Solid state imaging device and electronic apparatus
A solid state imaging device including: a pixel region that is formed on a light incidence side of a substrate and to which a plurality of pixels that include photoelectric conversion units is arranged; a peripheral circuit unit that is formed in a lower portion in the substrate depth direction of the pixel region and that includes an active element; and a light shielding member that is formed between the pixel region and the peripheral circuit unit and that shields the incidence of light, emitted from an active element, to the photoelectric conversion unit.
1. A solid state imaging device, comprising:
a pixel region that is formed on a light incidence side of a substrate and to which a plurality of pixels that includes photoelectric conversion units is arranged;
a peripheral circuit unit that is formed in a lower portion in a substrate depth direction of the pixel region and that includes an active element; and
a light shielding member that is formed between the pixel region and the peripheral circuit unit and that shields incidence of light, emitted from an active element, to the photoelectric conversion units,
wherein the light shielding member is formed by a combination of a reflection and dispersion member that reflects and disperses light, and a light absorbing member that absorbs light.
2. The solid state imaging device according to claim 1 ,
wherein the plurality of pixels is formed to include a plurality of pixel transistors, and
an active element of the peripheral circuit unit is formed by one or both of a MOS transistor and a diode.
3. The solid state imaging device according to claim 2 ,
wherein the substrate is configured by affixing a first semiconductor chip unit that includes a multilayer wiring layer and the pixel region with a second semiconductor chip unit that includes a multilayer wiring layer and the peripheral circuit unit,
wherein the peripheral circuit includes a logic circuit, and
the first semiconductor chip unit and the second semiconductor chip unit are electrically connected by a connected conductor that penetrates the first semiconductor chip unit.
4. The solid state imaging device according to claim 3 ,
wherein the first semiconductor chip unit and the second semiconductor chip unit are affixed with the multilayer wiring layer of each semiconductor chip unit facing each other.
5. The solid state imaging device according to claim 1 , wherein the reflection and dispersion member is formed by a single metallic film.
6. The solid state imaging device according to claim 1 , wherein the reflection and dispersion member is formed by a wiring of a plurality of layers, a dummy wiring of a plurality of layers, or a combination of a wiring and a dummy wiring of a plurality of layers of the multilayer wiring layer, each of which partially overlaps another.
7. The solid state imaging device according to claim 1 , wherein the reflection and dispersion member is formed by a combination of a single metallic film and a wiring of a plurality of layers, a dummy wiring of a plurality of layers, or a combination of a wiring and a dummy wiring of a plurality of layers of the multilayer wiring layer.
8. The solid state imaging device according to claim 1 , wherein the light absorbing member is formed of a single film using a semiconductor with a small band gap.
9. An electronic apparatus, comprising:
a solid state imaging device;
an optical system that guides incident light to photoelectric conversion units of the solid state imaging device; and
a signal processing circuit that processes an output signal of the solid state imaging device,
wherein the solid state imaging device is configured by a solid state imaging device according to claim 1 .
10. A solid state imaging device, comprising:
a pixel region that is formed on a light incidence side of a substrate and to which a plurality of pixels that includes photoelectric conversion units is arranged;
a peripheral circuit unit that is formed in a lower portion in a substrate depth direction of the pixel region and that includes an active element; and
a light shielding member that is formed between the pixel region and the peripheral circuit unit and that shields incidence of light, emitted from an active element, to the photoelectric conversion units,
wherein the light shielding member is formed by a light absorbing member that absorbs light.
11. The solid state imaging device according to claim 10 , wherein the plurality of pixels is formed to include a plurality of pixel transistors, and
an active element of the peripheral circuit unit is formed by one or both of a MOS transistor and a diode.
12. The solid state imaging device according to claim 11 , wherein the substrate is configured by affixing a first semiconductor chip unit that includes a multilayer wiring layer and the pixel region with a second semiconductor chip unit that includes a multilayer wiring layer and the peripheral circuit unit,
wherein the peripheral circuit includes a logic circuit, and
the first semiconductor chip unit and the second semiconductor chip unit are electrically connected by a connected conductor that penetrates the first semiconductor chip unit.
13. The solid state imaging device according to claim 12 , wherein the first semiconductor chip unit and the second semiconductor chip unit are affixed with the multilayer wiring layer of each semiconductor chip unit facing each other.
14. The solid state imaging device according to claim 10 , wherein the light shielding member is also formed by a reflection and dispersion member that reflects and disperses light.
15. The solid state imaging device according to claim 14 , wherein the reflection and dispersion member is formed by a single metallic film.
16. The solid state imaging device according to claim 14 , wherein the reflection and dispersion member is formed by a wiring of a plurality of layers, a dummy wiring of a plurality of layers, or a combination of a wiring and a dummy wiring of a plurality of layers of the multilayer wiring layer, each of which partially overlaps another.
17. The solid state imaging device according to claim 14 , wherein the reflection and dispersion member is formed by a combination of a single metallic film and a wiring of a plurality of layers, a dummy wiring of a plurality of layers, or a combination of a wiring and a dummy wiring of a plurality of layers of the multilayer wiring layer.
18. The solid state imaging device according to claim 10 , wherein the light absorbing member is formed of a single film using a semiconductor with a small band gap.
19. An electronic apparatus, comprising:
a solid state imaging device;
an optical system that guides incident light to photoelectric conversion units of the solid state imaging device; and
a signal processing circuit that processes an output signal of the solid state imaging device,
wherein the solid state imaging device is configured by a solid state imaging device according to claim 10 .