IP Library Granted Patent US 11,107,974
Granted Patent B2
US 11,107,974 · App. 16/121,453 · Granted Aug 31, 2021

Magnetic tunnel junction devices including a free magnetic trench layer and a planar reference magnetic layer

Inventor: Satoru Araki (San Jose, CA)
Assignee: SPIN MEMORY, INC.
H01L43/02G11C11/161G11C11/1659H01F10/329H01F10/3259H01L21/8221H01L27/228H01L43/08H01L43/10H01L43/12G11C11/1657G11C11/1673H01F10/3286
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Quick Facts
Patent No.
US 11,107,974
App. No.
16/121,453
Granted
Aug 31, 2021
Kind
B2
Abstract

A Magnetic Tunnel Junction (MTJ) device can include a reference magnetic layer having one or more trenches disposed therein. One or more sections of a tunnel barrier layer can be disposed on the walls of the one or more trenches. One or more sections of a free magnetic layer can be disposed on the one or more sections of the tunnel barrier layer in the one or more trenches. One or more sections of a conductive layer can be disposed on the one or more sections of the free magnetic layer in the one or more trenches. One or more insulator blocks can be disposed between corresponding sections of the tunnel barrier layer, corresponding sections of the free magnetic layer and corresponding sections of the conductive layer in the one or more trenches.

Claims (75)

1. A Magnetic Tunnel Junction (MTJ) device comprising:

a reference magnetic layer including one or more trenches within the reference magnetic layer;

a plurality of sections of a tunnel barrier layer disposed on the walls of the one or more trenches within the reference magnetic layer;

a plurality of sections of a free magnetic layer disposed on corresponding sections of the tunnel barrier layer in the one or more trenches within the reference magnetic layer;

a plurality of sections of a conductive layer disposed on corresponding sections of the free magnetic layer in the one or more trenches within the reference magnetic layer; and

one or more insulator blocks disposed in the one or more trenches within the reference magnetic layer and between corresponding sections of the tunnel barrier layer, corresponding sections of the free magnetic layer and corresponding sections of the conductive layer in the one or more trenches within the reference magnetic layer.

2. The MTJ of claim 1 , further comprising:

one or more sections of a non-magnetic capping layer disposed between the one or more sections of the free magnetic layer and the one or more sections of the conductive layer in the one or more trenches.

3. The MTJ of claim 1 , further comprising:

an insulator layer disposed on a first side of the reference magnetic layer; and

one or more interconnects disposed in the insulator layer and coupled to the conductive layer in respective ones of the one or more trenches.

4. The MTJ of claim 1 , further comprising:

a first conductive buffer layer disposed on a first side of the reference magnetic layer;

a first insulator layer disposed on the first conductive layer;

a second conductive buffer layer disposed on a second side of the reference magnetic layer; and

a second insulator layer disposed on the second conductive layer.

5. The MTJ of claim 1 , further comprising:

one or more bit lines disposed on the reference magnetic layer, across one or more of the insulator blocks and coupled to portions of the reference magnetic layer.

6. The MTJ of claim 1 , wherein the one or more trenches have a taper of approximately 10-45 degrees from a second side of the reference magnetic layer to a first side of the reference magnetic layer.

7. The MTJ of claim 1 , wherein:

the free magnetic layer includes a Cobalt-Iron-Boron (Co—Fe—B) alloy;

the conductive layer includes one or more of Copper (Cu), copper alloy, Aluminum (Al), aluminum alloy, Ruthenium (Ru) or ruthenium alloy;

the tunnel barrier layer includes one or more of a Magnesium Oxide (MgO), Silicon Oxide (SiOx), Aluminum Oxide (AlOx) or Titanium Oxide (TiOx); and

the reference magnetic layer includes a Cobalt-Iron-Boron (Co—Fe—B) alloy.

8. The MTJ of claim 1 , wherein:

a magnetic field of the reference magnetic layer has a fixed polarization substantially parallel to a major planar orientation of the reference magnetic layer; and

a magnetic field of the free magnetic layer has a polarization substantially parallel to the major planar orientation of the reference magnetic layer and selectively switchable between being substantially parallel and substantially antiparallel to the magnetic field of the reference magnetic layer.

