Semiconductor memory having both volatile and non-volatile functionality comprising resistive change material and method of operating
A semiconductor memory cell including a capacitorless transistor having a floating body configured to store data as charge therein when power is applied to the cell, and a non-volatile memory comprising a bipolar resistive change element, and methods of operating.
1. A semiconductor memory array comprising:
a plurality of memory cells arranged in a matrix of rows and columns, wherein at least two of said memory cells each include:
a capacitorless transistor having a floating body configured to store data when power is applied to said memory cell; and
a non-volatile memory comprising a bipolar resistive change element;
wherein said floating body is configured to be charged to a level indicative of a state of the memory cell based on resistivity of said bipolar resistive change element, upon restoration of power to said memory cell;
wherein said array is configured to perform a restore operation in parallel on said at least two of said memory cells;
wherein when said bipolar resistive change element of a first memory cell of said at least two of said memory cells is in a first resistivity level and said bipolar resistive change element of a second memory cell of said at least two of said memory cells is in a second resistivity level, upon restoration of power to said memory array, said floating body of said first memory cell of said at least two of said memory cells is charged to a first charge level as volatile memory and said floating body of said second memory cell of said at least two of said memory cells is charged to a second charge level as volatile memory.
2. The semiconductor memory array of claim 1 , wherein said memory cell functions as volatile memory upon said restoration of power to said memory cell.
3. The semiconductor memory array of claim 1 , wherein said floating body is configured to a predetermined state prior to being charged based on said resistivity of said bipolar resistive change element.
4. The semiconductor memory array of claim 1 , wherein said bipolar resistive change element is configured to a predetermined resistivity after said floating body is charged to a level based on said resistivity of said bipolar resistive change element.
5. The semiconductor memory array of claim 1 , wherein said capacitorless transistor comprises a first region in electrical contact with said floating body and a second region spaced apart from said first region and in electrical contact with said floating body.
6. The semiconductor memory array of claim 1 , wherein said bipolar resistive change element comprises a material selected from at least one of: transition metal oxide materials, ferroelectric materials and ferromagnetic materials.
7. The semiconductor memory array of claim 1 , wherein said bipolar resistive change element is electrically connected to said floating body and a distance between said bipolar resistive change element and said floating body, when electrically connected, is in the range from about 90 nm to 1 μm.
8. The semiconductor memory array of claim 1 , further comprising an addressable line electrically connected to said bipolar resistive change element.
9. The semiconductor memory array of claim 8 , wherein said bipolar resistive change element further comprises a conductive material element interconnecting said addressable line and said bipolar resistive change material.
10. The semiconductor memory array of claim 1 comprising a three-dimensional structure comprising a fin structure comprising said floating body, extending substantially perpendicular to, and above a top surface of a substrate.
11. An integrated circuit comprising:
a plurality of memory cells arranged in a matrix of rows and columns, wherein at least two of said memory cells each include:
a bipolar device configured to store data when power is applied to said memory cell;
a non-volatile memory comprising a bipolar resistive change element; and
a circuit configured to perform a restore operation on said at least two of said memory cells in parallel;
wherein said bipolar device is configured to be charged to a level indicative of a state of the memory cell based on resistivity of said bipolar resistive change element, upon restoration of power to said memory cell;
wherein when said bipolar resistive change element of a first memory cell of said at least two of said memory cells is in a first resistivity level and said bipolar resistive change element of a second memory cell of said at least two of said memory cells is in a second resistivity level, upon restoration of power to said memory array, said bipolar device of said first memory cell of said at least two of said memory cells is charged to a first charge level as volatile memory and said bipolar device of said second memory cell of said at least two of said memory cells is charged to a second charge level as volatile memory.
12. The integrated circuit of claim 11 , wherein said memory cell functions as volatile memory upon said restoration of power to said memory cell.
13. The integrated circuit of claim 11 , wherein said bipolar device is configured to a predetermined state prior to being charged based on said resistivity of said bipolar resistive change element.
14. The integrated circuit of claim 11 , wherein said bipolar resistive change element is configured to a predetermined resistivity after said bipolar device is charged to a level based on said resistivity of said bipolar resistive change element.
15. The integrated circuit of claim 11 , wherein said bipolar device comprises a floating body region, a first region in electrical contact with said floating body region and a second region spaced apart from said first region and in electrical contact with said floating body region.
16. The integrated circuit of claim 11 , wherein said bipolar resistive change element comprises a material selected from at least one of: transition metal oxide materials, ferroelectric materials and ferromagnetic materials.
17. The integrated circuit of claim 11 , wherein said bipolar resistive change element is electrically connected to said bipolar device and a distance between said bipolar resistive change element and said bipolar device, when electrically connected, is in the range from about 90 nm to 1 μm.
18. The integrated circuit of claim 11 , further comprising an addressable line electrically connected to said bipolar resistive change element.
19. The integrated circuit of claim 18 , wherein said bipolar resistive change element further comprises a conductive material element interconnecting said addressable line and said bipolar resistive change material.
20. The integrated circuit of claim 11 comprising a three-dimensional structure comprising a fin structure comprising said bipolar device, extending substantially perpendicular to, and above a top surface of a substrate.