Spin current magnetization rotational element, magnetoresistance effect element, and magnetic memory
Provided is a spin current magnetization rotational element, including: a first ferromagnetic metal layer for a magnetization direction to be changed; and a spin-orbit torque wiring which extends in a second direction intersecting a first direction that is a plane-orthogonal direction of the first ferromagnetic metal layer, the first ferromagnetic metal layer being located on one surface of the spin-orbit torque wiring, wherein the spin-orbit torque wiring has a structure in which a spin conduction layer and an interfacial spin generation layer are alternately laminated in the first direction, a number of a plurality of the interfacial spin generation layers is two or more, and at least one of the plurality of the interfacial spin generation layer is made of a compound.
1. A spin current magnetization rotational element, comprising:
a first ferromagnetic metal layer for a magnetization direction to be changed; and
a spin-orbit torque wiring which extends in a second direction intersecting a first direction that is a plane-orthogonal direction of the first ferromagnetic metal layer, the first ferromagnetic metal layer being located on one surface of the spin-orbit torque wiring,
wherein the spin-orbit torque wiring has a structure in which a spin conduction layer and an interfacial spin generation layer are alternately laminated in the first direction,
a number of a plurality of the interfacial spin generation layers is two or more, and
at least one of the plurality of the interfacial spin generation layer is made of a compound.
2. The spin current magnetization rotational element according to claim 1 , wherein the compound is an oxide, an nitride, an oxynitride or a carbide.
3. The spin current magnetization rotational element according to claim 1 ,
wherein a content ratio of an element constituting the oxide, the nitride, the oxynitride or the carbide equals to or is less than a stoichiometric ratio of the compound.
4. The spin current magnetization rotational element according to claim 2 ,
wherein a content ratio of an element constituting the oxide, the nitride, the oxynitride or the carbide is less than a stoichiometric ratio of the compound.
5. The spin current magnetization rotational element according to claim 1 ,
wherein the spin conduction layer is constituted by a material that includes at least any one kind of element among Al, Si, Cu, Ag, GaAs, and Ge.
6. The spin current magnetization rotational element according to claim 2 ,
wherein the spin conduction layer is constituted by a material that includes at least any one kind of element among Al, Si, Cu, Ag, GaAs, and Ge.
7. The spin current magnetization rotational element according to claim 3 ,
wherein the spin conduction layer is constituted by a material that includes at least any one kind of element among Al, Si, Cu, Ag, GaAs, and Ge.
8. The spin current magnetization rotational element according to claim 4 ,
wherein the spin conduction layer is constituted by a material that includes at least any one kind of element among Al, Si, Cu, Ag, GaAs, and Ge.
9. The spin current magnetization rotational element according to claim 1 ,
wherein the plurality of interfacial spin generation layers are constituted by a material that includes any element among Mo, Ru, Rh, Pd, Ta, W, Ir, Pt, Au, or Bi.
10. The spin current magnetization rotational element according to claim 1 ,
wherein a thickness of each of the plurality of interfacial spin generation layer is two or less times an atomic radius of an atom that constitutes the interfacial spin generation layer.
11. The spin current magnetization rotational element according to claim 1 ,
wherein the thickness of the spin conduction layer is equal to or less than a spin diffusion length of the spin conduction layer.
12. The spin current magnetization rotational element according to claim 1 ,
wherein among the plurality of interfacial spin generation layers, the thickness of the interfacial spin generation layer closest to the first ferromagnetic metal layer is smaller than the thickness of the other interfacial spin generation layers.
13. The spin current magnetization rotational element according to claim 1 ,
wherein a plurality of the spin conduction layers are constituted by materials different from each other in a state in which each of the interfacial spin generation layers is interposed between the plurality of spin conduction layers, and
a spin resistivity of a spin conduction layer close to the first ferromagnetic metal layer is smaller than a spin resistivity of a spin conduction layer distant from the first ferromagnetic metal layer.
14. The spin current magnetization rotational element according to claim 1 ,
wherein when viewed from the first direction, a cross-sectional area of the interfacial spin generation layer closest to the first ferromagnetic metal layer is smaller than a cross-sectional area of the other interfacial spin generation layers which are not closest to the first ferromagnetic metal layer.
15. The spin current magnetization rotational element according to claim 1 ,
wherein the thickness of the spin-orbit torque wiring is 20 nm or less.
16. A magnetoresistance effect element, comprising:
the spin current magnetization rotational element according to claim 1 ;
a second ferromagnetic metal layer in which a magnetization direction is fixed; and
a nonmagnetic layer that is interposed between the first ferromagnetic metal layer and the second ferromagnetic metal layer.
17. A magnetic memory, comprising:
a plurality of the magnetoresistance effect elements according to claim 16 .