Apparatus and method for monitoring reflectivity of the collector for extreme ultraviolet radiation source

1. A method of calculating reflectivity of a collector for an extreme ultraviolet (EUV) radiation source, the method comprising

obtaining data of a first sensor and a second sensor to compare time stamps of the first sensor and the second sensor;

determining whether a time difference between the time stamps of the first sensor and the second sensor is within an acceptable range;

in response to a determination that the time difference is within the acceptable range, automatically adjusting a configurable data such that first sensor data is valid for calculating the reflectivity; and

calculating the reflectivity of the collector using the configurable data.

2. The method of claim 1 , wherein obtaining time series data includes obtaining data from a slit integrated energy (SLIE) sensor.

3. The method of claim 2 , wherein obtaining time series data includes obtaining data from diffractive optical elements (DOE) data along with a source-mask optimization serial number.

4. The method of claim 2 , further comprising eliminating data points in the time series data for the SUE sensor for which an energy data is less than a threshold value and data points in the time series data for the SUE sensor for which a smallest difference in time stamps of data points in the time series data for the SLIP sensor and time stamps of data points in the time series data for the DOE is greater than a predetermined value.

5. The method of claim 1 , wherein the time difference is in a range of 2 minutes to 4 minutes.

6. A method of analyzing reflectivity of a collector for an extreme ultraviolet (EUV) radiation source, the method comprising:

obtaining a slit integrated energy (SUE) sensor data and diffractive optical elements (DOE) data and comparing time stamps;

determining whether a time difference of the SLIE sensor data and the DOE′: data is within an acceptable range;

in response to a determination that the time difference is within the acceptable range, automatically validating the SLIE sensor data for calculating the reflectivity; and

analyzing the reflectivity data of the collector based on the time difference of the SLIE sensor data and the DOE data.

7. The method according to claim 6 , wherein obtaining a slit integrated energy (SLIE) sensor data and diffractive optical elements (DOE) data includes identifying a unique serial number of the DOE data assigned for a corresponding source-mask optimization (SMO) configuration settings.

8. The method according to claim 6 , wherein performing a data match includes identifying a time stamp for the SLIE sensor data and a time stamp for the DOE data that are identical.

9. The method according to claim 6 , wherein performing a data match includes identifying a time stamp for the SLIE sensor data and a time stamp for the DOE data that are within an allowable time window.

10. The method according to claim 6 , wherein determining whether the time difference is within an acceptable range includes identifying whether the time difference is within a timing window.

11. The method according to claim 6 , wherein determining the time difference is within an acceptable range includes identifying whether the time difference is above a predetermined time threshold.

12. The method according to claim 6 , wherein the acceptable range is determined using an optimization methodology selected from the group consisting of a timing gap tolerance method, a moving average (rolling average) method, a data sampling rate method, a data magnification factor method, a data smoothing filter method, and types of sensor method.

13. The method according to claim 6 , wherein automatically validating the SLIE sensor data includes assigning the SUE sensor data with the closest DOE data in time.

14. The method according to claim 6 , further comprising generating, by a feedback system, a notification based on a new data match information indicating when the data match is within the acceptable data match range.

15. A system of analyzing a performance data of a collector for an extreme ultraviolet (EUV) radiation source, the system comprising:

a transmission image sensor (TIS) platform including a wafer stage on which a wafer is to be placed, an electrostatic chuck, and sensors;

a memory that stores computer executable components;

a processor that executes computer executable components stored in the memory, wherein the computer executable components comprise:

a data matching executable instruction module configured to obtain a slit integrated energy (SUE) sensor data and diffractive optical elements (DOE) data, and programmed to:

perform a data match, by the data matching executable instruction module, of a time difference of the SLIE sensor data and the DOE data to identify a mismatched set of the SLIE sensor data and the DOE data,

determine whether a time difference of the SLIE sensor data and the DOE data of the mismatched set is within an acceptable range, and

in response to the time difference of the SLIE sensor data and the DOE data that is not within the acceptable range of time difference of the data match, automatically validating a configurable data of the mismatched set such that the SUE sensor data of the mismatched set is valid for analysis of the performance data.

16. The system of claim 15 , wherein the data matching executable instruction module includes a timing window calculation module that is configured to receive a timing window from one or more software components and one or more hardware components.

17. The system of claim 16 , wherein the timing window calculation module is configured to receive a timing window from the sensors.

18. The system of claim 15 , wherein acceptable range includes the time difference that is within a timing window.

19. The system of claim 18 , wherein e timing window is in a range of about 2 minutes to about 4 minutes.

20. The system of claim 15 , wherein the acceptable range includes the time difference is above a predetermined time threshold.