IP Library Granted Patent US 12,408,571
Granted Patent B2
US 12,408,571 · App. 17/358,293 · Granted Sep 2, 2025

Phase change memory with graded heater

Inventors: Timothy Mathew Philip (Albany, NY); Kevin W. Brew (Niskayuna, NY); Jin Ping Han (Yorktown Heights, NY)
Assignee: International Business Machines Corporation
H10N70/8613H10N70/021H10N70/841
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Quick Facts
Patent No.
US 12,408,571
App. No.
17/358,293
Granted
Sep 2, 2025
Kind
B2
Abstract

A heater, a system, and a method for linearly changing the resistance of the phase change memory through a graded heater. The system may include a phase change memory. The phase change memory may include a dielectric. The phase change memory may also include a heater patterned on the dielectric, the heater including: an outside conductive heating layer that has a higher resistance than other layers of the heater, and an inside conductive heating layer that has a lower resistance than the outside conductive heating layer, where the outside conductive heating layer is at an outside area of the heater and the inside conductive heating layer is at an inside area of the heater. The phase change memory may also include a phase change material proximately connected to the heater. The phase change memory may also include a top electrode proximately connected to the phase change material.

Claims (42)

1. A heater in a phase change memory, the heater comprising:

an outside conductive heating layer that has a higher electrical resistance than other layers of the heater;

a first middle conductive heating layer between the outside conductive heating layer and an inside conductive heating layer, the first middle conductive heating layer having a lower electrical resistance than the outside conductive heating layer and a higher electrical resistance than the inside conductive heating layer;

the inside conductive heating layer that has a lower electrical resistance than the outside conductive heating layer, wherein the outside conductive heating layer is at an outside area of the heater and the inside conductive heating layer is at an inside area of the heater; and

a second middle conductive heating layer between the first middle conductive heating layer and the inside conductive heating layer, the second middle conductive heating layer having a lower electrical resistance than the first middle conductive heating layer and a higher electrical resistance than the inside conductive heating layer.

2. The heater of claim 1 , wherein the outside conductive heating layer has a higher electrical resistivity and the inside conductive heating layer has a lower electrical resistivity, resulting in the higher electrical resistivity at the outside area of the heater and the lower electrical resistivity at the inside area of the heater.

3. The heater of claim 1 , wherein the outside conductive heating layer has a greater contact resistance and the inside conductive heating layer has a lesser contact resistance, resulting in the greater contact resistance at the outside area of the heater and the lesser contact resistance at the inside area of the heater.

4. The heater of claim 1 , wherein the outside conductive heating layer is a nitrogen-rich TaN layer, the first middle conductive heating layer is a tantalum-rich TaN layer, the second middle conductive heating layer is a nitrogen-rich TiN layer, and the inside conductive heating layer is a titanium layer.

5. The heater of claim 1 , wherein the outside conductive heating layer is a nitrogen-rich TiN outside layer and wherein any remaining layers, comprising at least the inside conductive heating layer, comprise TiN that gradually reduces nitrogen composition towards the inside conductive heating layer, resulting in a nitrogen-rich TiN outside conductive heating layer and a nitrogen-scarce inside conductive heating layer.

6. The heater of claim 1 , wherein the heater is a ring-shaped heater and wherein the outside conductive heating layer and the inside conductive heating layer are concentric conductive heating layers.

7. The heater of claim 1 , wherein the outside conductive heating layer and the inside conductive heating layer are continuous grading layers, resulting in continuous conductive heating layers.

8. A system comprising:

a phase change memory, the phase change memory comprising:

a dielectric;

a heater patterned on the dielectric, the heater comprising:

an outside conductive heating layer that has a higher electrical resistance than other layers of the heater;

a first middle conductive heating layer between the outside conductive heating layer and an inside conductive heating layer, the first middle conductive heating layer having a lower electrical resistance than the outside conductive heating layer and a higher electrical resistance than the inside conductive heating layer;

the inside conductive heating layer that has a lower electrical resistance than the outside conductive heating layer, wherein the outside conductive heating layer is at an outside area of the heater and the inside conductive heating layer is at an inside area of the heater; and

a second middle conductive heating layer between the first middle conductive heating layer and the inside conductive heating layer, the second middle conductive heating layer having a lower electrical resistance than the first middle conductive heating layer and a higher electrical resistance than the inside conductive heating layer;

a phase change material proximately connected to the heater; and

a top electrode proximately connected to the phase change material.

9. The system of claim 8 , wherein the outside conductive heating layer has a higher electrical resistivity and the inside conductive heating layer has a lower electrical resistivity, resulting in the higher electrical resistivity at the outside area of the heater and the lower electrical resistivity at the inside area of the heater.

10. The system of claim 8 , wherein the outside conductive heating layer has a greater contact resistance and the inside conductive heating layer has a lesser contact resistance, resulting in the greater contact resistance at the outside area of the heater and the lesser contact resistance at the inside area of the heater.

11. The system of claim 8 , wherein current transmitted through the heater forms a mushroom cell of amorphous phase change material.

12. The system of claim 11 , wherein the forming of the mushroom cell is linear.

13. A method of forming a phase change memory, the method comprising:

etching a heater via in a dielectric;

conformally depositing a metal, resulting in a first conductive heating layer;

repeating conformal deposition of lower resistance metals, wherein each deposition includes a lower resistance metal, resulting in a plurality of graded conductive heating layers graded from high resistance to low resistance, wherein the plurality of graded conductive heating layers includes the first conductive heating layer;

removing excess material from the plurality of graded conductive heating layers; and

depositing a phase change material and a top electrode.

