IP Library › Granted Patent US 10,732,102
Granted Patent B2
US 10,732,102 · App. 16/111,335 · Granted Aug 4, 2020

Optical test apparatus and optical test method

Inventors: Hiroshi Ohno (Yokohama Kanagawa, JP); Hiroya Kano (Kawasaki Kanagawa, JP); Hideaki Okano (Yokohama Kanagawa, JP)
Assignee: Kabushiki Kaisha Toshiba
G01N21/455G01B11/14G01M11/0207G01N21/41G01N21/47
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Quick Facts
Patent No.
US 10,732,102
App. No.
16/111,335
Granted
Aug 4, 2020
Kind
B2
Abstract

According to one embodiment, an optical test apparatus includes a first aperture, a second aperture, an image sensor, and a first lens. The first aperture includes a first aperture plane provided with a first wavelength selecting region. The second aperture includes a second aperture plane provided with a second wavelength selecting region different from the first wavelength selecting region. The image sensor is configured to image a light beam passing through the first aperture plane and the second aperture plane and reaching an imaging plane. The first lens is configured to make a light beam passing through the first aperture plane and the second aperture plane be incident on the imaging plane.

Claims (39)

1. An optical test apparatus comprising:

a first aperture having a first aperture plane provided with a first wavelength selecting region;

a second aperture having a second aperture plane provided with a second wavelength selecting region different from the first wavelength selecting region;

an image sensor configured to image a light beam passing through the first aperture plane and the second aperture plane and reaching an imaging plane; and

a first lens configured to make a light beam passing through the first aperture plane and the second aperture plane be incident on the imaging plane;

wherein a light beam imaged by the image sensor is a light beam reflected or scattered by a test object, and

the apparatus further comprises a processing circuit configured to calculate a distance between the first lens and the test object based on an interval between a light beam position of a light beam passing through a central region of the first aperture plane and a light beam position of a light beam passing through a central region of the second aperture plane.

2. The apparatus of claim 1 , wherein a light beam having a characteristic to pass through the central region of the first aperture plane is absorbed by the central region of the second aperture plane, and

a light beam having a characteristic to pass through the central region of the second aperture plane is absorbed by the central region of the first aperture plane.

3. The apparatus of claim 1 , wherein the first wavelength selecting region and the second wavelength selecting region each are divided into two regions including the central region and a peripheral region different in wavelength selectivity from the central region,

a light beam passing through the peripheral region of the second aperture plane has a characteristic to pass through the central region of the first aperture plane, and

a light beam passing through the central region of the second aperture plane has a characteristic to pass through the peripheral region of the first aperture plane.

4. The apparatus of claim 1 , wherein the first aperture plane is arranged on a focal plane of the first lens.

5. The apparatus of claim 1 , further comprising:

a light source; and

a second lens configured to irradiate the test object with a light beam passing through the first aperture plane and the second aperture plane,

wherein the first aperture plane is arranged on a focal plane of the second lens.

6. The apparatus of claim 1 , further comprising:

a light source; and

a second lens configured to irradiate the test object with a light beam emitted from the light source and passing through the second aperture,

wherein the aperture plane of the first aperture is conjugate to the aperture plane of the second aperture.

7. The apparatus of claim 4 , wherein the processing circuit is further configured to acquire a light beam position on the imaging plane for each wavelength corresponding to the first wavelength selecting region.

8. The apparatus of claim 5 , further comprising a third aperture having an aperture plane provided with a dot-pattern wavelength selecting region and arranged at a position to face a light emitting surface of the light source.

9. The apparatus of claim 5 , wherein the processing circuit is further configured to acquire a light beam position on the imaging plane for each wavelength corresponding to the first wavelength selecting region.

10. The apparatus of claim 6 , wherein a light emitting surface of the light source is conjugate to the imaging plane.

11. The apparatus of claim 6 , wherein the first aperture plane is arranged on the focal plane of the second lens via the first lens, and

the second aperture plane is arranged on the focal plane of the second lens.

12. The apparatus of claim 6 , wherein a light beam imaged by the image sensor is a light beam deflected by the test object, and

the processing circuit is further configured to calculate a refractive index distribution or scattering intensity on the test object based on an intensity of a light beam reaching the imaging plane.

13. The apparatus of claim 6 , further comprising a third aperture having an aperture plane provided with a dot-pattern wavelength selecting region and arranged at a position to face the light emitting surface of the light source.

14. The apparatus of claim 13 , wherein a light beam imaged by the image sensor is a light beam deflected by the test object, and

the processing circuit is further configured to acquire a light beam position on the imaging plane for each wavelength corresponding to the first wavelength selecting region and calculate a refractive index distribution or scattering intensity on the test object based on an interval between a light beam position of a light beam passing through the central region of the first aperture plane and a light beam position of a light beam passing through the peripheral region of the first aperture plane.

15. An optical test method comprising:

imaging a light beam exiting from a test surface of a test object, passing through a first aperture having a first aperture plane provided with a first wavelength selecting region and a second aperture having a second aperture plane provided with a second wavelength selecting region different from the first wavelength selecting region, and reaching an imaging plane; and

acquiring information concerning the test object based on an acquired light beam position or intensity of the light beam on the imaging plane,

wherein a light beam imaged by the image sensor is a light beam reflected or scattered by the test object, and

the method further comprises calculating a distance between the first lens and the test object based on an interval between a light beam position of a light beam passing through a central region of the first aperture plane and a light beam position of a light beam passing through a central region of the second aperture plane.

16. The method of claim 15 , wherein a light beam having a characteristic to pass through the central region of the first aperture plane is absorbed by the central region of the second aperture plane, and

a light beam having a characteristic to pass through the central region of the second aperture plane is absorbed by the central region of the first aperture plane.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 15, 2018
From: OHNO, HIROSHI; KANO, HIROYA; OKANO, HIDEAKI
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 047162/0809 →
Priority Claims (1)
JP 2018-4556 · Jan 15, 2018 · national
Continuity (1)
Related Publication 20190219501A1 · Jul 18, 2019
Cited By (10)
US 12,188,876 US 12,276,616 US 12,366,526 US 12,372,463 US 12,379,323 US 12,461,026 US 12,491,579 US 12,510,468 US 12,710,356 US 12,748,247