IP Library Granted Patent US 12,087,724
Granted Patent B2
US 12,087,724 · App. 17/328,622 · Granted Sep 10, 2024

Palladium-coated copper bonding wire and method for manufacturing same

Inventors: Hiroyuki Amano (Saga, JP); Yuki Antoku (Saga, JP); Takeshi Kuwahara (Saga, JP)
Assignee: TANAKA DENSHI KOGYO K. K.
H01L24/45H01L24/43H01L24/05H01L24/48H01L24/85H01L2224/05624H01L2224/43825H01L2224/43826H01L2224/43827H01L2224/45005H01L2224/45101H01L2224/45117H01L2224/45147H01L2224/45565H01L2224/45572H01L2224/45601H01L2224/45617H01L2224/45644H01L2224/45664H01L2224/48175H01L2224/48463H01L2224/85045H01L2924/01016H01L2924/01034H01L2924/01052
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Quick Facts
Patent No.
US 12,087,724
App. No.
17/328,622
Granted
Sep 10, 2024
Kind
B2
Abstract

There is provided a palladium-coated copper bonding wire that does not cause a shrinkage cavity during first bonding, has high bonding reliability, and is capable of maintaining excellent bonding reliability for a long period of time even in high-temperature and high-humidity environments. A palladium-coated copper bonding wire in which a concentration of palladium is 1.0 mass % or more and 4.0 mass % or less relative to the total of copper, palladium, and a sulfur group element, a total concentration of the sulfur group element is 50 mass ppm or less, and a concentration of sulfur is 5 mass ppm or more and 12 mass ppm or less, a concentration of selenium is 5 mass ppm or more and 20 mass ppm or less, or a concentration of tellurium is 15 mass ppm or more and 50 mass ppm or less, and the palladium-coated copper bonding wire including a palladium-concentrated region with the average concentration of palladium of 6.5 atom % or more and 30.0 atom % or less relative to the total of copper and palladium within a range from a surface of a tip portion of a free air ball formed at a tip of the wire to 5.0 nm or more and 100.0 nm or less.

Claims (35)

1. A palladium-coated copper bonding wire containing 50 mass ppm or less of sulfur group element in total, the palladium-coated copper bonding wire comprising:

a core material containing copper as a main component; and

a palladium layer on the core material, wherein

the sulfur group element includes at least one of:

5 mass ppm or more and 12 mass ppm or less of sulfur (S);

5 mass ppm or more and 20 mass ppm or less of selenium (Se); and

15 mass ppm or more and 50 mass ppm or less of tellurium (Te),

a concentration of palladium is 1.0 mass % or more and 4.0 mass % or less relative to the total of copper, palladium, and the sulfur group element of the palladium-coated copper bonding wire, and

a palladium-concentrated region in a free air ball formed at a tip of the palladium-coated copper bonding wire that has an average concentration of palladium of 6.5 atom % or more and 30.0 atom % or less relative to the total of copper and palladium that is within a range from a surface of a tip portion of the free air ball to 5.0 nm or more and 100.0 nm or less.

2. The palladium-coated copper bonding wire according to claim 1 , wherein

a concentration of palladium derived from the palladium layer is 1.0 mass % or more and 2.5 mass % or less relative to the total of copper, palladium, and the sulfur group element of the palladium-coated copper bonding wire.

3. The palladium-coated copper bonding wire according to claim 1 , wherein a diameter of the palladium-coated copper bonding wire is 10 μm or more and 30 μm or less.

4. The palladium-coated copper bonding wire according to claim 1 , wherein free air ball forming conditions when detecting the palladium-concentrated region are that a discharge current value is 65 mA and a diameter of the ball is 1.8 times the diameter of the wire, in the presence of a mixed gas of nitrogen and hydrogen.

5. The palladium-coated copper bonding wire according to claim 1 , wherein

the concentration of palladium of the palladium-concentrated region is a concentration measured under Auger electron spectroscopy analysis conditions where an acceleration voltage of a primary electron beam is 10 kV, a measurement region calculated from a set value is 15 μm 2 or more and 20 μm 2 or less, an acceleration voltage of argon ion sputtering is 1 kV, and a sputtering rate is 2.5 nm/min (in terms of SiO 2 ) as setting conditions of a device.

6. The palladium-coated copper bonding wire according to claim 1 , wherein 50.0% or more of the sulfur group element is contained in the palladium layer.

7. The palladium-coated copper bonding wire according to claim 1 , wherein

50.0% or more of the sulfur group element is contained between a surface of the palladium-coated copper bonding wire and a place with 50.0 atom % of palladium relative to the total of palladium and copper.

8. The palladium-coated copper bonding wire according to claim 1 , further comprising:

a gold layer on a surface of the palladium layer.

9. The palladium-coated copper bonding wire according to claim 1 , wherein

a concentration of sulfur (S) in the entire palladium-coated copper bonding wire is 6 mass ppm or more and 10 mass ppm or less.

10. The palladium-coated copper bonding wire according to claim 1 , wherein

a concentration of selenium (Se) in the entire palladium-coated copper bonding wire is 6 mass ppm or more and 15 mass ppm or less.

11. The palladium-coated copper bonding wire according to claim 1 , wherein

a concentration of tellurium (Te) in the entire palladium-coated copper bonding wire is 16 mass ppm or more and 45 mass ppm or less.

12. A method of manufacturing a palladium-coated copper bonding wire containing 50 mass ppm or less of sulfur group element in total, the palladium-coated copper bonding wire including: a core material containing copper as a main component; and a palladium layer on the core material, wherein

the sulfur group element includes at least one of:

5 mass ppm or more and 12 mass ppm or less of sulfur (S);

5 mass ppm or more and 20 mass ppm or less of selenium (Se); and

15 mass ppm or more and 50 mass ppm or less of tellurium (Te),

a concentration of palladium is 1.0 mass % or more and 4.0 mass % or less relative to the total of copper, palladium, and the sulfur group element, and

the manufacturing method comprising:

preparing a copper wire rod containing copper as a main component and

forming a palladium layer containing the sulfur group element on a surface of the copper wire rod.

Assignments (2)
CHANGE OF NAME Recorded Apr 1, 2026
From: TANAKA DENSHI KOGYO K.K.
To: TANAKA ELECTRONICS CO., LTD.
Reel/Frame 075319/0511 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 24, 2021
From: AMANO, HIROYUKI; ANTOKU, YUKI; KUWAHARA, TAKESHI
To: TANAKA DENSHI KOGYO K.K.
Reel/Frame 056332/0551 →
Priority Claims (1)
JP 2018-220570 · Nov 26, 2018 · national
Continuity (2)
Continuation PCTJP2018044294 · Nov 30, 2018
Related Publication 20210280553A1 · Sep 9, 2021