IP Library Granted Patent US 11,061,071
Granted Patent B2
US 11,061,071 · App. 17/007,203 · Granted Jul 13, 2021

Wafer inspection system, wafer inspection apparatus and prober

Inventors: Junichi Hagihara (Nirasaki, JP); Shigekazu Komatsu (Nirasaki, JP); Kunihiro Furuya (Nirasaki, JP); Tadayoshi Hosaka (Nirasaki, JP); Naoki Muramatsu (Nirasaki, JP)
Assignee: TOKYO ELECTRON LIMITED
G01R31/2893G01R1/0491H01L21/67706H01L21/67724H01L21/67769H01L21/68742
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Quick Facts
Patent No.
US 11,061,071
App. No.
17/007,203
Granted
Jul 13, 2021
Kind
B2
Abstract

A wafer inspection system is provided. The wafer inspection system includes: a transfer region in which a transfer device is arranged; an inspection region in which test heads for inspecting a substrate are arranged; and a maintenance region in which the test heads are maintained. The inspection region is located between the transfer region and the maintenance region, a plurality of inspection rooms accommodating the test heads are adjacent to each other in the inspection region, and the test heads are configured to be unloaded from the inspection region to the maintenance region.

Claims (14)

1. A wafer inspection system comprising:

a transfer region in which a transfer device for transferring a wafer is arranged;

a maintenance region in which a test head is maintained;

a plurality of inspection rooms located between the transfer region and the maintenance region, and configured to receive and hold the test head within each of the plurality of inspection rooms, the test head being used when inspecting the wafer on which a semiconductor device is formed; and

a maintenance carriage to support the test head arranged in the maintenance region,

wherein the test head is unloaded onto the maintenance carriage from each of the plurality of inspection rooms.

2. The wafer inspection system of claim 1 ,

wherein the plurality of inspection rooms are arranged at multiple levels.

3. The wafer inspection system of claim 1 ,

wherein, in each of the plurality of inspection rooms, a first slide rail is provided to unload the test head onto the maintenance carriage from each of the plurality of inspection rooms.

4. The wafer inspection system of claim 3 ,

wherein the maintenance carriage has a second slide rail for supporting the test head unloaded onto the maintenance carriage from each of the plurality of inspection rooms.

5. The wafer inspection system of claim 4 ,

wherein the maintenance carriage has a lift device for positioning the second slide rail to a height directly facing the first slide rail.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 31, 2020
From: HAGIHARA, JUNICHI; KOMATSU, SHIGEKAZU; FURUYA, KUNIHIRO; HOSAKA, TADAYOSHI; MURAMATSU, NAOKI
To: TOKYO ELECTRON LIMITED
Reel/Frame 053641/0887 →
Priority Claims (1)
JP 2013-224460 · Oct 29, 2013 · national
Continuity (4)
Continuation 16671410 · Nov 1, 2019
Continuation 15582848 · May 1, 2017
Continuation 14525431 · Oct 28, 2014
Related Publication 20200400743A1 · Dec 24, 2020