Low-VOC cleaning substrates and compositions comprising a quat and solvent mixture
The present invention is directed to a cleaning composition for sanitizing or disinfecting hard surfaces containing a cationic biocide, surfactant and low levels of VOC solvents. The cleaning composition is adapted to clean a variety of hard surfaces without leaving behind a visible residue and creates low levels of streaking and filming on the treated surface. The cleaning composition contains less than 5% by weight of VOCs. The cleaning composition may be used alone as a liquid or spray formulation or in combination with a substrate, for example, a pre-loaded cleaning wipe.
1. A cleaning composition consisting of:
i. about 0.01-2% by weight of one or more quaternary ammonium compounds;
ii. about 0.001-1% by weight of a surfactant selected from the group consisting of: lauryl sulfate, lauryl ether sulfate, cocamidopropylbetaine, alkyl polyglycoside, and any combinations or mixtures thereof;
iii. about 0.1-2% by weight of a first solvent selected form the group consisting of: C1-10 alkyl ethers of alkylene glycols, C3-24 alkylene glycol ethers, and any mixtures or combinations thereof;
iv. about 0.1-2% by weight of a second solvent that is different from the first solvent, selected from the group consisting of: alcohols, diols, C1-10 alkyl ethers of alkylene glycols, short chain carboxylic acids, and any mixtures or combinations thereof;
iii. at least about 90% by weight of water; and
v. optionally, one or more buffers selected from the group consisting of: monoethanoleamine, diethanolamine, triethanolamine; tri(hydroxymethyl) amino methane, 2-amino-2-ethyl-1,3-propanediol, 2-amino-2-methyl-propanol, 2-amino-2-methyl-1,3-propanol, methyl diethanolamide, 2-dimethylamino-2-methylpropanol, 1,3-bis(methylamine)-cyclohexane, 1,3-diamino-propanol N,N′-tetra-methyl-1,3-diamino-2-propanol, N,N-bis(2-hydroxyethyl)glycine, tris(hydroxymethyl)methyl glycine, ammonium carbamate, citric acid, acetic acid, ammonia and any mixtures or combinations thereof;
vi. optionally, one or more adjuncts selected from the group consisting of: fragrances, perfumes, defoamers, enzymes, dyes, colorants and preservatives; and wherein when a 0.5 microliter drop of said composition deposited on a clean silicon surface, forms a circular residue where, within the central 80% of the droplet residue image, there is no position where a 200-micron diameter circle can be placed where it will contain no boundaries between dark and light portions of the image.
2. The cleaning composition as defined in claim 1 , wherein the composition includes one or more buffer comprising monoethanolamine.
3. The cleaning composition as defined in claim 1 , wherein the composition further comprises a fragrance.
4. The cleaning composition as defined in claim 1 , wherein said one or more quaternary ammonium compound comprises: n-alkyldimethylbenzylammonium chloride, n-alkyldimethylethylbenzylammonium chloride and combinations or mixtures thereof.
5. The cleaning composition as defined in claim 1 , wherein the non-ionic surfactant is an alkyl polyglycoside.
6. The cleaning composition as defined in claim 1 , wherein said first solvent includes a C1-10 alkyl ethers of alkylene glycols.
7. The cleaning composition as defined in claim 1 , wherein the first solvent includes a C1-10 alkyl ether of propylene glycol.
