IP Library › Granted Patent US 12,366,526
Granted Patent B2
US 12,366,526 · App. 18/058,519 · Granted Jul 22, 2025

Optical test apparatus and optical test method

Inventors: Hiroshi Ohno (Yokohama Kanagawa, JP); Hiroya Kano (Kawasaki Kanagawa, JP); Hideaki Okano (Yokohama Kanagawa, JP)
Assignee: Kabushiki Kaisha Toshiba
G01N21/47G01M11/0207G01B11/14G01N21/41G01N21/455G01N2021/4704G01N2021/4707G01N2021/4711
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Quick Facts
Patent No.
US 12,366,526
App. No.
18/058,519
Granted
Jul 22, 2025
Kind
B2
Abstract

According to one embodiment, an optical test apparatus includes a first aperture, a second aperture, an image sensor, and a first lens. The first aperture includes a first aperture plane provided with a first wavelength selecting region. The second aperture includes a second aperture plane provided with a second wavelength selecting region different from the first wavelength selecting region. The image sensor is configured to image a light beam passing through the first aperture plane and the second aperture plane and reaching an imaging plane. The first lens is configured to make a light beam passing through the first aperture plane and the second aperture plane be incident on the imaging plane.

Claims (39)

1. An optical test apparatus comprising:

a first aperture having a first wavelength selecting region, the first wavelength selecting region including a first region configured to allow a first light beam to pass through and a second region configured to allow a second light beam to pass through, the first light beam and the second light beam being light beams scattered by a test object, the first light beam being parallel to an optical axis at incidence and belonging to a first visible light range, the second light beam being non-parallel to the optical axis at incidence and belonging to a second visible light range;

an image sensor configured to image the first light beam that has passed through the first region and the second light beam that has passed through the second region; and

a processing circuit configured to obtain an intensity of the first light beam and the second light beam imaged by the image sensor for each wavelength and to calculate a scattering intensity distribution composed of the first light beam and the second light beam based on the intensity of the first light beam and the second light beam for each wavelength.

2. The apparatus of claim 1 , further comprising:

a light source;

a second aperture having a second wavelength selecting region; and

a first lens configured to irradiate the test object with a light emitted from the light source and passing through the second aperture.

3. The apparatus of claim 2 , wherein

the second aperture is arranged on the focal plane of the first lens.

4. The apparatus of claim 1 , further comprising:

a second aperture having a region of a second wavelength selecting region having a wavelength selectivity different from that of a region of the first wavelength selecting region,

the first wavelength selecting region and the second wavelength selecting region are arranged in such a manner that a light deflected by the test object passes through the first wavelength selecting region.

5. The apparatus of claim 4 , wherein

the test object is arranged in an optical path between the first aperture and the second aperture.

6. The apparatus of claim 4 , wherein

the first wavelength selecting region and the second wavelength selecting region each are divided into two regions including a central region and a peripheral region different in wavelength selectivity from the central region,

a light passing through the peripheral region of the second wavelength selecting region can pass through the central region of the first wavelength selecting region, and

a light passing through the central region of the second wavelength selecting region can pass through the peripheral region of the first wavelength selecting region.

7. The apparatus of claim 4 , further comprising a first lens configured to make a light passing through the first wavelength selecting region be incident on an imaging plane.

8. The apparatus of claim 7 , wherein

a second wavelength selecting region is arranged on a focal plane of the first lens.

9. The apparatus of claim 7 , further comprising:

a light source; and

a second lens configured to irradiate the test object with a light passing through the first wavelength selecting region and a second wavelength selecting region,

wherein the second wavelength selecting region is arranged on a focal plane of the second lens.

10. The apparatus of claim 9 , further comprising a third aperture having a wavelength selecting region provided with a dot-pattern and arranged at a position to face a light emitting surface of the light source.

11. The apparatus of claim 7 , further comprising:

a light source; and

a second lens configured to irradiate the test object with a light emitted from the light source and passing through the second aperture,

wherein the first aperture is conjugate to the second aperture.

12. The apparatus of claim 11 , wherein a light emitting surface of the light source is conjugate to an imaging plane.

13. The apparatus of claim 12 , wherein

the second aperture is arranged on a focal plane of the second lens, and

the first aperture is arranged on a focal plane of the first lens.

14. An optical test method comprising:

imaging, by an image sensor, a first light beam and a second light beam, wherein the first light beam has passed through a first region of a first wavelength selecting region of a first aperture, the second light beam has passed through a second region of the first wavelength selecting region of the first aperture, the first light beam and the second light beam are light beams scattered by a test object, the first light beam is parallel to an optical axis at incidence and belongs to a first visible light range, and the second light beam is non-parallel to the optical axis at incidence and belongs to a second visible light range;

obtaining an intensity of the first light beam and the second light beam imaged by the image sensor for each wavelength; and

calculating a scattering intensity distribution composed of the first light beam and the second light beam based on the intensity of the first light beam and the second light beam for each wavelength.

