IP Library Granted Patent US 10,903,128
Granted Patent B2
US 10,903,128 · App. 16/374,704 · Granted Jan 26, 2021

Hermetic package for power semiconductor

Inventors: Saeed Shafiyan-Rad (Nashua, NH); Manuel Medeiros, III (New Bedford, MA); David Scott Doiron (Ashburnham, MA)
Assignee: Microsemi Corporation
H01L23/10H01L23/06H01L23/3672H01L24/09H01L24/34H01L24/49H01L24/48H01L2224/48247
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Quick Facts
Patent No.
US 10,903,128
App. No.
16/374,704
Granted
Jan 26, 2021
Kind
B2
Abstract

A hermetic high-current electronic package includes a package body and a base plate hermetically coupled to the package body. A semiconductor device is thermally mounted to the base plate and has a high-current output. A high-current input/output (I/O) terminal is bonded to the high-current output of the semiconductor device by a strap terminal that is an integral high current heatsink terminal. The high-current I/O terminal passes through a hole formed in a sidewall of the package body. A ceramic seal surrounds the high-current I/O terminal and has a first surface hermetically bonded to an outer surface of the sidewall of the package body. A metal hermetic seal washer surrounds the high-current I/O terminal and is bonded to a second surface of the ceramic seal and bonded to a portion of the high-current I/O terminal that passes through the metal hermetic seal washer.

Claims (15)

1. A hermetic electronic package comprising:

a package body;

a package base plate hermetically coupled to a first end of the package body;

a lid seam welded onto the package body at a second end opposite the first end to form a hermetic seal with the package body;

a substrate thermally coupled to the base plate, the substrate having first, second, and third metalized regions;

a MOSFET semiconductor device having a drain, a source, and a gate, the drain electrically and thermally mounted to the first metalized region on the substrate, the source electrically bonded to the second metalized region on the substrate by a plurality of bonding wires, and the gate bonded to the third metalized region on the substrate by at least one bonding wire;

a drain high-current input/output (I/O) terminal electrically bonded to the first metalized region on the substrate by a first strap terminal that is an integral high current heatsink terminal, the drain high-current I/O terminal passing through a hole formed in the package body;

a source high-current I/O terminal electrically bonded to the second metalized region on the substrate by a second strap terminal that is an integral high current heatsink terminal, the source high-current I/O terminal passing through a hole formed in the package body;

a gate I/O terminal electrically bonded to the third metalized region on the substrate by a gate bonding wire;

each of the drain and source high-current I/O terminals and the gate I/O terminal surrounded by a ceramic seal having a first surface and a second surface, the first surface hermetically bonded to an outer surface of the package body and by a metal hermetic seal washer hermetically bonded to the second surface of each ceramic seal and hermetically bonded to one of the drain high-current I/O terminal, the source high-current I/O terminal, and the gate I/O terminal which it surrounds.

2. The hermetic electronic package of claim 1 wherein the package body is formed from one of Kovar, alloy 42, alloy 46 and alloy 52.

3. The hermetic electronic package of claim 1 wherein the ceramic seals are formed from one of alumina and silicon nitride and are brazed to the package body using a CuAg braze.

4. The hermetic electronic package of claim 1 wherein the high-current I/O terminals are formed from one of copper, copper zirconium, and beryllium copper (BeCu).

5. The hermetic electronic package of claim 1 wherein the metal hermetic seal washer is formed from one of one of Kovar, alloy 42, alloy 46 and alloy 52.

6. The hermetic electronic package of claim 1 wherein the metal hermetic seal washers are each hermetically bonded to the second surface of the respective ceramic seal and to a portion of the respective drain high-current I/O terminal, source high-current I/O terminal and gate I/O terminal using a CuAg braze.

Assignments (12)
RELEASE OF SECURITY INTEREST Recorded Mar 14, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 060894/0437 →
RELEASE OF SECURITY INTEREST Recorded Mar 10, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059863/0400 →
RELEASE OF SECURITY INTEREST Recorded Mar 9, 2022
From: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059358/0335 →
RELEASE OF SECURITY INTEREST Recorded Feb 28, 2022
From: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
To: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 059263/0001 →
GRANT OF SECURITY INTEREST IN PATENT RIGHTS Recorded Nov 19, 2021
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
Reel/Frame 058214/0625 →
SECURITY INTEREST Recorded Jun 4, 2021
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT
Reel/Frame 057935/0474 →
SECURITY INTEREST Recorded Dec 24, 2020
From: MICROCHIP TECHNOLOGY INCORPORATED; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 055671/0612 →
SECURITY INTEREST Recorded Jun 5, 2020
From: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 052856/0909 →
SECURITY INTEREST Recorded Jun 5, 2020
From: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: WELLS FARGO BANK, NATIONAL ASSOCIATION
Reel/Frame 053468/0705 →
RELEASE OF SECURITY INTEREST Recorded May 30, 2020
From: JPMORGAN CHASE BANK, N.A, AS ADMINISTRATIVE AGENT
To: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
Reel/Frame 053466/0011 →
SECURITY INTEREST Recorded Apr 24, 2020
From: MICROCHIP TECHNOLOGY INC.; SILICON STORAGE TECHNOLOGY, INC.; ATMEL CORPORATION; MICROSEMI CORPORATION; MICROSEMI STORAGE SOLUTIONS, INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 053311/0305 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 3, 2019
From: SHAFIYAN-RAD, SAEED; MEDEIROS, MANUEL, III; DOIRON, DAVID SCOTT
To: MICROSEMI CORPORATION
Reel/Frame 048787/0655 →