Load lock fast pump vent
View Patent ↗A semiconductor processing tool is disclosed, the tool having a frame forming at least one chamber with an opening and having a sealing surface around a periphery of the opening, a door configured to interact with the sealing surface for sealing the opening, the door having sides perpendicular to the door sealing surface and perpendicular to a transfer plane of a substrate, and at least one drive located on the frame to a side of at least one of the sides that are substantially perpendicular to the door sealing surface and substantially perpendicular to the transfer plane of the substrate, the drive having actuators located at least partially in front of the sealing surface and the actuators being coupled to one of the sides of the door for moving the door from a sealed position. The at least one drive is located outside of a substrate transfer zone.
1. A semiconductor processing tool comprising:
a frame forming a modular unit that is matable as a unit to a transfer chamber;
stacked sealable chambers formed within the modular unit; and
an interchangeable valve module having a common fluid transfer manifold coupled to each of the stacked sealable chambers, where each interchangeable valve module is interchangeable with another interchangeable valve module having a different predetermined characteristic than the interchangeable valve module, and each common fluid transfer manifold is coupled and decoupled from the respective stacked sealable chambers as a unit and includes more than one fluid port in communication with the respective sealable chambers.
2. The semiconductor processing tool of claim 1 , wherein each of the stacked sealable chambers comprises a load lock.
3. The semiconductor processing tool of claim 1 , wherein the interchangeable valve module includes one or more of a vacuum control valve and a vent valve, where each interchangeable valve module is configured to provide independent cycling of a respective atmosphere within each stacked sealable chambers.
4. The semiconductor processing tool of claim 1 , wherein each of the stacked sealable chambers includes one or more of a vacuum port and a vent port.
5. The semiconductor processing tool of claim 4 , wherein the one or more of the vacuum port and the vent port are arranged in a port pair, where one of the vacuum port or the vent port is disposed above the other.
6. The semiconductor processing tool of claim 4 , where the one or more of the vacuum port and the vent port has a mating interface configured to interface with the interchangeable valve module.
7. The semiconductor processing tool of claim 1 , wherein
the interchangeable valve module is configured to vent a first one of the stacked sealable chambers and pump down a second one of the stacked sealable chambers, and
another interchangeable valve module is configured to pump down the first one of the stacked sealable chambers and vent the second one of the stacked sealable chambers.
8. A method for operating a semiconductor processing tool comprising:
providing a frame forming a modular unit that is matable as a unit to a transfer chamber;
providing stacked sealable chambers formed within the modular unit; and
cycling a respective atmosphere within each of the stacked sealable chambers with a common fluid transfer manifold coupled to each of the stacked sealable chambers, wherein the common fluid transfer manifold is selectable from a number of different interchangeable common fluid transfer manifolds each having different fluid transfer characteristics.
9. The method of claim 8 , wherein each of the stacked sealable chamber comprises a load lock.
10. The method of claim 8 , wherein the common fluid transfer manifold includes one or more of a vacuum control valve and a vent valve.
11. The method of claim 8 , wherein each of the stacked sealable chambers includes one or more of a vacuum port and a vent port.
12. The method of claim 8 , further comprising pumping down the respective atmosphere within each of the stacked sealable chambers with a vacuum control manifold of the common fluid transfer manifold.
13. The method of claim 12 , further comprising venting the respective atmosphere within each of the stacked sealable chambers with a vent manifold of another common fluid transfer manifold, of the number of different interchangeable common fluid transfer manifolds, coupled to each of the stacked sealable chambers.
14. The method of claim 13 , further comprising:
venting a first one of the stacked sealable chambers and pumping down a second one of the stacked sealable chambers with the common fluid transfer manifold, and
pumping down the first one of the stacked sealable chambers and venting the second one of the stacked sealable chambers with the another common fluid transfer manifold.