Transistor comprising an air gap positioned adjacent a gate electrode
A transistor device disclosed herein includes, among other things, a gate electrode positioned above a semiconductor material region, a sidewall spacer positioned adjacent the gate electrode, a gate insulation layer having a first portion positioned between the gate electrode and the semiconductor material region and a second portion positioned between a lower portion of the sidewall spacer and the gate electrode along a portion of a sidewall of the gate electrode, an air gap cavity located between the sidewall spacer and the gate electrode and above the second portion of the gate insulation layer, and a gate cap layer positioned above the gate electrode, wherein the gate cap layer seals an upper end of the air gap cavity so as to define an air gap positioned adjacent the gate electrode.
1. A device, comprising:
a gate electrode positioned above a semiconductor material region;
a sidewall spacer positioned adjacent the gate electrode;
a gate insulation layer having a first portion positioned between the gate electrode and the semiconductor material region and a second portion positioned between a lower portion of the sidewall spacer and a sidewall of a lower portion of the gate electrode;
an air gap cavity located between the sidewall spacer and an upper portion of the gate electrode, wherein an upper surface of the second portion of the gate insulation layer and an upper surface of the lower portion of the gate electrode define an outer lateral boundary of the air gap cavity; and
a gate cap layer positioned above the gate electrode, wherein the gate cap layer seals an upper end of the air gap cavity so as to define an air gap positioned adjacent the gate electrode,
wherein the lower portion of the gate electrode has a lateral thickness that is greater than a lateral thickness of the upper portion of the gate electrode, and
wherein the air gap cavity is in contact with the upper portion of the gate electrode.
2. The device of claim 1 , wherein the gate cap layer contacts upper sidewall portions of the sidewall spacer.
3. The device of claim 1 , further comprising a dielectric layer positioned adjacent the sidewall spacer, wherein the gate cap layer is positioned above an upper surface of the sidewall spacer and contacts the dielectric layer.
4. The device of claim 1 , wherein the first portion of the gate insulation layer is oriented substantially horizontally and the second portion of the gate insulation layer is oriented substantially vertically.
5. The device of claim 1 , wherein a lower end of the air gap cavity is bounded by an upper surface of the second portion of the gate insulation layer.
6. The device of claim 1 , wherein the sidewall spacer comprises an inner surface and wherein the second portion of the gate insulation layer is positioned on and in contact with a lower portion of the inner surface of the sidewall spacer.
7. The device of claim 6 , wherein the second portion of the gate insulation layer is positioned on and in contact with a portion of the sidewall of the gate electrode.
8. The device of claim 7 , wherein the sidewall spacer comprises a vertical height, wherein the second portion of the gate insulation layer is positioned along a portion of the vertical height of the sidewall spacer.
9. The device of claim 1 , wherein the gate insulation layer comprises one of silicon dioxide or a high-k material, the gate electrode comprises at least one metal-containing material and the sidewall spacer comprises silicon nitride.
10. The device of claim 1 , wherein the air gap cavity has a lateral thickness that is greater than a lateral thickness of the second portion of the gate insulation layer.
11. A device, comprising:
a gate electrode positioned above a semiconductor material region;
a sidewall spacer positioned adjacent the gate electrode;
a gate insulation layer having a first substantially horizontally oriented portion positioned between the gate electrode and the semiconductor material region and a second substantially vertically oriented portion positioned between a lower portion of the sidewall spacer and a sidewall of a lower portion of the gate electrode;
an air gap cavity located between the sidewall spacer and an upper portion of the gate electrode, wherein an upper surface of the second substantially vertically oriented portion of the gate insulation layer and an upper surface of the lower portion of the gate electrode define an outer lateral boundary of the air gap cavity; and
a gate cap layer positioned above the gate electrode, wherein the gate cap layer seals an upper end of the air gap cavity so as to define an air gap positioned adjacent the gate electrode,
wherein the lower portion of the gate electrode has a lateral thickness that is greater than a lateral thickness of the upper portion of the gate electrode, and
wherein the air gap cavity is in contact with the upper portion of the gate electrode.
12. The device of claim 11 , wherein the sidewall spacer comprises an inner surface wherein the gate cap layer contacts the inner surface of the sidewall spacer.
13. The device of claim 11 , further comprising a dielectric layer positioned adjacent the sidewall spacer, wherein the gate cap layer is positioned above an upper surface of the sidewall spacer and contacts the dielectric layer.
14. The device of claim 11 , wherein the sidewall spacer comprises an inner surface and wherein the second substantially vertically oriented portion of the gate insulation layer is positioned on and in contact with a lower portion of the inner surface of the sidewall spacer.
15. The device of claim 14 , wherein the second substantially vertically oriented portion of the gate insulation layer is positioned on and in contact with a portion of the sidewall of the gate electrode.
16. The device of claim 11 , wherein the sidewall spacer comprises a vertical height, wherein the second substantially vertically oriented portion of the gate insulation layer is positioned along a portion of the vertical height of the sidewall spacer.
17. A device, comprising:
a gate electrode positioned above a semiconductor material region;
a sidewall spacer positioned adjacent the gate electrode, the sidewall spacer comprising an inner surface and a vertical height;
a gate insulation layer having a first substantially horizontally oriented portion positioned between the gate electrode and the semiconductor material region and a second substantially vertically oriented portion positioned along a portion of the vertical height of the sidewall spacer, wherein the second substantially vertically oriented portion of the gate insulation layer is positioned on and in contact with a lower portion of the inner surface of the sidewall spacer and on and in contact with a sidewall of a lower portion of the gate electrode;
an air gap cavity located between the sidewall spacer and an upper portion of the gate electrode, wherein an upper surface of the second substantially vertically oriented portion of the gate insulation layer and an upper surface of the lower portion of the gate electrode define an outer lateral boundary of the air gap cavity; and
a gate cap layer positioned above the gate electrode, wherein the gate cap layer seals an upper end of the air gap cavity so as to define an air gap positioned adjacent the gate electrode,
wherein the lower portion of the gate electrode has a lateral thickness that is greater than a lateral thickness of the upper portion of the gate electrode, and
wherein the air gap cavity is in contact with the upper portion of the gate electrode.
18. The device of claim 17 , wherein the gate cap layer contacts an upper portion of the inner surface of the sidewall spacer.
19. The device of claim 17 , further comprising a dielectric layer positioned adjacent the sidewall spacer, wherein the gate cap layer is positioned above an upper surface of the sidewall spacer and contacts the dielectric layer.
20. The device of claim 17 , wherein the gate insulation layer comprises one of silicon dioxide or a high-k material, the gate electrode comprises at least one metal-containing material and the sidewall spacer comprises silicon nitride.