Granted Patent B2

US 12,269,229 · App. 17/433,774 · Granted Apr 8, 2025

Inventors: Sander Bas Roobol (Veldhoven, NL); Sietse Thijmen Van Der Post (Utrecht, NL)

Assignee: ASML NETHERLANDS B.V.

B29D11/0074G03F7/0005G03F7/7085

Abstract

Claims (28)

1. A method of manufacturing a reflector, the method comprising:

polishing at least an uppermost surface of an uppermost substantially flat substrate of a plurality of substantially flat substrates, wherein bottom surfaces of the plurality of substantially flat substrates are flat;

deforming each of the plurality of substantially flat substrates into a desired shape of deformed substrates; and

bonding the deformed substrates together to form the reflector,

wherein the uppermost surface of the uppermost substantially flat substrate is polished to a higher value than other bonding surfaces.

2. The method of claim 1 , wherein the deforming and bonding are performed together using a mold.

3. The method of claim 2 , wherein the deforming and bonding comprise repetitions of, for each substrate:

individually deforming each substrate in the mold; and

bonding each substrate to a preceding substrate to form a stack defining the reflector,

wherein the method further comprises forming the mold with a pre-correction for additional deformation of the bonded substrates due to their release from the mold.

4. The method of claim 1 , wherein the bonding of the plurality of substantially flat substrates comprises a fusion bonding method performed without adhesive.

5. The method of claim 4 , further comprising polishing all bonding surfaces of the substantially flat substrates to facilitate the fusion bonding method.

6. The method of claim 5 , wherein:

the other bonding surfaces are polished using a chemical mechanical polishing method.

7. The method of claim 1 , wherein the method achieves at least one of: a surface roughness less than 0.1 nm RMS, a slope error below 1 μrad RMS, and figure errors below 1 nm peak-to-valley.

8. The method of claim 1 , wherein the polishing of at least the uppermost surface of the uppermost substrate is performed using a Magnetorheological Finishing, Ion Beam Figuring or Elastic Emission Machining process.

9. The method of claim 1 , further comprising thinning the substrates prior to the bonding step.

10. A method of manufacturing a reflector, the method comprising:

polishing at least an uppermost surface of an uppermost substantially flat substrate of a plurality of substantially flat substrates, wherein bottom surfaces of the plurality of substantially flat substrates are flat;

deforming each of the plurality of substantially flat substrates into a desired shape of deformed substrates;

bonding the deformed substrates together to form the reflector; and

prior to the deforming step, patterning a variable line space grating for a flat field spectrometer on the uppermost surface of the uppermost substantially flat substrate.

11. The method of claim 1 , further comprising embedding at least one actuator in one or more of the substantially flat substrates, the actuator being operable to deform the reflector, and

wherein the at least one actuator comprises a thermal actuator embedded within a bonded substrate.

12. The method of claim 1 , further comprising embedding an image sensor within the reflector, and

wherein the image sensor is operable to detect a footprint of a beam incident thereon.

13. A reflector for a metrology apparatus manufactured according to the method of claim 1 .

14. A metrology apparatus comprising an illumination sub-system comprising at least one reflector manufactured according to the method of claim 13 .

Assignments (1)

Priority Claims (1)

Continuity (1)

References Cited (65)