Workpiece processing apparatus with gas showerhead assembly
A processing apparatus for a thermal treatment of a workpiece is presented. The processing apparatus includes a processing chamber, a workpiece support disposed within the processing chamber, a gas delivery system, and radiative heat sources for heating the workpiece. The gas delivery system includes a gas showerhead assembly that is transparent to electromagnetic radiation emitted from the one or more radiative heat sources. The gas showerhead assembly includes one or more gas diffusion mechanisms to distribute gas within the enclosure.
1. A processing apparatus for processing a workpiece, the workpiece having a top side and a back side opposite from the top side, the processing apparatus comprising:
a processing chamber, having a first side and a second side opposite from the first side of the processing chamber;
a workpiece support disposed within the processing chamber, the workpiece support configured to support the workpiece, wherein the back side of the workpiece faces the workpiece support;
a gas delivery system configured to flow one or more process gases into the processing chamber from the first side of the processing chamber through a gas showerhead assembly, the gas showerhead assembly comprising an enclosure having a top cover and a plurality of gas injection apertures, wherein the gas delivery system comprises a first radial gas distribution channel and a first radial gas injection barrier, wherein gas flowing radially around the first radial gas distribution channel can diffuse or flow through one or more gas diffusion apertures disposed in the first radial gas injection barrier, the gas diffusion apertures configured to facilitate horizontal flow of the one or more process gases; and
one or more radiative heat sources configured to heat the workpiece;
wherein the gas showerhead assembly is transparent to electromagnetic radiation emitted from the one or more radiative heat sources;
wherein the gas showerhead assembly comprises a gas distribution plate, the gas distribution plate including a plurality of gas diffusion barriers disposed generally perpendicular to a horizontal axis of the gas distribution plate such that each of the plurality of gas diffusion barriers extends from the gas distribution plate to a region between the gas distribution plate and the top cover of the enclosure such that gaps are between each of the gas diffusion barriers and the top cover of the enclosure; and
wherein the gas showerhead assembly further comprises a gas injection port located radially outward of the first radial gas distribution channel, wherein the gas injection port is configured to provide the one or more process gases into the enclosure.
2. The processing apparatus of claim 1 , wherein the gas delivery system further comprises a second radial gas injection barrier, wherein the first radial gas injection barrier is disposed radially inward of the first radial gas distribution channel, wherein the second radial gas injection barrier is disposed radially inward from the first radial gas injection barrier.
3. The processing apparatus of claim 2 , wherein the second radial gas injection barrier comprises at least three times more gas diffusion apertures as compared to the first radial gas injection barrier, wherein the gas diffusion apertures of the second radial gas injection barrier are configured to facilitate horizontal flow of the one or more process gases.
4. The processing apparatus of claim 1 , wherein the one or more gas injection barriers are disposed radially inward of the plurality of gas injection apertures.
5. The processing apparatus of claim 1 , wherein the one or more gas distribution plates are disposed such that the plurality of gas injection apertures are in vertical alignment.
6. The processing apparatus of claim 1 , wherein the one or more gas distribution plates comprise quartz.
7. The processing apparatus of claim 1 , wherein the one or more gas distribution plates comprises a first gas distribution plate and a second gas distribution plate disposed in a stacked arrangement, forming the enclosure therebetween.
8. The processing apparatus of claim 7 , wherein the one or more gas distribution plates comprise a third gas distribution plate, the third gas distribution plate disposed between the first gas distribution plate and the second gas distribution plate.
9. The processing apparatus of claim 1 , wherein the enclosure has an enclosure diameter that is larger than a workpiece diameter.
10. The processing apparatus of claim 1 , wherein the gas showerhead assembly comprises quartz.
11. The processing apparatus of claim 1 , wherein the one or more radiative heat sources are disposed on the first side of the processing chamber, the one or more radiative heat sources configured to heat the workpiece from the top side of the workpiece.
12. The processing apparatus of claim 11 , wherein the gas showerhead assembly is disposed between the one or more radiative heat sources disposed on the first side of the processing chamber and the top side of the workpiece.
13. The processing apparatus of claim 1 , wherein the one or more radiative heat sources are disposed on the second side of the processing chamber, the one or more radiative heat sources configured to heat the workpiece from the back side of the workpiece.
14. The processing apparatus of claim 1 , comprising a rotation system configured to rotate the workpiece support.