IP Library Granted Patent US 11,631,570
Granted Patent B2
US 11,631,570 · App. 17/209,071 · Granted Apr 18, 2023

Switching circuit

Inventors: Anton Mavretic (Natick, MA); Ian M. Costanzo (Worcester, MA); Ronald Anthony Decker (Turnersville, NJ)
H01J37/32082H01L21/02274H01L21/3065H01L21/31116H01L28/20H01L28/40H01L29/2003H01L29/7787H01L29/861H02M3/33569H03H7/38H03H7/40H03K17/687H04B1/44H01J2237/334H02M3/01H03F3/191H03K17/102H03K17/691H03K17/7955H03K2017/6875
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Quick Facts
Patent No.
US 11,631,570
App. No.
17/209,071
Granted
Apr 18, 2023
Kind
B2
Abstract

In one embodiment, an impedance matching network includes a variable reactance circuit providing a variable capacitance or inductance. The variable reactance circuit includes reactance components and corresponding switching circuits. Each of the switching circuits includes a diode and a driver circuit to switch the diode. The driver circuit includes first and second switches coupled in series. A first driver is coupled to the first switch, a second driver is coupled to the second switch, and a third driver is coupled to the first and second drivers. The third driver provides a first signal to the first driver, and a second signal to the second driver. In providing the signals, the third driver increases and decreases a duration of a dead time between (a) driving the first driver on and the second driver off, or (b) driving the second driver on and the first driver off.

Claims (96)

1. An impedance matching network comprising:

an RF input configured to couple to a radio frequency (RF) source;

an RF output configured to couple to a plasma chamber; and

a variable reactance circuit providing a variable capacitance or inductance, the variable reactance circuit comprising reactance components and corresponding switching circuits configured to provide the variable capacitance or inductance;

wherein each of the switching circuits comprises:

a diode; and

a driver circuit operably coupled to the diode and configured to switch the diode, the driver circuit comprising:

a first switch;

a second switch coupled in series with the first switch;

a first driver operably coupled to the first switch;

a second driver operably coupled to the second switch; and

a third driver operably coupled to the first and second drivers, the third driver configured to:

provide a first signal to the first driver; and

provide a second signal to the second driver;

wherein, in providing the first and second signals, the third driver is configured to increase and decrease a duration of a dead time between (a) the third driver driving the first driver on and the second driver off, or (b) the third driver driving the second driver on and the first driver off.

2. A method of matching an impedance, the method comprising:

operably coupling a matching network between an RF source and a plasma chamber, the matching network comprising:

a variable reactance circuit providing a variable capacitance or inductance, the variable reactance circuit comprising reactance components and corresponding switching circuits configured to provide the variable capacitance or inductance; and

wherein each of the switching circuits comprises:

a diode; and

a driver circuit operably coupled to the diode and configured to switch the diode, the driver circuit comprising:

a first switch;

a second switch coupled in series with the first switch;

a filter circuit that is coupled at a first end between the first switch and the second switch, and is operably coupled at a second end to the diode;

a first driver operably coupled to the first switch;

a second driver operably coupled to the second switch; and

a third driver operably coupled to the first and second drivers; and

for at least one of the switching circuits:

providing, by the third driver, a first signal to the first driver and a second signal to the second driver, wherein, in providing the first and second signals, the third driver is configured to increase and decrease a duration of a dead time between (a) the third driver driving the first driver on and the second driver off, or (b) the third driver driving the second driver on and the first driver off; and

providing the variable capacitance or inductance by either (a) switching on the first switch and switching off the second switch, or (b) switching off the first switch and switching on the second switch.

3. The method of claim 2 wherein the diode is a PIN diode and the first and second switches are metal-oxide semiconductor field-effect transistors (MOSFETs).

4. The method of claim 2 wherein a drain of the first switch is coupled to a source of the second switch.

5. The method of claim 2 wherein the variable reactance circuit is a variable capacitor and the reactance components are discrete capacitors, each of the discrete capacitors having a corresponding one of the switching circuits configured to switch the discrete capacitor on and off.

6. The method of claim 2 wherein, for each switching circuit, a first node between the first switch and the second switch is coupled to a second node between the reactance component and its corresponding diode.

7. The method of claim 6 wherein a filter circuit is positioned between the first node and the second node.

8. The method of claim 2 wherein the first, second, and third drivers form part of an integrated circuit.

9. The method of claim 2 wherein the first, second, and third drivers are discrete circuits.

10. The method of claim 2 wherein the duration of the dead time is adjustable by varying a resistance of a potentiometer coupled to the third driver.

11. The method of claim 2 wherein the duration of the dead time is based on the inductance of an inductor forming part of the filter circuit.

12. The method of claim 2 wherein the first and second signals substantially asynchronously drive the first and second drivers on and off.

