Photosensitive element, resin composition for forming barrier layer, method for forming resist pattern, and method for manufacturing printed wiring board

1. A photosensitive element comprising:

a support film,

a barrier layer, and

a photosensitive layer in this order,

wherein the barrier layer contains a water-soluble resin, and an ultraviolet absorber,

wherein the ultraviolet absorber contains a compound represented by the following formula (1):

and wherein the content of the ultraviolet absorber in the barrier layer is from 0.01% to 4.0% by mass based on the total amount of the barrier layer.

2. The photosensitive element according to claim 1 , wherein the solubility of the ultraviolet absorber in water at 20° C. is 0.1 g/100 mL-H 2 O or more.

3. The photosensitive element according to claim 1 , wherein the ultraviolet absorptance of the barrier layer is from 5 to 95%.

4. The photosensitive element according to claim 1 , wherein the water-soluble resin contains polyvinyl alcohol.

5. The photosensitive element according to claim 1 , wherein the support film is a polyester film.

6. The photosensitive element according to claim 1 , wherein the thickness of the barrier layer is from 2 to 12 μm.

7. The photosensitive element according to claim 1 , wherein the photosensitive layer comprises a binder polymer, a photopolymerizable compound, and a photopolymerization initiator.

8. The photosensitive element according to claim 7 , wherein the content of the photopolymerization initiator in the photosensitive layer is 0.01 to 30 parts by mass relative to the total amount of 100 parts by mass of solid contents in the binder polymer and the photopolymerizable compound.

9. The photosensitive element according to claim 8 , wherein the photosensitive layer further comprises a polymerization inhibitor, and the content of the polymerization inhibitor is 0.001 to 0.3 parts by mass relative to 100 parts by mass of the solid content in the binder polymer.

10. The photosensitive element according to claim 7 , wherein the photosensitive layer further comprises a polymerization inhibitor, and the content of the polymerization inhibitor is 0.001 to 0.3 parts by mass relative to 100 parts by mass of the solid content in the binder polymer.

11. The photosensitive element according to claim 7 , wherein the photosensitive layer further does not contain a polymerization inhibitor.

12. A method for forming a resist pattern, comprising:

a step of disposing a photosensitive layer, a barrier layer, and a support film on a substrate in this order from the substrate side using the photosensitive element according to claim 1 ;

a step of removing the support film and exposing the photosensitive layer to active light beams through the barrier layer; and

a step of removing the uncured portions of the photosensitive layer and the barrier layer from the substrate.

13. A method for producing a printed wiring board, comprising:

a step of forming a conductive pattern by subjecting a substrate to etching or plating, the substrate having a resist pattern formed by the method for forming a resist pattern according to claim 12 .