Method for producing a semiconductor module by using adhesive attachment prior to sintering

1. A method for producing a semiconductor module, comprising the steps:

providing a carrier plate and a substrate having a bonding layer arranged on a surface of the carrier plate or the substrate,

applying adhesive in multiple adhesive areas of the carrier plate or the substrate which are free from the bonding layer, wherein a temperature of the adhesive is kept above a melting temperature between 60° C. and 140° C.,

positioning the substrate on the carrier plate such that the substrate and the carrier plate are in contact with the bonding layer and the adhesive, wherein positioning of the substrate on the carrier plate is done while the adhesive is at the temperature above the melting temperature, and

joining the substrate and the carrier plate across the bonding layer by melting or sintering of the bonding layer.

2. The method according to claim 1 , wherein temperatures are used for the melting or sintering of the bonding layer that are above the boiling temperature of the adhesive.

3. The method according to claim 1 , wherein a pick and place machine is used for positioning the substrate on the carrier plate.

4. The method according to claim 1 , wherein the adhesive is situated in marginal recesses of the bonding layer.

5. The method according to claim 1 , wherein the adhesive used is a plastic with a melting temperature between 60° C. and 140° C. and an evaporation temperature between 160° C. and 300° C.

6. The method according to claim 1 , wherein a half-bridge is produced as the semiconductor module or multiple semiconductor modules are produced, each of them being half-bridges and being used as a component of a semiconductor device, being a rectifier or an inverter.

7. The method according to claim 2 , wherein a pick and place machine is used for positioning the substrate on the carrier plate.

8. The method according to claim 2 , wherein the adhesive is situated in marginal recesses of the bonding layer.

9. The method according to claim 3 , wherein the adhesive is situated in marginal recesses of the bonding layer.

10. The method according to claim 2 , wherein the adhesive used is a plastic with a melting temperature between 60° C. and 140° C. and an evaporation temperature between 160° C. and 300° C.

11. The method according to claim 3 , wherein the adhesive used is a plastic with a melting temperature between 60° C. and 140° C. and an evaporation temperature between 160° C. and 300° C.