Substrate support apparatus and substrate cleaning apparatus
A substrate support apparatus 100 has a support part 10 for supporting a substrate W; a moving part 50 which is adapted to abut on the support part 10 and to move the support part 10 along an axis direction; a fluid pipe 60 at least a part of which is provided in the moving part 50 , through which fluid flows and an outlet port 61 of which is covered by the support part 10 when the moving part 50 abuts on the support part 10 ; and a detection part 90 which detects a state of the fluid.
1. A substrate cleaning apparatus comprising:
a support part for supporting a substrate;
a moving part configured to be separate from the support part in a first state, wherein the moving part is configured to move to the support part, abut the support part in a second state and move the support part along an axis direction in the second state;
a fluid pipe at least a part of which is provided in the moving part, through which gas flows and an outlet port of which is covered by the support part when the moving part abuts on the support part in the second state;
a detection part which detects pressure or flow rate of the gas; and
a control part configured to determine whether the moving part abuts the support part in the second state when the pressure of the gas detected by the detection part increased or the flow rate of the gas detected by the detection part reduced.
2. The substrate cleaning apparatus according to claim 1 , wherein
a plurality of support parts are provided,
the moving part is provided corresponding to each of the support parts, and
the fluid pipe is provided in each moving part.
3. The substrate cleaning apparatus according to claim 1 , wherein
a plurality of fluid pipes are provided,
the detection part is provided to each fluid pipe, and
the control part detects abnormality based on detection result from each detection part.
4. The substrate cleaning apparatus according to claim 3 , wherein
the control part determines that an abnormality occurs when an interval between a time when the control part determines that a certain moving part abuts on a certain support part and a time when the control part determines that another moving part abuts on another support part is a first time or more.
5. The substrate cleaning apparatus according to claim 3 , wherein
the control part determines that an abnormality occurs when an interval between a time when the control part determines that a certain moving part separates from a certain support part and a time when the control part determines that another moving part separates from another support part is a second time or more.
6. The substrate cleaning apparatus according to claim 3 , wherein
the control part determines that an abnormality occurs when the detection part does not detect that the moving part abuts on the support part within a third time from a time when the moving part starts moving toward the support part.
7. The substrate cleaning apparatus according to claim 3 , wherein
the control part determines that an abnormality occurs when the detection part does not detect that the moving part separates from the support part within a fourth time from a time when the moving part starts moving in a direction separating from the support part.
8. The substrate cleaning apparatus according to claim 3 , comprising
a notification part which notifies information to prompt cleaning or replacement of the support part when the control part determines that an abnormality occurs.
9. The substrate cleaning apparatus according to claim 1 , wherein a top surface of the moving part abuts on a bottom surface of the support part when the moving part abuts on the support part in the second state.
10. The substrate cleaning apparatus according to claim 1 , wherein the moving part is separated from the support part when the moving part does not abut on the support part in the first state.