IP Library › Granted Patent US 12,736,874
Granted Patent B2
US 12,736,874 · App. 17/905,754 · Granted Sep 15, 2026

Apparatus and process for EUV dry resist sensitization by gas phase infusion of a sensitizer

Inventors: Sivananda Krishnan Kanakasabapathy (Pleasanton, CA); Samantha S.H. Tan (Newark, CA); Jengyi Yu (San Ramon, CA); Younghee Lee (Pleasanton, CA); Alan J. Jensen (Mountain House, CA); Da Li (Newark, CA)
Assignee: Lam Research Corporation
G03F7/0042G03F7/167G03F7/2004H10P76/2041
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Quick Facts
Patent No.
US 12,736,874
App. No.
17/905,754
Granted
Sep 15, 2026
Kind
B2
Abstract

The present disclosure relates to stacks having a sensitized resist film, as well as methods and apparatuses for applying such sensitized films. In particular embodiments, the sensitizer can be provided in gas form, and unreacted sensitizer precursors can be recovered after a deposition step.

Claims (6)

1 . A stack comprising:

a semiconductor substrate having a top surface; and

a sensitized film disposed on the top surface of the semiconductor substrate, wherein the film comprises an Extreme Ultraviolet (EUV) resist material and an EUV sensitizer dispersed throughout the film, and wherein the EUV resist material comprises organometallic material,

wherein the organometallic material comprises an iodo-substituted alkyl group.

2 . The stack of claim 1 , wherein the EUV sensitizer comprises iodine or xenon.

3 . The stack of claim 2 , wherein the EUV sensitizer is I 2 , HI, a precursor thereof, 133 Xe, 136 Xe, 129 Xe, or a combination of any of these isotopes for xenon.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 12, 2022
From: KANAKASABAPATHY, SIVANANDA KRISHNAN; TAN, SAMANTHA S.H.; YU, JENGYI; LEE, YOUNGHEE; JENSEN, ALAN J.; LI, DA
To: LAM RESEARCH CORPORATION
Reel/Frame 061396/0415 →
Continuity (2)
Provisional Application 63003100 · Mar 31, 2020
Related Publication 20240192590A1 · Jun 13, 2024
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