9. The MTJ of claim 8 , wherein the magnetic field of the free magnetic layer is configured to switch to being substantially parallel to the magnetic field of the reference magnetic layer in response to a current flow in a first direction through the conductive layer and to switch to being substantially anti-parallel to the magnetic field of the reference magnetic layer in response to a current flow in a second direction through the conductive layer.

10. The MTJ of claim 1 , wherein:

a magnetic field of the reference magnetic layer has a fixed polarization substantially perpendicular to a major planar orientation of the reference magnetic layer; and

a magnetic field of the free magnetic layer has a polarization substantially perpendicular to the major planar orientation of the reference magnetic layer and selectively switchable between being substantially parallel and substantially antiparallel to the magnetic field of the reference magnetic layer.

11. The MTJ of claim 10 , wherein the magnetic field of the free magnetic layer is configured to switch to being substantially parallel to the magnetic field of the reference magnetic layer in response to a current flow in a first direction through the conductive layer and to switch to being substantially anti-parallel to the magnetic field of the reference magnetic layer in response to a current flow in a second direction through the conductive layer.

12. A device comprising:

a reference magnetic layer including a plurality of trenches within the reference magnetic layer;

a plurality of sections of a tunnel barrier layer disposed on the walls of the plurality of trenches within the reference magnetic layer;

a plurality of sections of a free magnetic layer disposed on corresponding sections of the tunnel barrier layer in the plurality of trenches within the reference magnetic layer;

a plurality of sections of a conductive layer disposed on corresponding sections of the free magnetic layer in the plurality of trenches within the reference magnetic layer; and

a plurality of insulator blocks disposed in the plurality of trenches within the reference magnetic layer between corresponding sections of the tunnel barrier layer, corresponding sections of the free magnetic layer and corresponding sections of the conductive layer in an array of columns and rows in the plurality of trenches within the reference magnetic layer.

13. The device of claim 12 , wherein the plurality of trenches have a taper of approximately 10-45 degrees from a first side of the reference magnetic layer to a second side of the reference magnetic layer.

14. The device of claim 12 , further comprising:

a first set of one or more additional layers disposed a first side of the reference magnetic layer; and

a second set of one or more additional layers disposed on a second side of the reference magnetic layer.

15. The device of claim 12 , wherein corresponding sections of the tunnel barrier layer, corresponding section of the free magnetic layer and corresponding sections of the conductive layer disposed between adjacent insulator blocks in one of the plurality of trenches comprise a Magnetic Tunnel Junction (MTJ) cell.

16. The device of claim 12 , wherein

a magnetic field of the reference magnetic layer has a fixed polarization substantially parallel to a major planar orientation of the reference magnetic layer; and

a magnetic field of the free magnetic layer has a polarization substantially parallel to the major planar orientation of the reference magnetic layer and selectively switchable between being substantially parallel and substantially antiparallel to the magnetic field of the reference magnetic layer.

17. The device of claim 16 , wherein the magnetic field of the free magnetic layer is configured to switch to being substantially parallel to the magnetic field of the reference magnetic layer in response to a current flow in a first direction through the conductive layer and to switch to being substantially anti-parallel to the magnetic field of the reference layer magnetic in response to a current flow in a second direction through the conductive layer.

18. The device of claim 12 , wherein

a magnetic field of the reference magnetic layer has a fixed polarization substantially perpendicular to a major planar orientation of the reference magnetic layer; and

a magnetic field of the free magnetic layer has a polarization substantially perpendicular to the major planar orientation of the reference magnetic layer and selectively switchable between being substantially parallel and substantially antiparallel to the magnetic field of the reference magnetic layer.

19. The device of claim 18 , wherein the magnetic field of the free magnetic layer is configured to switch to being substantially parallel to the magnetic field of the reference magnetic layer in response to a current flow in a first direction through the conductive layer and to switch to being substantially anti-parallel to the magnetic field of the reference layer magnetic in response to a current flow in a second direction through the conductive layer.

