Measurement apparatus, lithography apparatus and article manufacturing method
The present invention provides a measurement apparatus for measuring a position of a first pattern and a position of a second pattern provided in a target object, the apparatus including an image capturing unit including a plurality of pixels which detect light from the first pattern and light from the second pattern, and configured to form an image capturing region used to capture the first pattern and the second pattern by the plurality of pixels, and a control unit configured to adjust the image capturing unit such that a relative ratio of an intensity of a detection signal of the first pattern generated based on an output from a first image capturing region and an intensity of a detection signal of the second pattern generated based on an output from a second image capturing region falls within an allowable range.
1. A measurement apparatus for measuring a position of a first pattern and a position of a second pattern provided in a target object, the apparatus comprising:
an image capturing unit including a plurality of pixels which detect light from the first pattern and light from the second pattern, and configured to form an image capturing region used to capture the first pattern and the second pattern by the plurality of pixels; and
a control unit configured to control the image capturing unit to obtain the position of the first pattern and the position of the second pattern based on an output from the image capturing unit,
wherein the control unit
sets, based on the position of the first pattern and the position of the second pattern, a first image capturing region used to capture the first pattern and a second image capturing region used to capture the second pattern in the image capturing region, and
adjusts the image capturing unit such that a relative ratio of an intensity of a detection signal of the first pattern generated based on an output from the first image capturing region and an intensity of a detection signal of the second pattern generated based on an output from the second image capturing region falls within an allowable range.
2. The apparatus according to claim 1 , wherein
as adjustment of the image capturing unit, the control unit sets a sensitivity of each of the plurality of pixels.
3. The apparatus according to claim 1 , wherein
the control unit individually sets a sensitivity of the pixel included in the first image capturing region and a sensitivity of the pixel included in the second image capturing region such that the relative ratio falls within the allowable range.
4. The apparatus according to claim 1 , wherein
the control unit individually sets a sensitivity of the pixel included in the first image capturing region and a sensitivity of the pixel included in the second image capturing region such that each of the intensity of the detection signal of the first pattern and the intensity of the detection signal of the second pattern is lower than a saturation level of the image capturing unit.
5. The apparatus according to claim 2 , wherein
the control unit sets the sensitivity of each of the plurality of pixels by adjusting a digital gain of each of the plurality of pixels.
6. The apparatus according to claim 2 , wherein
the control unit sets one of the sensitivity of the pixel included in the first image capturing region and the sensitivity of the pixel included in the second image capturing region to 1.
7. The apparatus according to claim 1 , wherein
the control unit sets the first image capturing region and the second image capturing region in different regions in the image capturing region.
8. The apparatus according to claim 1 , wherein
the control unit
sequentially performs first measurement processing of measuring the position of the first pattern and the position of the second pattern with first resolution in a first measurement range, and second measurement processing of measuring the position of the first pattern and the position of the second pattern with second resolution higher than the first resolution in a second measurement range smaller than the first measurement range,
based on the position of the first pattern and the position of the second pattern obtained in the first measurement processing, sets the first image capturing region and the second image capturing region in the image capturing region, and adjusts the image capturing unit such that the relative ratio falls within the allowable range, and
after adjusting the image capturing unit, obtains the position of the first pattern and the position of the second pattern based on an output from the image capturing unit obtained in the second measurement processing.
9. The apparatus according to claim 1 , wherein
the first pattern and the second pattern are provided in different layers on the target object, and
the control unit obtains a relative position between the first pattern and the second pattern from the position of the first pattern and the position of the second pattern.
10. The apparatus according to claim 1 , wherein
the first pattern and the second pattern are provided in different layers on the target object, and
the control unit obtains, from the position of the first pattern and the position of the second pattern, a position of a pattern formed by the first pattern and the second pattern.
11. A measurement apparatus for measuring a position of a mark provided in a target object, the apparatus comprising:
an image capturing unit including a plurality of pixels which detect light from the mark and light from a peripheral region around the mark of the target object, and configured to form an image capturing region used to capture the mark by the plurality of pixels; and
a control unit configured to control the image capturing unit to obtain the position of the mark based on an output from the image capturing unit,
wherein the control unit
sets, based on the position of the mark, a first image capturing region corresponding to the peripheral region and a second image capturing region used to capture the mark in the image capturing region, and
adjusts the image capturing unit such that a relative ratio of an intensity of a detection signal of the mark generated based on an output from the second image capturing region and an intensity of a signal generated based on an output from the first image capturing region falls within an allowable range.
12. The apparatus according to claim 11 , wherein
a device pattern is provided in the peripheral region.
13. A lithography apparatus that forms a pattern on a substrate, comprising:
a measurement apparatus defined in claim 11 configured to measure a position of a mark provided in the substrate serving as a target object; and
a stage configured to position the substrate based on the position of the mark measured by the measurement apparatus.
14. The apparatus according to claim 13 , further comprising a projection optical system configured to project a pattern of a reticle onto the substrate.
15. An article manufacturing method, comprising:
forming a pattern on a substrate with use of the lithography apparatus according to claim 13 ;
processing the substrate on which the pattern has been formed in the forming; and
manufacturing an article from the processed substrate.