14. The method of claim 13 , wherein removing the excess material from the plurality of graded conductive heating layers comprises:

individually removing the excess material from each conductive heating layer, of the plurality of graded conductive heating layers, following the depositing of the conductive heating layer.

15. The method of claim 14 , wherein the individually removing the excess material from each conductive heating layer comprises:

performing an etchback of metal from the conductive heating layer, resulting in portions of the conductive heating layer on each side portion of the heater via.

16. The method of claim 13 , wherein repeating the conformal deposition of lower resistance metals comprises:

individually depositing each conductive heating layer of the plurality of graded conductive heating layers.

17. The method of claim 13 , wherein repeating the conformal deposition of lower resistance metals comprises:

performing continuous grading of the conductive heating layers to fill the heater via.

18. The method of claim 13 , wherein a lowest resistance conductive heating layer is at an innermost portion of the heater via and wherein a highest resistance conductive heating layer is at an outermost portion of the heater via.

19. The method of claim 13 , further comprising:

encapsulating at least the phase change material and the top electrode in the dielectric.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 25, 2021
From: PHILIP, TIMOTHY MATHEW; BREW, KEVIN W.; HAN, JIN PING
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 056666/0960 →
Continuity (1)
Related Publication 20220416162A1 · Dec 29, 2022
References Cited (47)
US 6894305B2 · Yi et al. · 2005 [cited by applicant]
US 6927410B2 · Chen · 2005 [cited by applicant]
US 7348620B2 · Chiang et al. · 2008 [cited by applicant]
US 7485891B2 · Hamann et al. · 2009 [cited by applicant]
US 7679163B2 · Chen et al. · 2010 [cited by applicant]
US 7701749B2 · Jeong et al. · 2010 [cited by applicant]
US 7705424B2 · Lee et al. · 2010 [cited by applicant]
US 7778079B2 · Jeong et al. · 2010 [cited by applicant]
US 7932507B2 · Chen et al. · 2011 [cited by applicant]
US 8187946B2 · Karpov et al. · 2012 [cited by applicant]
US 8199567B2 · Chang-Wook et al. · 2012 [cited by applicant]
US 8471236B2 · Breitwisch et al. · 2013 [cited by applicant]
US 8648326B2 · Breitwisch et al. · 2014 [cited by applicant]
US 8921817B2 · Son · 2014 [cited by applicant]
US 9099637B2 · Song · 2015 [cited by applicant]
US 9166161B2 · BrightSky et al. · 2015 [cited by applicant]
US 9178138B2 · Tan et al. · 2015 [cited by applicant]
US 9190265B2 · Liu et al. · 2015 [cited by applicant]
US 9472274B1 · Lung · 2016 [cited by applicant]
US 9558823B1 · Khwa et al. · 2017 [cited by applicant]
US 10050194B1 · Nardi et al. · 2018 [cited by applicant]
US 10056546B2 · BrightSky et al. · 2018 [cited by applicant]
US 10141503B1 · BrightSky et al. · 2018 [cited by applicant]
US 10374010B2 · Wu · 2019 [cited by applicant]
US 10707417B1 · Bruce et al. · 2020 [cited by applicant]
US 10991879B2 · Ruiz et al. · 2021 [cited by applicant]
US 20070274121A1 · Lung et al. · 2007 [cited by applicant]
US 20080061282A1 · Sato et al. · 2008 [cited by applicant]
US 20080116437A1 · Oh et al. · 2008 [cited by applicant]
US 20180205017A1 · Bruce et al. · 2018 [cited by applicant]
US 20190123103A1 · Wu · 2019 [cited by examiner]
US 20210091307A1 · BrightSky et al. · 2021 [cited by applicant]
CN 101267016A · 2008 [cited by applicant]
EP 2891182B1 · 2018 [cited by applicant]
JP 5020045B2 · 2012 [cited by applicant]
KR 100849485B1 · 2008 [cited by applicant]
KR 1020170022423A · 2017 [cited by applicant]
TW I476770B · 2015 [cited by applicant]
Cheng et al., “Phase Change Memory With Conductive Rings,” U.S. Appl. No. 17/449,515, filed Sep. 30, 2021. [cited by applicant]
Updated List of IBM Patents or Patent Applications Treated as Related, Dated Apr. 29, 2022, 2 pages. [cited by applicant]
Kim et al., “A Phase Change Memory Cell with Metallic Surfactant Layer as a Resistance Drift Stabilizer,” IEEE, Printed Sep. 29, 2021, 4 pages. [cited by applicant]
Wong et al., “Phase Change Memory,” IEEE, Proceedings of the IEEE, vol. 98, No. 12, Dec. 2010, 27 pages. [cited by applicant]
Ryoo-etal, “Ring Contact Electrode Process for High Density Phase Change Random Access Memory” Japanese Journal of Applied Physics, vol. 46, No. 4B, 2007, pp. 2001-2005. [cited by applicant]
Tuma et al., “Stochastic phase-change neurons,” nature nanotechnology, Published Online: May 16, 2016 | DOI: 10.1038/NNANO.2016.70, 8 pages. [cited by applicant]
Chawla et al., “Effective electron mean free path in TiN(001),” Journal of Applied Physics 113, 2013, 7 pages. [cited by applicant]
List of IBM Patents or Patent Applications Treated as Related, Dated Jun. 22, 2021, 2 pages. [cited by applicant]
Cheng et al., “Phase Change Memory With Concentric Ring-Shaped Heater,” U.S. Appl. No. 17/358,223, filed Jun. 25, 2021. [cited by applicant]