20. A memory device comprising:

an array of Magnetic Tunnel Junction (MTJ) cells including;

a reference magnetic layer including a plurality of trenches within the reference magnetic layer;

a plurality of sections of a tunnel barrier layer disposed on the walls of the plurality of trenches within the reference magnetic layer;

a plurality of sections of a free magnetic layer disposed on corresponding sections of the tunnel barrier layer in the plurality of trenches within the reference magnetic layer;

a plurality of sections of a conductive layer disposed in the plurality of trenches within the reference magnetic layer on corresponding sections of the free magnetic layer in the plurality of trenches within the reference magnetic layer;

a plurality of insulator blocks disposed in the plurality of trenches within the reference magnetic layer between corresponding sections of the tunnel barrier layer, corresponding sections of the free magnetic layer and corresponding sections of the conductive layer in an array of columns and rows in the plurality of trenches within the reference magnetic layer;

a bit line coupled to the reference magnetic layer; and

a plurality of select transistors, each select transistor coupled to respective sections of the conductive layer in the plurality of trenches.

21. The memory device of claim 20 , further comprising:

a plurality of word lines, each word line coupled to gates of a set of the plurality of select transistors arranged in a corresponding row; and

a plurality of source lines, each source line coupled to sources of a set of the plurality of select transistors arranged in a corresponding column.

22. The memory device of claim 20 , further comprising:

a plurality of blocks of the array of MTJ cells arranged in columns and rows.

23. The memory device of claim 22 , further comprising:

a plurality of global bit lines, each global bit line coupled to a set of bit lines in a corresponding column of the plurality of blocks of the array of MTJ cells.

24. The memory device of claim 20 , wherein

a magnetic field of the reference magnetic layer has a fixed polarization substantially parallel to a major planar orientation of the reference magnetic layer; and

a magnetic field of the free magnetic layer has a polarization substantially parallel to the major planar orientation of the reference magnetic layer and selectively switchable between being substantially parallel and substantially antiparallel to the magnetic field of the reference magnetic layer.

25. The memory device of claim 24 , wherein the magnetic field of the free magnetic layer is configured to switch to being substantially parallel to the magnetic field of the reference magnetic layer in response to a current flow in a first direction through the conductive layer and to switch to being substantially anti-parallel to the magnetic field of the reference magnetic layer in response to a current flow in a second direction through the conductive layer.

26. The memory device of claim 20 , wherein

a magnetic field of the reference magnetic layer has a fixed polarization substantially perpendicular to a major planar orientation of the reference magnetic layer; and

a magnetic field of the fee magnetic layer has a polarization substantially perpendicular to the major planar orientation of the reference magnetic layer and selectively switchable between being substantially parallel and substantially antiparallel to the magnetic field of the reference magnetic layer.

27. The memory device of claim 26 , wherein the magnetic field of the free magnetic layer is configured to switch to being substantially parallel to the magnetic field of the reference magnetic layer in response to a current flow in a first direction through the conductive layer and to switch to being substantially anti-parallel to the magnetic field of the reference magnetic layer in response to a current flow in a second direction through the conductive layer.

Assignments (4)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 3, 2021
From: SPIN (ASSIGNMENT FOR BENEFIT OF CREDITORS), LLC
To: INTEGRATED SILICON SOLUTION, (CAYMAN) INC.
Reel/Frame 057407/0829 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 20, 2021
From: SPIN MEMORY, INC.
To: SPIN (ASSIGNMENT FOR THE BENEFIT OF CREDITORS), LLC
Reel/Frame 056927/0038 →
CHANGE OF NAME Recorded Jun 10, 2019
From: SPIN TRANSFER TECHNOLOGIES, INC.
To: SPIN MEMORY, INC.
Reel/Frame 049421/0501 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 4, 2018
From: ARAKI, SATORU
To: SPIN TRANSFER TECHNOLOGIES, INC.
Reel/Frame 046783/0275 →
Continuity (7)
Continuation In Part 16059012 · Aug 8, 2018
Continuation In Part 16059018 · Aug 8, 2018
Continuation In Part 16059009 · Aug 8, 2018
Continuation In Part 16059004 · Aug 8, 2018
Continuation In Part 16059016 · Aug 8, 2018
Provisional Application 62647210 · Mar 23, 2018
Related Publication 20190296224A1 · Sep 26, 2019