System and method for detection of defects in semiconductor devices
An apparatus for detecting the presence of assembly related defects on a semiconductor device including an edge ring having a resistance value and including one or more layers configured to at least partially cover the semiconductor device in a first direction. The one or more layers are divided into a first section and a second section. Each layer of the one or more layers are in electrical communication with one another. The resistance value of the edge ring is at a first resistance value associated with the first and second sections being intact. At least one of the first section and second section is configured to break in response to an assembly related defect, and the resistance value of the edge ring is configured to change from the first resistance value to a second resistance value in response to at least one of the first and second sections being broken.
1. An apparatus for detecting the presence of defects on a semiconductor device, the apparatus comprising:
an edge ring having a resistance value, wherein a change in the resistance value indicates a defect on the semiconductor device, the edge ring comprising:
a first terminal layer defining a bottom layer of the edge ring and including a first terminal;
a second terminal layer defining a top layer of the edge ring and including a second terminal and a third terminal;
one or more conductive layers positioned between the first terminal layer and second terminal layer and configured to at least partially cover the semiconductor device in a first direction, the one or more conductive layers divided into a first section and a second section,
wherein there is a first electrical path defined by the first section electrically connected in series to the first terminal and the second terminal,
wherein there is a second electrical path defined by the second section electrically connected in series to the first terminal and the third terminal,
wherein the first electrical path and second electrical path are electrically connected in parallel,
wherein the resistance value of the edge ring has a first resistance value associated with the first and second sections being intact, at least one of the first section and second section configured to break in response to an assembly related defect, and
wherein, the resistance value of the edge ring is configured to change from the first resistance value to a second resistance value in response to at least one of the first and second sections being broken.
2. The apparatus of claim 1 , wherein the second resistance value is greater than the first resistance value.
3. The apparatus of claim 1 , wherein the second resistance value is about double the first resistance value.
4. The apparatus of claim 1 , wherein the resistance value of the edge ring is configured to change from the first resistance value to a third resistance value in response to the first and second sections being broken.
5. The apparatus of claim 4 , wherein the third resistance value is greater than the first resistance value.
6. The apparatus of claim 1 , wherein the semiconductor device is a 3D NAND.
7. The apparatus of claim 6 , wherein the 3D NAND is a CMOS bonded array.
8. The apparatus of claim 7 , wherein the CMOS bonded array includes a CMOS logic die bonded to a NAND die.
9. The apparatus of claim 1 , wherein the one or more conductive layers comprise one or more of polysilicon, tungsten, copper, and aluminum.
10. An apparatus for detecting the presence of assembly related defects on a semiconductor device, the apparatus comprising:
a first terminal means for providing an electrical connection to a power source, the first terminal means defining a bottom layer of the apparatus and including a first terminal;
a second terminal means for providing electrical connections to electrical measurement means for measuring an electrical resistance, the second terminal means defining a top layer of the apparatus and including a second and third terminal; and
a conductive enclosure means for at least partially covering the semiconductor device in at least one direction, the conductive enclosure means positioned between the first terminal means and the second terminal means and having a resistance value, the enclosure means including a first section and a second section at least one of which configured to break in response to an assembly related defect;
wherein there is a first electrical path defined by the first section electrically connected in series to the first terminal and the second terminal,
wherein there is a second electrical path defined by the second section electrically connected in series to the first terminal and the third terminal,
wherein the first electrical path and second electrical path are electrically connected in parallel,
wherein the resistance value of the enclosure means has a first resistance value associated with the first and second sections of the conductive enclosure means being intact, and
wherein, the resistance value of the enclosure means is configured to change from the first resistance value to a second resistance value in response to at least one of the first and second sections of the conductive enclosure means being broken.
11. The apparatus of claim 10 , wherein the second resistance value is greater than the first resistance value.
12. The apparatus of claim 10 , wherein the second resistance value is about double the first resistance value.
13. A method of detecting assembly related defects of a semiconductor device, the method comprising the steps of:
providing an edge ring having a resistance value, the edge ring comprising:
a first terminal layer defining a bottom layer of the edge ring and including a first terminal;
a second terminal layer defining a top layer of the edge ring and including a second terminal and a third terminal;
one or more conductive layers positioned between the first terminal layer and second terminal layer and configured to at least partially cover the semiconductor device in a first direction, the one or more conductive layers divided into a first section and a second section,
wherein there is a first electrical path defined by the first section electrically connected in series to the first terminal and the second terminal,
wherein there is a second electrical path defined by the second section electrically connected in series to the first terminal and the third terminal,
wherein the first electrical path and second electrical path are electrically connected in parallel,
wherein the resistance value of the edge ring has a first resistance value associated with the first and second sections being intact, at least one of the first section and second section configured to break in response to an assembly related defect, and
wherein, the resistance value of the edge ring is configured to change from the first resistance value to a second resistance value in response to at least one of the first and second sections being broken;
determining whether the resistance value of the edge ring has changed;
in response to determining that the resistance value of the edge ring has not changed:
determining that no assembly defect has occurred on the semiconductor device; and
in response to determining that the resistance value of the edge ring has changed:
determining that an assembly defect has occurred on the semiconductor device.
14. The method of claim 13 , wherein the semiconductor device includes a circuit configured to determine the measured resistance value.
15. The method of claim 13 , wherein the method further comprises:
providing an external pad and applying a voltage to the external pad for determining the resistance value, the external pad being external to the semiconductor device.