IP Library Granted Patent US 11,835,438
Granted Patent B2
US 11,835,438 · App. 17/373,932 · Granted Dec 5, 2023

Automatic sample preparation apparatus

Inventors: Atsushi Uemoto (Tokyo, JP); Tatsuya Asahata (Tokyo, JP); Makoto Sato (Tokyo, JP); Yo Yamamoto (Tokyo, JP)
Assignee: Hitachi High-Tech Science Corporation
G01N1/44G01N1/28H01J37/31H01J37/317
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Quick Facts
Patent No.
US 11,835,438
App. No.
17/373,932
Granted
Dec 5, 2023
Kind
B2
Abstract

An automatic sample preparation apparatus that automatically prepares a sample piece from a sample and includes a focused ion beam irradiation optical system, an electron beam irradiation optical system configured to irradiate an electron beam from a direction different from a direction of the focused ion beam, a sample piece transfer device configured to hold and transfer the sample piece separated and extracted from the sample, a detector configured to detect secondary charged particles emitted from an irradiation object, and a computer configured to recognize a position of the sample piece transfer device by image-recognition using an image data of the focused ion beam and the electron beam generated by irradiating the sample piece transfer device with the focused ion beam and the electron beam, and drive the sample piece transfer device, wherein the image data includes a reference mark.

Claims (24)

1. An automatic sample preparation apparatus which automatically prepares a sample piece from a sample, comprising:

a focused ion beam irradiation optical system configured to irradiate a focused ion beam;

an electron beam irradiation optical system configured to irradiate an electron beam from a direction different from a direction of the focused ion beam;

a detector configured to detect secondary charged particles emitted from an irradiation object by irradiating the irradiation object with the focused ion beam or/and the electron beam;

a sample stage configured to move with the sample placed thereon;

a sample piece transfer device configured to hold and transfer the sample piece separated and extracted from the sample;

a sample piece holder-fixing bed configured to hold a sample piece holder to which the sample piece is transferred;

a gas supply portion configured to irradiate a gas forming a deposition film with the focused ion beam; and

a computer configured to

set a processing frame to which the focused ion beam is irradiated so as to include a part of an edge of the sample piece holder,

irradiate the gas by the gas supply portion, and

irradiate the focused ion beam to a region where the processing frame is set by the focused ion beam irradiation optical system so as to connect the sample piece and the sample piece holder by the deposition film.

2. The automatic sample preparation apparatus according to claim 1 ,

wherein the computer is configured to

recognize a position of the sample piece transfer device by image-recognition using an image data of the focused ion beam and the electron beam generated by irradiating the sample piece transfer device with the focused ion beam and the electron beam, and

drive the sample piece transfer device.

3. An automatic sample preparation apparatus which automatically prepares a sample piece from a sample, comprising:

a focused ion beam irradiation optical system configured to irradiate a focused ion beam;

an electron beam irradiation optical system configured to irradiate an electron beam from a direction different from a direction of the focused ion beam;

a sample piece transfer device configured to hold and transfer the sample piece separated and extracted from the sample;

a detector configured to detect secondary charged particles emitted from an irradiation object by irradiating the irradiation object with the focused ion beam or/and the electron beam;

a sample piece holder-fixing bed configured to hold a sample piece holder to which the sample piece is transferred; and

a computer configured to recognize a position of the sample piece transfer device by image-recognition using an image data of the focused ion beam and the electron beam generated by irradiating the sample piece transfer device with the focused ion beam and the electron beam, and drive the sample piece transfer device,

wherein the computer is configured to drive the sample piece transfer device so that a side surface of a pillar of the sample piece holder and a cross section of the sample piece are the same surface with each other.

Assignments (3)
CHANGE OF ADDRESS Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072903/0593 →
CHANGE OF NAME Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072913/0104 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 13, 2021
From: UEMOTO, ATSUSHI; ASAHATA, TATSUYA; SATO, MAKOTO; YAMAMOTO, YO
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 056836/0978 →
Priority Claims (1)
JP 2014-134977 · Jun 30, 2014 · national
Continuity (5)
Continuation 16935575 · Jul 22, 2020
Continuation 16877621 · May 19, 2020
Continuation 16139545 · Sep 24, 2018
Continuation 15317030
Related Publication 20210341362A1 · Nov 4, 2021