13. A method of fabricating a semiconductor, the method comprising:

placing a substrate in a plasma chamber configured to deposit a material layer onto the substrate or etch a material layer from the substrate;

energizing plasma within the plasma chamber by coupling RF power from an RF source into the plasma chamber to perform a deposition or etching; and

while energizing the plasma, carrying out an impedance match by an impedance matching network coupled between a plasma chamber and an RF source, wherein the impedance matching network comprises:

a variable reactance circuit providing a variable capacitance or inductance, the variable reactance circuit comprising reactance components and corresponding switching circuits configured to provide the variable capacitance or inductance; and

wherein each of the switching circuits comprises:

a diode; and

a driver circuit operably coupled to the diode and configured to switch the diode, the driver circuit comprising:

a first switch;

a second switch coupled in series with the first switch;

a first driver operably coupled to the first switch;

a second driver operably coupled to the second switch; and

a third driver operably coupled to the first and second drivers;

wherein the carrying out of the impedance match comprises, for at least one of the switching circuits:

providing, by the third driver, a first signal to the first driver and a second signal to the second driver, wherein, in providing the first and second signals, the third driver is configured to increase and decrease a duration of a dead time between (a) the third driver driving the first driver on and the second driver off, or (b) the third driver driving the second driver on and the first driver off; and

providing the variable capacitance or inductance by either (a) switching on the first switch and switching off the second switch, or (b) switching off the first switch and switching on the second switch.

14. A switching circuit comprising:

a diode; and

a driver circuit operably coupled to the diode and configured to switch the diode, the driver circuit comprising:

a first switch;

a second switch coupled in series with the first switch;

a first driver operably coupled to the first switch;

a second driver operably coupled to the second switch; and

a third driver operably coupled to the first and second drivers, the third driver configured to:

provide a first signal to the first driver; and

provide a second signal to the second driver;

wherein, in providing the first and second signals, the third driver is configured to increase and decrease a duration of a dead time between (a) the third driver driving the first driver on and the second driver off, or (b) the third driver driving the second driver on and the first driver off.

15. A method of switching a diode comprising:

coupling a first switch and a second switch in series;

operably coupling the first and second switches to a diode;

operably coupling a first driver to the first switch;

operably coupling a second driver to the second switch; and

operably coupling a third driver to the first and second drivers;

providing, by the third driver, a first signal to the first driver and a second signal to the second driver, wherein, in providing the first and second signals, the third driver is configured to increase and decrease a duration of a dead time between (a) the third driver driving the first driver on and the second driver off, or (b) the third driver driving the second driver on and the first driver off; and

either (a) switching on the first switch and switching off the second switch, or (b) switching off the first switch and switching on the second switch.

16. The method of claim 15 wherein the first, second, and third drivers form part of an integrated circuit.

17. The method of claim 15 wherein the first, second, and third drivers are discrete circuits.

18. The method of claim 15 wherein the duration of the dead time is adjustable by varying a resistance of a potentiometer coupled to the third driver.

19. The method of claim 15 wherein the duration of the dead time is based on the inductance of an inductor forming part of the filter circuit.

20. A semiconductor processing tool comprising:

a plasma chamber configured to deposit a material onto a substrate or etch a material from the substrate; and

an impedance matching network operably coupled to the plasma chamber, the matching network comprising:

an RF input configured to couple to an RF source;

an RF output configured to couple to the plasma chamber; and

a variable reactance circuit providing a variable capacitance or inductance, the variable reactance circuit comprising reactance components and corresponding switching circuits configured to provide the variable capacitance or inductance; and

wherein each of the switching circuits comprises:

a diode; and

a driver circuit operably coupled to the diode and configured to switch the diode, the driver circuit comprising:

a first switch;

a second switch coupled in series with the first switch;

a first driver operably coupled to the first switch;

a second driver operably coupled to the second switch; and

a third driver operably coupled to the first and second drivers, the third driver configured to:

 provide a first signal to the first driver; and

 provide a second signal to the second driver;

 wherein, in providing the first and second signals, the third driver is configured to increase and decrease a duration of a dead time between (a) the third driver driving the first driver on and the second driver off, or (b) the third driver driving the second driver on and the first driver off.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 11, 2023
From: RENO SUB-SYSTEMS, INC.
To: ASM AMERICA, INC.
Reel/Frame 065217/0896 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 2, 2023
From: RENO TECHNOLOGIES, INC.
To: RENO SUB-SYSTEMS, INC.
Reel/Frame 065091/0846 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 22, 2021
From: MAVRETIC, ANTON; COSTANZO, IAN M.; DECKER, RONALD ANTHONY
To: RENO TECHNOLOGIES, INC.
Reel/Frame 055676/0592 →
Continuity (16)
Continuation 17022760 · Sep 16, 2020
Continuation 16410862 · May 13, 2019
Continuation In Part 16255269 · Jan 23, 2019
Continuation In Part 16211961 · Dec 6, 2018
Continuation In Part 15787374 · Oct 18, 2017
Continuation In Part 15667951 · Aug 3, 2017
Continuation 15384904 · Dec 20, 2016
Continuation In Part 15046585 · Feb 18, 2016
Continuation In Part 14734053 · Jun 9, 2015
Provisional Application 62670990 · May 14, 2018
Provisional Application 62620781 · Jan 23, 2018
Provisional Application 62595222 · Dec 6, 2017
Provisional Application 62409635 · Oct 18, 2016
Provisional Application 62117728 · Feb 18, 2015
Provisional Application 62118552 · Feb 20, 2015
Related Publication 20210210311A1 · Jul 8, 2021