IP Library Granted Patent US 11,538,857
Granted Patent B2
US 11,538,857 · App. 16/836,922 · Granted Dec 27, 2022

Bidirectional selector device for memory applications

Inventors: Zhiqiang Wei (Pleasanton, CA); Hongxin Yang (Newark, CA)
Assignee: Avalanche Technology, Inc.
H01L27/224G11C11/161H01F10/329H01F10/3259H01F10/3286H01L43/02H01L45/085H01L45/1233H01L45/1253H01L45/146
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 11,538,857
App. No.
16/836,922
Granted
Dec 27, 2022
Kind
B2
Abstract

The present invention is directed to a magnetic memory cell including a magnetic tunnel junction (MTJ) memory element and a two-terminal bidirectional selector coupled in series between two conductive lines. The MTJ memory element includes a magnetic free layer, a magnetic reference layer, and an insulating tunnel junction layer interposed therebetween. The two-terminal bidirectional selector includes bottom and top electrodes, first and third volatile switching layers interposed between the bottom and top electrodes, and a second volatile switching layer interposed between the first and third volatile switching layers. The bottom and top electrodes each independently include one of titanium nitride or iridium. The first and third volatile switching layers each include tantalum oxide and silver. The second volatile switching layer includes hafnium oxide and has a higher electrical resistance than the first and third volatile switching layers.

Claims (46)

1. A magnetic memory cell comprising:

a magnetic tunnel junction (MTJ) including:

a magnetic free layer having a variable magnetization direction substantially perpendicular to a layer plane of said magnetic free layer;

a magnetic reference layer having an invariable magnetization direction substantially perpendicular to a layer plane of said magnetic reference layer; and

an insulating tunnel junction layer interposed between said magnetic free and reference layers; and

a two-terminal bidirectional selector electrically connected to said MTJ and including:

a bottom electrode;

a top electrode;

a first volatile switching layer interposed between said bottom and top electrodes, said first volatile switching layer comprising a non-stoichiometric tantalum oxide and a metal dopant; and

a second volatile switching layer interposed between said bottom and top electrodes, said second volatile switching layer comprising hafnium oxide and having a higher electrical resistance than said first volatile switching layer.

2. The magnetic memory cell of claim 1 , wherein a current-voltage response of said two-terminal bidirectional selector is characterized by a hysteresis loop.

3. The magnetic memory cell of claim 1 , wherein said two-terminal bidirectional selector has two distinct electrical resistances at an applied voltage.

4. The magnetic memory cell of claim 1 , wherein only single conductive filament is formed in said second volatile switching layer when said two-terminal bidirectional selector is in a conductive state.

5. The magnetic memory cell of claim 1 , wherein said metal dopant is silver or copper.

6. The magnetic memory cell of claim 1 , wherein said metal dopant is one of tellurium, nickel, or cobalt.

7. The magnetic memory cell of claim 1 , wherein said hafnium oxide has a stoichiometric or near stoichiometric composition.

8. The magnetic memory cell of claim 1 , wherein said bottom and top electrodes have a same composition.

9. The magnetic memory cell of claim 1 , wherein said bottom and top electrodes each independently comprise one of titanium nitride or iridium.

10. The magnetic memory cell of claim 1 , wherein said bottom and top electrodes each independently comprise one of tantalum nitride, tantalum, or ruthenium.

11. The magnetic memory cell of claim 1 , wherein said two-terminal bidirectional selector further includes a third volatile switching layer formed adjacent to said second volatile switching layer opposite said first volatile switching layer, said third volatile switching layer comprising said non-stoichiometric tantalum oxide and silver.

12. A magnetic memory cell comprising:

a magnetic tunnel junction (MTJ) including:

a magnetic free layer having a variable magnetization direction substantially perpendicular to a layer plane of said magnetic free layer;

a magnetic reference layer having an invariable magnetization direction substantially perpendicular to a layer plane of said magnetic reference layer; and

an insulating tunnel junction layer interposed between said magnetic free and reference layers; and

a two-terminal bidirectional selector electrically connected to said MTJ and including:

a bottom electrode;

a top electrode;

a first volatile switching layer interposed between said bottom and top electrodes, said first volatile switching layer comprising a non-stoichiometric metal oxide; and

a second volatile switching layer interposed between said bottom and top electrodes, said second volatile switching layer comprising a stoichiometric or near stoichiometric metal oxide and having a higher electrical resistance than said first volatile switching layer.

13. The magnetic memory cell of claim 12 , wherein a current-voltage response of said two-terminal bidirectional selector is characterized by a hysteresis loop.

14. The magnetic memory cell of claim 12 , wherein only single conductive filament is formed in said second volatile switching layer when said two-terminal bidirectional selector is in a conductive state.

15. The magnetic memory cell of claim 12 , wherein said stoichiometric or near stoichiometric metal oxide has higher electrical resistivity than said non-stoichiometric metal oxide.

16. The magnetic memory cell of claim 12 , wherein said first volatile switching layer further comprises a metal dopant.

17. The magnetic memory cell of claim 12 , wherein said two-terminal bidirectional selector further includes a third volatile switching layer formed adjacent to said second volatile switching layer opposite said first volatile switching layer, said third volatile switching layer comprising said non-stoichiometric metal oxide.

18. A magnetic memory cell comprising:

a magnetic tunnel junction (MTJ) including:

a magnetic free layer having a variable magnetization direction substantially perpendicular to a layer plane of said magnetic free layer;

a magnetic reference layer having an invariable magnetization direction substantially perpendicular to a layer plane of said magnetic reference layer; and

an insulating tunnel junction layer interposed between said magnetic free and reference layers; and

a two-terminal bidirectional selector electrically connected to said MTJ and including:

bottom and top electrodes each independently comprising one of titanium nitride or iridium;

first and third volatile switching layers interposed between said bottom and top electrodes, said first and third volatile switching layers comprising tantalum oxide and silver; and

a second volatile switching layer interposed between said first and third volatile switching layers, said second volatile switching layer comprising hafnium oxide and having a higher electrical resistance than said first and third volatile switching layers.

19. The magnetic memory cell of claim 18 , wherein a current-voltage response of said two-terminal bidirectional selector is characterized by a hysteresis loop.

20. The magnetic memory cell of claim 18 , wherein only single conductive filament is formed in said second volatile switching layer when said two-terminal bidirectional selector is in a conductive state.

Assignments (5)
SECURITY INTEREST Recorded Mar 18, 2022
From: AVALANCHE TECHNOLOGY, INC.
To: STRUCTURED ALPHA LP
Reel/Frame 059436/0203 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 15, 2022
From: WEI, ZHIQIANG; YANG, HONGXIN
To: AVALANCHE TECHNOLOGY, INC.
Reel/Frame 058667/0087 →
SECURITY INTEREST Recorded Apr 19, 2021
From: AVALANCHE TECHNOLOGY, INC.
To: STRUCTURED ALPHA LP
Reel/Frame 057213/0050 →
SECURITY INTEREST Recorded Apr 19, 2021
From: AVALANCHE TECHNOLOGY, INC.
To: STRUCTURED ALPHA LP
Reel/Frame 057217/0674 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 1, 2020
From: WEI, ZHIQIANG
To: AVALANCHE TECHNOLOGY, INC.
Reel/Frame 052279/0013 →
Continuity (6)
Continuation In Part 16793349 · Feb 18, 2020
Division 15863825 · Jan 5, 2018
Continuation In Part 15438631 · Feb 21, 2017
Continuation In Part 15157607 · May 18, 2016
Related Publication 20210313393A1 · Oct 7, 2021
Related Publication 20220352255A9 · Nov 3, 2022