IP Library Granted Patent US 12,069,810
Granted Patent B2
US 12,069,810 · App. 17/353,192 · Granted Aug 20, 2024

Solder paste stencil with aperture wall coating

Inventors: Fakhrozi Bin Che Ani (Parit Buntar, MY); Mohamad Riduwan Bin Ramli (Began Serai, MY); Mohamad Solehin Bin Mohamed Sunar (Nibong Tebal, MY); Ibrahym Bin Ahmad (Bukit Mertajam, MY)
Assignee: Sandisk Technologies, Inc.
H05K3/1225H05K3/1233H05K3/24H05K1/115H05K3/282H05K3/3485H05K2203/0726H05K2203/1366
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Quick Facts
Patent No.
US 12,069,810
App. No.
17/353,192
Granted
Aug 20, 2024
Kind
B2
Abstract

A solder paste stencil includes, in one embodiment, a substrate defining solder apertures, each aperture wall of each of the solder apertures is coated with a coating material that reduces wetting of a solder paste relative to the aperture walls.

Claims (44)

1. A surface mount technology (SMT) solder paste stencil, comprising:

a substrate defining a plurality of solder apertures, each aperture wall of each of the plurality of solder apertures is coated with a coating material that enhances a smoothness of the each aperture wall in a SMT process and reduces wetting of a solder paste relative to the each aperture wall,

wherein the coating material has a first water contact angle greater than a second water contact angle of the substrate without the coating material,

wherein the coating material is a silicone material,

wherein the first water contact angle is greater than thirty-nine degrees and less than one hundred and ten degrees, and

wherein second water contact angle is thirty-nine degrees or less.

2. The SMT solder paste stencil of claim 1 , wherein the substrate is a nickel material, and wherein the plurality of solder apertures are cut with electroforming.

3. The SMT solder paste stencil of claim 1 , wherein the coating material is deposited with one technique selected from a group consisting of:

physical vapor deposition (PVD),

a wipe method, and

a spray method.

4. The SMT solder paste stencil of claim 3 , wherein, when the coating material is deposited with the physical vapor deposition (PVD), the coating material meets a greater than two value of a solder paste printing process capability index (Cpk).

5. The SMT solder paste stencil of claim 3 , wherein the first water contact angle associated with the PVD is one hundred and nine degrees or less, wherein the first water contact angle associated with the spray method is eighty-nine degrees or less, and wherein the first water contact angle associated with the wipe method is forty-four degrees or less.

6. The SMT solder paste stencil of claim 1 , wherein a portion of the each aperture wall of the each of the plurality of solder apertures has a nano-coating of the coating material.

7. The SMT solder paste stencil of claim 6 , wherein the portion is all of the each aperture wall.

8. A method for manufacturing a surface mount technology (SMT) solder paste stencil, the method comprising:

cutting a substrate to define a plurality of solder apertures; and

depositing a coating material on each aperture wall of each of the plurality of solder apertures, the coating material enhances a smoothness of the each aperture wall in a SMT process and reduces wetting of a solder paste relative to the each aperture wall, wherein the coating material has a first water contact angle greater than a second water contact angle of the substrate without the coating material,

wherein the coating material is a silicone material,

wherein the first water contact angle is greater than thirty-nine degrees and less than one hundred and ten degrees, and

wherein the second water contact angle is thirty-nine degrees or less.

9. The method of claim 8 , wherein the substrate is a nickel material, and wherein the plurality of solder apertures are cut with electroforming.

10. The method of claim 8 , wherein depositing the coating material on the each aperture wall of the each of the plurality of solder apertures further includes depositing the coating material on the each aperture wall of the each of the plurality of solder apertures with one technique selected from a group consisting of:

physical vapor deposition (PVD),

a wipe method, and

a spray method.

11. The method of claim 10 , wherein, when the coating material is deposited with the physical vapor deposition (PVD), the coating material meets a greater than two value of a solder paste printing process capability index (Cpk).

