and method of forming same
View Patent ↗A memory device includes a semiconductor substrate having spaced apart source and drain regions, with a channel region of the substrate extending there between, a floating gate of polysilicon disposed over and insulated from a first portion of the channel region by insulation material having a first thickness, wherein the floating gate has a sloping upper surface that terminates in a sharp edge, a word line gate of polysilicon disposed over and insulated from a second portion of the channel region by insulation material having a second thickness, and an erase gate of polysilicon disposed over and insulated from the source region by insulation material having a third thickness, wherein the erase gate includes a notch that wraps around and is insulated from the sharp edge of the floating gate. The third thickness is greater than the first thickness, and the first thickness is greater than the second thickness.
1. A memory device, comprising:
a semiconductor substrate having a source region, a first drain region and a second drain region, with a first channel region of the substrate extending between the source region and the first drain region, and a second channel region of the substrate extending between the source region and the second drain region;
a first floating gate of polysilicon disposed over and insulated from a first portion of the first channel region by insulation material having a first thickness, wherein the first floating gate has a sloping upper surface that terminates in a first sharp edge;
a second floating gate of polysilicon disposed over and insulated from a first portion of the second channel region by insulation material having the first thickness, wherein the second floating gate has a sloping upper surface that terminates in a second sharp edge;
a first word line gate of polysilicon disposed over and insulated from a second portion of the first channel region by insulation material having a second thickness;
a second word line gate of polysilicon disposed over and insulated from a second portion of the second channel region by insulation material having the second thickness; and
an erase gate of polysilicon disposed over and insulated from the source region by insulation material having a third thickness, wherein the erase gate includes a first notch that wraps around and is insulated from the first sharp edge of the first floating gate and a second notch that wraps around and is insulated from the second sharp edge of the second floating gate;
wherein the third thickness is greater than the first thickness, and wherein the first thickness is greater than the second thickness.
2. The memory device of claim 1 , wherein:
the insulation material having the first thickness is oxide;
the insulation material having the second thickness is oxide; and
the insulation material having the third thickness is oxide.
3. The memory device of claim 1 , further comprising:
a first spacer of insulation material disposed directly on the first floating gate and extending directly between the first word line gate and the erase gate;
a second spacer of insulation material disposed directly on the second floating gate and extending directly between the second word line gate and the erase gate.
4. The memory device of claim 1 , further comprising:
salicide formed on upper surfaces of the first and second word line gates and the erase gate.
5. The memory device of claim 1 , wherein:
the first and second notches of the erase gate are insulated from the first and second sharp edges of the first and second floating gates, respectively, by insulation material having a fourth thickness; and
the second thickness is less than the fourth thickness.