Measurement apparatus, lithography apparatus and article manufacturing method
The present invention provides a measurement apparatus for measuring a position of a first pattern and a position of a second pattern provided in a target object, the apparatus including an image capturing unit including a plurality of pixels which detect light from the first pattern and light from the second pattern, and configured to form an image capturing region used to capture the first pattern and the second pattern by the plurality of pixels, and a control unit configured to adjust the image capturing unit such that a relative ratio of an intensity of a detection signal of the first pattern generated based on an output from a first image capturing region and an intensity of a detection signal of the second pattern generated based on an output from a second image capturing region falls within an allowable range.
1 . A measurement method of capturing a first pattern and a second pattern provided in a target object by an image sensor including a first image capturing region for capturing the first pattern and a second image capturing region for capturing the second pattern, the method comprising:
sequentially performing first measurement processing of measuring a position of the first pattern and a position of the second pattern, and second measurement processing of measuring the position of the first pattern and the position of the second pattern;
causing a sensitivity of the first image capturing region and a sensitivity of the second image capturing region to be different from each other based on the position of the first pattern obtained in the first measurement processing and the position of the second pattern obtained in the second measurement processing;
causing the image sensor to capture an image including the first pattern and the second pattern; and
obtaining the position of the first pattern and the position of the second pattern based on the image captured by the image sensor during the second measurement processing.
2 . The method according to claim 1 , wherein:
the first image capturing region and the second image capturing region each include a plurality of pixels, and
the causing the sensitivities to be different from each other sets a sensitivity of each of the plurality of pixels included in the first image capturing region and the second image capturing region.
3 . The method according to claim 1 , wherein:
the first image capturing region and the second image capturing region each include a pixel, and
the causing the sensitivities to be different from each other individually sets a sensitivity of the pixel included in the first image capturing region and a sensitivity of the pixel included in the second image capturing region.
4 . The method according to claim 1 , wherein the causing the sensitivities to be different from each other sets each of an intensity of a detection signal of the first pattern and an intensity of a detection signal of the second pattern to be lower than a saturation level of the image sensor.
5 . The method according to claim 1 , wherein:
the first image capturing region and the second image capturing region each include a plurality of pixels, and
the causing the sensitivities to be different from each other adjusts a digital gain of each of the plurality of pixels included in the first image capturing region and the second image capturing region.
6 . The method according to claim 1 , wherein the causing the sensitivities to be different from each other sets a relative ratio of an intensity of a detection signal of the first pattern generated based on an output from the first image capturing region and an intensity of a detection signal of the second pattern generated based on an output from the second image capturing region to fall within an allowable range.
7 . The method according to claim 1 , wherein:
the first pattern and the second pattern are provided in different layers on the target object, and
the obtaining obtains a position of a pattern formed by the first pattern and the second pattern from the position of the first pattern and the position of the second pattern.
8 . The method according to claim 1 , wherein:
the first measurement processing measures the position of the first pattern and the position of the second pattern with a first resolution in a first measurement range, and
the second measurement processing measures the position of the first pattern and the position of the second pattern with a second resolution higher than the first resolution in a second measurement range smaller than the first measurement range.
9 . A measurement method of capturing a first pattern and a second pattern provided in a target object by an image sensor, including a first image capturing region for capturing the first pattern and a second image capturing region for capturing the second pattern, and measuring a position of the first pattern and a position of the second pattern, the method comprising:
causing a sensitivity of the first image capturing region and a sensitivity of the second image capturing region to be different from each other;
causing the image sensor to capture an image including the first pattern and the second pattern; and
obtaining the position of the first pattern and the position of the second pattern based on the captured image,
wherein the causing the sensitivities to be different from each other sets one of the sensitivity of the first image capturing region or the sensitivity of the second image capturing region to 1.
10 . A measurement method of capturing a first pattern and a second pattern provided in different layers on a target object by an image sensor, including a first image capturing region for capturing the first pattern and a second image capturing region for capturing the second pattern, and measuring a position of the first pattern and a position of the second pattern, the method comprising:
causing a sensitivity of the first image capturing region and a sensitivity of the second image capturing region to be different from each other;
causing the image sensor to capture an image including the first pattern and the second pattern;
obtaining the position of the first pattern and the position of the second pattern based on the captured image; and
obtaining a relative position between the first pattern and the second pattern from the position of the first pattern and the position of the second pattern.
