Method for making displays
A display device, and method for manufacture, having a substrate; a first thin film transistor (TFT) on the substrate, the first TFT having a first active layer, a first gate insulator, and a first gate electrode; a second TFT on the substrate, the second TFT having a second active layer, a second gate insulator and a second gate electrode. The first gate insulator is disposed between the first gate electrode and the first active layer, and the first gate insulator is in contact with the first active layer. The second gate insulator is disposed between the second gate electrode and the second active layer, and the second gate insulator is in contact with the second active layer. The first active layer is a different material than said second active layer, and a hydrogen concentration of the second gate insulator is less than a hydrogen concentration of the first gate insulator.
1. A method for making a display, comprising the steps of:
forming a first active layer over a substrate;
forming a first gate insulator over said first active layer;
forming a second active layer over said substrate;
forming a first gate electrode and a second gate electrode over said first gate insulator;
forming a second gate insulator over said second active layer;
forming a first source electrode and a first drain electrode over said first active layer; and
forming a second source electrode and a second drain electrode over said second active layer,
wherein said first active layer, said first source electrode, said first drain electrode, and said first gate electrode form a first thin film transistor, and said second active layer, said second source electrode, said second drain electrode, and said second gate electrode form a second thin film transistor,
wherein a material of said first active layer is different from a material of said second active layer.
2. The method for making a display as claimed in claim 1 , wherein said first gate electrode and said second gate electrode are formed by the same process or have the same material.
3. The method for making a display as claimed in claim 1 , further comprising forming a dielectric layer over said first gate electrode and said second gate electrode, wherein said dielectric layer is between said second active layer and said second gate electrode.
4. The method for making a display as claimed in claim 1 , wherein said second active layer is formed over said first active layer.
5. The method for making a display as claimed in claim 1 , wherein said second source electrode and said second drain electrode are formed after forming a third gate electrode over said second active layer.
6. The method for making a display as claimed in claim 1 , wherein said first active layer comprises low temperature polycrystalline semiconductor (LTPS) material, and said second active layer is formed of indium gallium zinc oxide (IGZO) material.
7. The method for making a display as claimed in claim 6 , further comprising connecting at least one of said first thin film transistor and said second thin film transistor to a pixel in a display area of said substrate.
8. The method for making a display as claimed in claim 1 , wherein said first thin film transistor is formed in a non-display area of said substrate.
9. The method for making a display as claimed in claim 8 , wherein said second thin film transistor is formed in a display area adjacent to said non-display area of said substrate.
10. The method for making a display as claimed in claim 8 , further comprising connecting said first thin film transistor to a circuit.
11. The method for making a display as claimed in claim 8 , wherein said first thin film transistor is formed as an electrostatic discharge (ESD) protection.
12. The method for making a display as claimed in claim 1 , wherein at least part of said first thin film transistor and at least part of said second thin film transistor overlap.
13. The method for making a display as claimed in claim 12 , wherein said second gate insulator extends over said first thin film transistor.
14. The method for making a display as claimed in claim 1 , wherein said first gate insulator and said second gate insulator are formed of a single layer or multiple layers comprising SiOx and SiNx layers.
15. The method for making a display as claimed in claim 1 , further comprising forming a buffer layer between said first active layer and said substrate.
16. The method for making a display as claimed in claim 15 , wherein said buffer layer is formed of a single layer or multiple layers comprising SiOx and SiNx layers.
17. The method for making a display as claimed in claim 15 , wherein said second gate insulator has a lower hydrogen concentration than said buffer layer.
18. The method for making a display as claimed in claim 1 , wherein said second active layer is formed over said second gate electrode.
19. The method for making a display as claimed in claim 18 , further comprising forming a third gate electrode over said second gate insulator, wherein said third gate electrode overlaps with said second active layer, and said second gate insulator is under said first source electrode and said first drain electrode.
20. The method for making a display as claimed in claim 1 , wherein said display includes a liquid crystal display (LCD), a light emitting diode (LED) or an organic light emitting diode (OLED).