8. The cleaning composition as defined in claim 1 , wherein the second solvent is an alcohol.
9. A cleaning composition consisting of:
i. about 0.01-2% by weight of one or more quaternary ammonium compound;
ii. about 0.001-1% by weight of an alkyl polyglycoside surfactant;
iii. about 0.1-2% by weight of a first solvent selected form the group consisting of: C1-10 alkyl ethers of alkylene glycols, C3-24 alkylene glycol ethers, and any mixtures or combinations thereof;
iv. about 0.1-2% by weight of a second solvent that is different from the first solvent, selected from the group consisting of: alcohols, diols, C1-10 alkyl ethers of alkylene glycols, short chain carboxylic acids, and any mixtures or combinations thereof;
v. about 0.001-1% by weight of a buffer selected from the group consisting of: monoethanoleamine, diethanolamine, triethanolamine; tri(hydroxymethyl) amino methane, 2-amino-2-ethyl-1,3-propanediol, 2-amino-2-methyl-propanol, 2-amino-2-methyl-1,3-propanol, methyl diethanolamide, 2-dimethylamino-2-methylpropanol, 1,3-bis(methylamine)-cyclohexane, 1,3-diamino-propanol N,N′-tetra-methyl-1,3-diamino-2-propanol, N,N-bis(2-hydroxy ethyl)glycine, tris(hydroxymethyl)methyl glycine, ammonium carbamate, citric acid, acetic acid, ammonia and any mixtures or combinations thereof;
vi. at least about 90% by weight of water; and
vii. optionally, one or more adjuncts selected from the group consisting of: fragrances, perfumes, defoamers, dyes, colorants and preservatives; and wherein when a 0.5 microliter drop of said composition deposited on a clean silicon surface, forms a circular residue where, within the central 80% of the droplet residue image, there is no position where a 200-micron diameter circle can be placed where it will contain no boundaries between dark and light portions of the image.
10. The cleaning composition as defined in claim 9 , wherein the buffer is monoethanolamine.
11. The cleaning composition as defined in claim 9 , wherein the composition further comprises a fragrance.
12. The cleaning composition as defined in claim 9 , wherein said one or more quaternary ammonium compound comprises: n-alkyldimethylbenzylammonium chloride, n-alkyldimethylethylbenzylammonium chloride and combinations or mixtures thereof.
13. The cleaning composition as defined in claim 9 , wherein said second solvent is ethanol.
14. The cleaning composition as defined in claim 9 , wherein the first solvent includes a C1-10 alkyl ethers of alkylene glycols.
15. The cleaning composition as defined in claim 9 , wherein the second solvent is an alcohol.
16. A cleaning composition consisting of:
i. about 0.01-2% by weight of one or more quaternary ammonium compound,
ii. about 0.1-0.8% by weight of an alkyl polyglycoside surfactant;
iii. about 0.1-2% by weight of a first solvent selected from the group consisting of: C1-10 alkyl ethers of alkylene glycols, C3-24 alkylene glycol ethers, and any mixtures or combinations thereof,
iv. about 0.01-2% by weight of a second solvent selected from the group consisting of: alcohols;
v. one or more buffers selected from the group consisting of: monoethanoleamine, diethanolamine, triethanolamine; tri(hydroxymethyl) amino methane, 2-amino-2-ethyl-1,3-propanediol, 2-amino-2-methyl-propanol, 2-amino-2-methyl-1,3-propanol, methyl diethanolamide, 2-dimethylamino-2-methylpropanol, 1,3-bis(methyl amine)-cyclohexane, 1,3-di amino-propanol N,N′-tetra-methyl-1,3-diamino-2-propanol, N,N-bi s(2-hydroxyethyl)glycine, tris(hydroxymethyl)methyl glycine, ammonium carbamate, citric acid, acetic acid, ammonia and any mixtures or combinations thereof,
vi. one or more fragrances;
vii. at least 90% by weight of water; and
wherein when a 0.5 microliter drop of said composition deposited on a clean silicon surface, forms a circular residue where, within the central 80% of the droplet residue image, there is no position where a 200-micron diameter circle can be placed where it will contain no boundaries between dark and light portions of the image.
17. The cleaning composition as defined in claim 16 , wherein said buffer is monoethanolamine.
18. The cleaning composition as defined in claim 16 , said the first solvent includes a C1-10 alkyl ether of propylene glycol.
19. The cleaning composition as defined in claim 16 , wherein said one or more quaternary ammonium compound comprises: n-alkyldimethylbenzylammonium chloride, n-alkyldimethylethylbenzylammonium chloride and combinations or mixtures thereof.
20. The cleaning composition as defined in claim 16 , wherein said second solvent is ethanol.