11 . A measurement apparatus for measuring a position of a first pattern and a position of a second pattern provided in a target object, the apparatus comprising:
an image sensor configured to capture the first pattern and the second pattern, the image sensor including:
a first image capturing region for capturing the first pattern; and
a second image capturing region for capturing the second pattern; and
a control unit, including a processor, configured to:
sequentially perform first measurement processing of measuring a position of the first pattern and a position of the second pattern, and second measurement processing of measuring the position of the first pattern and the position of the second pattern;
cause a sensitivity of the first image capturing region and a sensitivity of the second image capturing region to be different each other based on the position of the first pattern obtained in the first measurement processing and the position of the second pattern obtained in the second measurement processing;
cause the image sensor to capture an image including the first pattern and the second pattern; and
obtain the position of the first pattern and the position of the second pattern based on the image captured by the image sensor during the second measurement processing.
12 . The apparatus according to claim 11 , wherein:
the first image capturing region and the second image capturing region each include a plurality of pixels, and
the control unit causes the sensitivity of the first image capturing region and the sensitivity of the second image capturing region to be different each other by setting a sensitivity of each of the plurality of pixels included in the first image capturing region and the second image capturing region.
13 . The apparatus according to claim 11 , wherein:
the first image capturing region and the second image capturing region each include a pixel, and
the control unit causes the sensitivity of the first image capturing region and the sensitivity of the second image capturing region to be different each other by individually setting a sensitivity of the pixel included in the first image capturing region and a sensitivity of the pixel included in the second image capturing region.
14 . The apparatus according to claim 11 , wherein the control unit causes the sensitivity of the first image capturing region and the sensitivity of the second image capturing region to be different each other by setting each of an intensity of a detection signal of the first pattern and an intensity of a detection signal of the second pattern to be lower than a saturation level of the image sensor.
15 . The apparatus according to claim 11 , wherein:
the first image capturing region and the second image capturing region each include a plurality of pixels, and
the control unit causes the sensitivity of the first image capturing region and the sensitivity of the second image capturing region to be different each other by adjusting a digital gain of each of the plurality of pixels included in the first image capturing region and the second image capturing region.
16 . The apparatus according to claim 11 , wherein the control unit adjusts the image sensor by setting a relative ratio of an intensity of a detection signal of the first pattern generated based on an output from the first image capturing region and an intensity of a detection signal of the second pattern generated based on an output from the second image capturing region to fall within an allowable range.
17 . The apparatus according to claim 11 , wherein:
the first measurement processing measures the position of the first pattern and the position of the second pattern with a first resolution in a first measurement range, and
the second measurement processing measures the position of the first pattern and the position of the second pattern with a second resolution higher than the first resolution in a second measurement range smaller than the first measurement range.
18 . The apparatus according to claim 11 , wherein:
the first pattern and the second pattern are provided in different layers on the target object, and
the control unit obtains, from the position of the first pattern and the position of the second pattern, a position of a pattern formed by the first pattern and the second pattern.
19 . A measurement apparatus for measuring a position of a first pattern and a position of a second pattern provided in a target object, the apparatus comprising:
an image sensor configured to capture the first pattern and the second pattern, the image sensor including:
a first image capturing region for capturing the first pattern; and
a second image capturing region for capturing the second pattern; and
a control unit, including a processor, configured to:
cause a sensitivity of the first image capturing region and a sensitivity of the second image capturing region to be different each other;
cause the image sensor to capture an image including the first pattern and the second pattern; and
obtain the position of the first pattern and the position of the second pattern based on the captured image,
wherein the control unit sets one of the sensitivity of the first image capturing region or the sensitivity of the second image capturing region to 1.
20 . A measurement apparatus for measuring a position of a first pattern and a second pattern provided in different layers on a target object, the apparatus comprising:
an image sensor configured to capture the first pattern and the second pattern, the image sensor including:
a first image capturing region for capturing the first pattern; and
a second image capturing region for capturing the second pattern; and
a control unit, including a processor, configured to:
cause a sensitivity of the first image capturing region and a sensitivity of the second image capturing region to be different each other;
cause the image sensor to capture an image including the first pattern and the second pattern;
obtain the position of the first pattern and the position of the second pattern based on the captured image; and
obtain a relative position between the first pattern and the second pattern from the position of the first pattern and the position of the second pattern.