12. The method of claim 10 , wherein the first water contact angle associated with the PVD is one hundred and nine degrees or less, wherein the first water contact angle associated with the spray method is eighty-nine degrees or less, and wherein the first water contact angle associated with the wipe method is forty-four degrees or less.

13. The method of claim 8 , wherein a portion of the each aperture wall of the each of the plurality of solder apertures has a nano-coating of the coating material.

14. The method of claim 13 , wherein the portion is all of the each aperture wall.

15. A method for performing surface-mount soldering, the method comprising:

applying solder material to a substrate defining a plurality of solder apertures, each aperture wall of each of the plurality of solder apertures is coated with a coating material that enhances a smoothness of the each aperture wall in a surface mount technology (SMT) process and reduces wetting of a solder paste relative to the each aperture wall, wherein the coating material has a first water contact angle greater than a second water contact angle of the substrate without the coating material; and

depositing, with the substrate, the solder material onto a printed circuit board,

wherein the coating material is a silicone material,

wherein the first water contact angle is greater than thirty-nine degrees and less than one hundred and ten degrees, and

wherein the second water contact angle is thirty-nine degrees or less.

16. The method of claim 15 , wherein the substrate is a nickel material, and wherein the plurality of solder apertures are cut with electroforming.

17. The method of claim 15 , wherein the coating material is deposited with one technique selected from a group consisting of:

physical vapor deposition (PVD),

a wipe method, and

a spray method.

18. The method of claim 17 , wherein the first water contact angle associated with the PVD is one hundred and nine degrees or less, wherein the first water contact angle associated with the spray method is eighty-nine degrees or less, and wherein the first water contact angle associated with the wipe method is forty-four degrees or less.

19. The method of claim 15 , wherein a portion of the each aperture wall of the each of the plurality of solder apertures has a nano-coating of the coating material.

20. The method of claim 19 , wherein the portion is all of the each aperture wall.

Assignments (10)
PARTIAL RELEASE OF SECURITY INTERESTS Recorded Apr 25, 2025
From: JPMORGAN CHASE BANK, N.A., AS AGENT
To: SANDISK TECHNOLOGIES, INC.
Reel/Frame 071382/0001 →
SECURITY AGREEMENT Recorded Apr 25, 2025
From: SANDISK TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 071050/0001 →
PATENT COLLATERAL AGREEMENT Recorded Aug 23, 2024
From: SANDISK TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A., AS THE AGENT
Reel/Frame 068762/0494 →
CHANGE OF NAME Recorded Jun 27, 2024
From: SANDISK TECHNOLOGIES, INC.
To: SANDISK TECHNOLOGIES, INC.
Reel/Frame 067982/0032 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 29, 2024
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: SANDISK TECHNOLOGIES, INC.
Reel/Frame 067567/0682 →
PATENT COLLATERAL AGREEMENT - A&R LOAN AGREEMENT Recorded Aug 21, 2023
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 064715/0001 →
PATENT COLLATERAL AGREEMENT - DDTL LOAN AGREEMENT Recorded Aug 21, 2023
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A.
Reel/Frame 067045/0156 →
RELEASE OF SECURITY INTEREST AT REEL 057651 FRAME 0296 Recorded Feb 8, 2022
From: JPMORGAN CHASE BANK, N.A.
To: WESTERN DIGITAL TECHNOLOGIES, INC.
Reel/Frame 058981/0958 →
SECURITY INTEREST Recorded Sep 17, 2021
From: WESTERN DIGITAL TECHNOLOGIES, INC.
To: JPMORGAN CHASE BANK, N.A., AS AGENT
Reel/Frame 057651/0296 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 21, 2021
From: BIN CHE ANI, FAKHROZI; BIN RAMLI, MOHAMAD RIDUWAN; BIN MOHAMED SUNAR, MOHAMAD SOLEHIN; BIN AHMAD, IBRAHYM
To: WESTERN DIGITAL TECHNOLOGIES, INC.
Reel/Frame 056606/0528 →