Organotin oxide hydroxide patterning compositions, precursors, and patterning
Organometallic precursors are described for the formation of high resolution lithography patterning coatings based on metal oxide hydroxide chemistry. The precursor compositions generally comprise ligands readily hydrolysable by water vapor or other OH source composition under modest conditions. The organometallic precursors generally comprise a radiation sensitive organo ligand to tin that can result in a coating that can be effective for high resolution patterning at relatively low radiation doses and is particularly useful for EUV patterning. The precursors compositions are readily processable under commercially suitable conditions. Solution phase processing with in situ hydrolysis or vapor based deposition can be used to form the coatings.
1. A method for forming a radiation patternable coating, the method comprising:
exposing a precursor coating on a substrate to water, wherein the precursor coating comprises:
a first organometallic composition R z SnO (2-(z/2)-(x/2)) (OH) x where 0<z≤2 and 0<(z+x)≤4, or R′ n SnX 4-n where n=1 or 2 and R and R′ are independently hydrocarbyl groups with 1-31 carbon atoms and X is a ligand with a hydrolysable Sn—X bond or combination thereof, or a mixture thereof; and
a second organometallic composition R″ y SnX′ 4-y where y=1 or 2 and R″ is different from R′ and X′ is a ligand with a hydrolysable Sn—X′ bond or combination thereof that is the same or different from X, or an inorganic composition ML v , where v is 2≤v≤6 and L is a ligand with a hydrolysable M-L bond or combination thereof that is the same or different from X and X′, or a mixture thereof,
wherein the exposing results in hydrolysis of the precursor coating to form a coating comprising ((R and/or R′) a R″ b )SnO (2-((a+b)/2)-(w/2)) (OH) w , where 0<(a+b)≤2 and 0<(a+b+w)<4; or comprising y ((R or R′) a R″ b )SnO (2-((a+b)/2)-(w/2)) (OH) w ·z MO ((m/2)-1/2) (OH) l where 0<(a+b)≤2, 0<(a+b+w)<4, m=formal valence of M m+ , 0≤l≤m, y/z=(0.05 to 0.6), and M=M′ or Sn, where M′ is a non-tin metal of groups 2-16 of the periodic table.
2. The method of claim 1 wherein the exposing step comprises heating the substrate to a temperature from about 45° C. to about 250° C. for from about 0.5 minutes to about 30 minutes.
3. The method of claim 1 wherein the precursor coating is formed using a solution having from about 0.0025M to about 1.5M tin in organic solvent.
4. The method of claim 3 wherein the solution is spin coated to form the precursor coating.
5. The method of claim 1 wherein the first organometallic composition comprises R′ n SnX 4-n .
6. The method of claim 1 wherein the inorganic composition comprises SnL 4 .
7. The method of claim 1 wherein R or R′ is a methyl, ethyl, i-propyl, n-butyl, s-butyl or t-butyl group.
8. The method of claim 1 wherein X and X′ are independently selected from the group consisting of alkylamido or dialkylamido (—NR 1 R 2 , where R 1 and R 2 are independently hydrocarbon groups with 1-10 carbon atoms or hydrogen), siloxo (—OSiR 1 R 2 where R 1 , R 2 ′ are R 3 , independently hydrocarbon groups with 1-10 carbon atoms), silylamido (˜N(SiR 1 3 )(R 2 ), where R 1 and R 2 are independently hydrocarbon groups with 1-10 carbon atoms), disilylamido (—N(SiR 1 3 )(SiR 2 3 ) where R 1 and R 2 are independently hydrocarbon groups with 1-10 carbon atoms), alkoxo and aryloxo (—OR, where R is an alkyl or aryl group with 1-10 carbon atoms), azido (˜N 3 ), alkynido (—C≡CR, where R is a hydrocarbon group with 1-9 carbon atoms), amidato (—NR 1 (COR 2 ) where R 1 and R 2 are independently hydrocarbon groups with 1-7 carbon atoms or hydrogen), amidinato (˜NR 1 C(NR 2 )R 3 ) where R 1 and R 2 are independently hydrocarbon groups with 1-8 carbon atoms or hydrogen), imido (—N(COR 1 )(COR 2 ), where R 1 and R 2 are independently hydrocarbon groups with 1-8 carbon atoms or hydrogen), or fluorinated analogues thereof, or combinations thereof.
9. The method of claim 1 wherein the water is ambient atmospheric water.
10. The method of claim 1 wherein after the exposing step, the radiation patternable coating is irradiated with a pattern of EUV radiation.