IP Library Granted Patent US 11,557,555
Granted Patent B2
US 11,557,555 · App. 16/897,910 · Granted Jan 17, 2023

Bumped pad structure

Inventors: Hsiao Jung Lin (Taichung, TW); Ai Wen Wang (Taichung, TW); Chien Te Chen (Taichung, TW); Chieh kai Yang (Changhua, TW)
Assignee: WESTERN DIGITAL TECHNOLOGIES, INC.
H01L24/05H01L24/03H01L24/13H01L2224/0362H01L2224/03462H01L2224/0401H01L2224/05017H01L2224/05144H01L2224/05155H01L2224/13026
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Quick Facts
Patent No.
US 11,557,555
App. No.
16/897,910
Granted
Jan 17, 2023
Kind
B2
Abstract

A bumped solder pad and methods for adding bumps to a solder pad are provided. A substrate is provided having metal layer formed thereon and a solder pad formed from a portion of the metal layer. A surface treatment is applied to the solder pad. The surface treatment is patterned. The surface treatment is etched to produce at least one bump on the solder pad.

Claims (36)

1. A method for adding at least one bump to a solder pad, the method comprising:

providing a substrate having a metal layer formed thereon and the solder pad formed from a portion of the metal layer;

applying and developing a photo-resist material to the solder pad;

applying a solder resist;

removing areas of the solder resist;

patterning the photo-resist material including selectively dissolving portions of the photo-resist material;

additively applying a surface treatment to the solder pad to produce the at least one bump on the solder pad;

removing remaining portions of the photo-resist material; and

applying a second surface treatment to the surface treatment, the second surface treatment comprising an organic solderability preservative.

2. The method according to claim 1 , wherein the surface treatment comprises a metal.

3. The method according to claim 1 , wherein the surface treatment comprises gold.

4. The method according to claim 1 , wherein the surface treatment comprises a nickel-gold alloy.

5. The method according to claim 1 , wherein applying the surface treatment to the solder pad comprises electroplating metal to the solder pad.

6. The method according to claim 1 , wherein additively applying the surface treatment comprises electroplating the surface treatment to the solder pad.

7. The method according to claim 1 , wherein patterning the photo-resist material exposes a portion of the solder pad.

8. The method according to claim 1 , the method further comprising:

exposing the photo-resist material to a transfer pattern; and

etching the metal layer.

9. A solder pad comprising:

a metal layer formed on a substrate to form the solder pad;

a photo-resist layer applied, developed, and pattered to the solder pad to selectively dissolve portions of the photo-resist material prior to one or more surface treatments;

a surface treatment additively applied to the metal layer, the surface treatment comprising at least one bump; and

a second surface treatment applied to the surface treatment, the second surface treatment comprising an organic solderability preservative.

10. The solder pad according to claim 9 , wherein the surface treatment comprises a metal.

11. The solder pad according to claim 9 , wherein the surface treatment comprises gold.

12. The solder pad according to claim 9 , wherein the surface treatment comprises a nickel-gold alloy.

13. The solder pad according to claim 9 , wherein additively applying the surface treatment to the solder pad comprises electroplating metal to the solder pad.

14. A solder pad comprising:

a metal layer means formed on a substrate means to form the solder pad;

a photo-resist means applied, developed, and pattered to the solder pad to selectively dissolve portions of the photo-resist material prior to one or more surface treatment means;

a surface treatment means additively applied to the metal layer means, the surface treatment means comprising at least one bump; and

a second surface treatment means applied to the surface treatment, the second surface treatment comprising an organic solderability preservative.

15. The solder pad according to claim 14 , wherein the surface treatment means comprises a metal.

16. The solder pad according to claim 14 , wherein the surface treatment means comprises gold.

17. The solder pad according to claim 14 , wherein the surface treatment means comprises a nickel-gold alloy.

18. The solder pad according to claim 14 , wherein additively applying the surface treatment means to the solder pad comprises electroplating metal to the solder pad.

Assignments (10)
PARTIAL RELEASE OF SECURITY INTERESTS Recorded Apr 25, 2025
From: JPMORGAN CHASE BANK, N.A., AS AGENT
To: SANDISK TECHNOLOGIES, INC.
Reel/Frame 071382/0001 →
SECURITY AGREEMENT Recorded Apr 25, 2025
From: SANDISK TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 071050/0001 →
PATENT COLLATERAL AGREEMENT Recorded Aug 23, 2024
From: SANDISK TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A., AS THE AGENT
Reel/Frame 068762/0494 →
CHANGE OF NAME Recorded Jun 27, 2024
From: SANDISK TECHNOLOGIES, INC.
To: SANDISK TECHNOLOGIES, INC.
Reel/Frame 067982/0032 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 29, 2024
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: SANDISK TECHNOLOGIES, INC.
Reel/Frame 067567/0682 →
PATENT COLLATERAL AGREEMENT - DDTL LOAN AGREEMENT Recorded Aug 21, 2023
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 067045/0156 →
PATENT COLLATERAL AGREEMENT - A&R LOAN AGREEMENT Recorded Aug 21, 2023
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 064715/0001 →
RELEASE OF SECURITY INTEREST AT REEL 053926 FRAME 0446 Recorded Feb 8, 2022
From: JPMORGAN CHASE BANK, N.A.
To: WESTERN DIGITAL TECHNOLOGIES, INC.
Reel/Frame 058966/0321 →
SECURITY INTEREST Recorded Sep 29, 2020
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A., AS AGENT
Reel/Frame 053926/0446 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 12, 2020
From: LIN, HSIAO JUNG; WANG, AI WEN; CHEN, CHIEN TE; YANG, CHIEH KAI
To: WESTERN DIGITAL TECHNOLOGIES, INC.
Reel/Frame 052923/0685 →