Priority Claims (1)
JP 2018-4556 · Jan 15, 2018 · national
Continuity (3)
Continuation 16911473 · Jun 25, 2020
Continuation 16111335 · Aug 24, 2018
Related Publication 20230099653A1 · Mar 30, 2023
References Cited (51)
US 2655077A · Bennett · 1953 [cited by applicant]
US 2700918A · Osterberg et al. · 1955 [cited by applicant]
US 2851921A · Drury · 1958 [cited by applicant]
US 3397023A · Land · 1968 [cited by applicant]
US 5969846A · Kishi · 1999 [cited by applicant]
US 6317261B1 · Otaki · 2001 [cited by applicant]
US 7206079B2 · Joannes · 2007 [cited by examiner]
US 7336371B1 · Haidner et al. · 2008 [cited by applicant]
US 8009292B2 · Choi · 2011 [cited by examiner]
US 8159675B2 · Kiyota · 2012 [cited by applicant]
US 8351116B2 · Suenaga · 2013 [cited by applicant]
US 9535013B2 · Matsumoto · 2017 [cited by examiner]
US 9618369B2 · Weaver et al. · 2017 [cited by applicant]
US 10732102B2 · Ohno et al. · 2020 [cited by applicant]
US 10812786B2 · Ohno et al. · 2020 [cited by applicant]
US 10866186B2 · Schoegl · 2020 [cited by applicant]
US 10948638B2 · Moore · 2021 [cited by applicant]
US 11297308B2 · Ohno · 2022 [cited by examiner]
US 11536652B2 · Ohno · 2022 [cited by examiner]
US 20050219518A1 · Korngut · 2005 [cited by examiner]
US 20060087727A1 · Brooker · 2006 [cited by applicant]
US 20100066854A1 · Mather et al. · 2010 [cited by applicant]
US 20100201963A1 · Cramer et al. · 2010 [cited by applicant]
US 20110102753A1 · Van De Kerkhof · 2011 [cited by examiner]
US 20110311132A1 · Meimoun · 2011 [cited by applicant]
US 20130321906A1 · Kriofske et al. · 2013 [cited by applicant]
US 20140354802A1 · Ohtomo · 2014 [cited by examiner]
US 20170242343A1 · Pandey et al. · 2017 [cited by applicant]
US 20180231788A1 · Engelhardt · 2018 [cited by applicant]
US 20190364267A1 · Ohno et al. · 2019 [cited by applicant]
US 20200150326A1 · Kano et al. · 2020 [cited by applicant]
US 20210080543A1 · Ohno et al. · 2021 [cited by applicant]
US 20210293723A1 · Ohno · 2021 [cited by examiner]
US 20220086326A1 · Ohno · 2022 [cited by examiner]
DE 10048791A1 · 2002 [cited by applicant]
DE 102014002084A1 · 2015 [cited by applicant]
JP H10293834A · 1998 [cited by applicant]
JP 20009584A · 2000 [cited by applicant]
JP 2006253201A · 2006 [cited by applicant]
JP 2012173130A · 2012 [cited by applicant]
JP 2013246052A · 2013 [cited by applicant]
JP 2014168763A · 2014 [cited by applicant]
JP 201675590A · 2016 [cited by applicant]
WO WO2018143340A1 · 2018 [cited by examiner]
Jain, Deepak S. et al., “Rainbow schlieren deflectometry technique for nanofluid-based heat transfer measurements under natural convection regime,” International Journal of Heat and Mass Transfer 98 (2016) pp. 697-711. … [cited by examiner]
Wong, Tommy et al., “Quantitative measurements in an unsteady flame using high-speed rainbow schlieren deflectometry,” 2006, Measurement Science and Technology 17 pp. 1503-1510. (Year: 2006). [cited by examiner]
W.L. Howes, “Rainbow schlieren and its applications”, Applied Optics, vol. 23, No. 14, pp. 2449-2460 (1984). [cited by applicant]
R.J. Woodham, “Gradient and curvature from the photometric-stereo method, including local confidence estimation”, Journal of the Optical Society of America A, vol. 11, Issue 11, pp. 3050-3068 (1994). [cited by applicant]
Settles, G.S., “Schlieren and Shadowgraph Techniques: Visualizing Phenomena in Transparent Media” (Springer-Verlag Berlin Heidelberg GmbH. 2001). [cited by applicant]
Stricker, Josef et al., “Bidirectional quantitative color schlieren,” Optical Engineering, vol. 45, No. 12, 123604, pp. 1-6 (2006). [cited by applicant]
Wang, Dongqing et al., “Two-dimensional color Schlieren system,” Optical Engineering, vol. 29 No. 9, pp. 1161-1162 (1990). [cited by applicant]
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