In-lens wafer PE-charging and inspection with multiple beams
A charged particle system may include a first charged particle beam source provided on a first axis, and a second charged particle beam source provided on a second axis. There may also be provided a deflector arranged on the first axis. The deflector may be configured to deflect a beam generated from the second charged particle beam source toward a sample. A method of operating a charged particle beam system may include switching between a first state and a second state of operating a deflector. In the first state, a first charged particle beam generated from a first charged particle beam source may be blanked and a second charged particle beam generated from a second charged particle beam source may be directed toward a sample. In the second state, the second charged particle beam may be blanked and the first charged particle beam may be directed toward the sample.
1. A charged particle beam system comprising:
a first charged particle beam source configured to provide first charged particles to image a sample at a first time;
a second charged particle beam source configured to provide second charged particles to precondition the sample at a second time; and
a component positioned within an objective lens, the component configured to generate an electrostatic or magnetic field to influence the first charged particles to impact the sample at the first time and to influence the second charged particles to impact the sample at the second time,
wherein the charged particle beam system is configured to switch between a first state and a second state and in both the first state and the second state, operating conditions of a condenser lens of the first charged particle beam source and the objective lens of the charged particle beam system are maintained.
2. The charged particle beam system of claim 1 , wherein the component is a magnetic lens.
3. The charged particle beam system of claim 1 , wherein the component is a deflector.
4. The charged particle beam system of claim 1 , wherein the component is an electrostatic lens.
5. The charged particle beam system of claim 1 , wherein the component is a Wien filter.
6. The charged particle beam system of claim 1 , wherein the component being configured to generate the electrostatic or the magnetic field includes a deflector being configured to generate the electrostatic and the magnetic field.
7. The charged particle beam system of claim 1 , wherein only one objective lens is provided in the charged particle beam system.
8. The charged particle beam system of claim 1 , further comprising a driver configured to supply an adjustable voltage to the component.
9. The charged particle beam system of claim 1 , wherein in the second state, the first charged particles are directed towards the sample, and in the first state, the second charged particles are directed towards the sample.
10. The charged particle beam system of claim 1 , wherein the component is configured to switch between the first state and the second state.
11. The charged particle beam system of claim 10 , further comprising a controller configured to switch the component between the first state and the second state.
12. The charged particle beam system of claim 1 , wherein an angle between a first axis on which the first charged particle beam source is provided and a second axis on which the second charged particle beam source is provided is less than 30 degrees.
13. The charged particle beam system of claim 12 , wherein the angle is 10 to 20 degrees.
14. The charged particle beam system of claim 1 , further comprising an electrostatic lens provided in the second charged particle beam source configured to focus a beam generated therefrom.
15. The charged particle beam system of claim 1 , wherein the first charged particle beam source is configured to generate a plurality of primary charged particle beamlets.
16. The charged particle beam system of claim 1 , wherein when in the second state, a first plurality of charged particle beamlets is directed toward the sample.