IP Library Granted Patent US 10,985,734
Granted Patent B2
US 10,985,734 · App. 16/844,149 · Granted Apr 20, 2021

Radio frequency switch

Inventor: Gareth Pryce Weale (New Hamburg, CA)
Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
H03H11/245H03G1/007H03K17/687H03K17/6871H03K17/6874H03K17/693H03H11/28H03K2017/6878H04B1/44
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Quick Facts
Patent No.
US 10,985,734
App. No.
16/844,149
Granted
Apr 20, 2021
Kind
B2
Abstract

A radio frequency switch is disclosed. The RF switch uses a combination of transistor technology and a topology to create an RF switch that has a high isolation and a high voltage breakdown at frequencies including those above a gigahertz.

Claims (36)

1. An RF switch comprising:

a pair of III-V switches connected in series between an input and an output of the RF switch, the pair of III-V switches connected to each other at a shunt-connection node; and

an SOI switch connected between the shunt-connection node and a ground.

2. The RF switch according to claim 1 , wherein the pair of III-V switches are gallium arsenide (GaAs) transistors.

3. The RF switch according to claim 1 , wherein the pair of III-V switches are silicon carbide (SiC) transistors.

4. The RF switch according to claim 1 , wherein the pair of III-V switches are gallium nitride (GaN) transistors.

5. The RF switch according to claim 1 , wherein the SOI switch is a stack of silicon-on-insulator (SOI) transistors.

6. The RF switch according to claim 5 , wherein a count of SOI transistors in the stack of SOI transistors corresponds to a breakdown voltage of one of the pair of III-V switches.

7. The RF switch according to claim 1 , wherein the RF switch is configured to switch the input to the output when the pair of III-V switches are in an ON condition and the SOI switch in an OFF condition.

8. The RF switch according to claim 1 , wherein the RF switch is configured to isolate the input from the output when the pair of III-V switches are in an OFF condition and the SOI switch is in an ON condition.

9. The RF switch according to claim 1 , wherein a breakdown voltage of the pair of III-V switches is higher than a breakdown voltage of the SOI switch.

10. A method for switching an RF signal, the method comprising:

blocking the RF signal by:

controlling a pair of switches of a first material to be in an OFF condition to block all but a leakage portion of the RF signal, the pair of switches of the first material being silicon carbide (SiC) transistors, and

controlling a switch of a second material to be in an ON condition to short the leakage portion of the RF signal to a ground.

11. The method for switching an RF signal according to claim 10 , further comprising:

passing the RF signal by:

controlling the pair of switches of the first material to be in the ON condition to pass the RF signal, and

controlling the switch of the second material to be in the OFF condition to isolate the RF signal from ground.

12. The method for switching an RF signal according to claim 10 , further comprising:

applying a first signal to control the pair of switches of the first material; and

applying a second signal to control the switch of the second material, the first signal and the second signal being complementary ON/OFF signals.

13. The method for switching an RF signal according to claim 10 , wherein the switch of the second material is a silicon-on-insulator (SOI) switch.

14. The method for switching an RF signal according to claim 13 , wherein the SOI switch is a stack of SOI transistors.

15. The method for switching an RF signal according to claim 14 , wherein a number of SOI transistors in the stack of SOI transistors corresponds to a break down voltage of the pair of switches of a first material.

16. The method for switching an RF signal according to claim 10 , wherein RF signal is at a frequency in a range between and including 0.5 Gigahertz (GHz) and 10 GHz.

17. The method for switching an RF signal according to claim 10 , wherein a breakdown voltage of the pair of switches of the first material is higher than a breakdown voltage of the switch of the second material.

18. A method for switching an RF signal, the method comprising:

blocking the RF signal by:

controlling a pair of switches of a first material to be in an OFF condition to block all but a leakage portion of the RF signal, the pair of switches of the first material being gallium nitride (GaN) transistors, and

controlling a switch of a second material to be in an ON condition to short the leakage portion of the RF signal to a ground.

19. The method for switching an RF signal according to claim 18 , further comprising:

passing the RF signal by:

controlling the pair of switches of the first material to be in the ON condition to pass the RF signal, and

controlling the switch of the second material to be in the OFF condition to isolate the RF signal from ground.

20. The method for switching an RF signal according to claim 18 , wherein the switch of the second material is a silicon-on-insulator (SOI) switch.

Assignments (4)
RELEASE OF SECURITY INTEREST IN PATENTS PREVIOUSLY RECORDED AT REEL 053613, FRAME 0621 Recorded Aug 17, 2023
From: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC; FAIRCHILD SEMICONDUCTOR CORPORATION
Reel/Frame 064618/0942 →
SECURITY INTEREST Recorded Jul 13, 2023
From: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC; GTAT CORPORATION
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 064271/0971 →
SECURITY INTEREST Recorded Aug 27, 2020
From: FAIRCHILD SEMICONDUCTOR CORPORATION; SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
To: DEUTSCHE BANK AG NEW YORK BRANCH, AS COLLATERAL AGENT
Reel/Frame 053613/0621 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 9, 2020
From: WEALE, GARETH PRYCE
To: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
Reel/Frame 052354/0726 →